DOE OSTI · 1830910
Low-Temperature Processing for Atomically Precise Dopant Incorporation with CMOS Integration.
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Schmucker, Scott William, Anderson, Evan Michael, Frederick, Esther, Ivie, Jeffrey Andrew, Bussmann, Ezra, Campbell, DeAnna Marie, Tracy, Lisa A, Lu, Tzu-Ming, Lu, Ping, Wang, George T., Ward, Daniel, Misra, Shashank. 2020-11-01. Low-Temperature Processing for Atomically Precise Dopant Incorporation with CMOS Integration.. https://doi.org/10.2172/1830910
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