DOE OSTI Β· 3000533
Extending the capillary wave model to include the effect of bending rigidity: X-ray reflectivity and diffuse scattering
Abstract
The surface roughness of a thin film at a liquid interface exhibits contributions of thermally excited fluctuations. This thermal roughness depends on temperature (π), surface tension (πΎ), and elastic material properties, specifically the bending modulus (π ) of the film. A nonzero π suppresses the thermal roughness at small length scales compared to an interface with zero π , as expressed by the power spectral density of the thermal roughness. The description of the x-ray scattering of the standard capillary wave model (CWM), which is valid for zero π , is extended to include the effect of π . The extended CWM (eCWM) provides a single analytical form for both the specular x-ray reflectivity (XRR) and the diffuse scattering around the specular reflection, and recovers the expression of the CWM at its zero π limit. This theoretical approach enables the use of single-shot grazing incidence x-ray off-specular scattering (GIXOS) measurements for characterizing the structure of thin films on a liquid surface. The eCWM analysis approach decouples the thermal roughness factor from the surface scattering signal, providing direct access to the intrinsic surface-normal structure of the film and its bending modulus. Moreover, the eCWM facilitates the calculation of reflectivity at any desired resolution (pseudo-XRR approach). The transformation into pseudo-XRR provides the benefit of using widely available XRR software to perform GIXOS analysis. The extended range of the vertical scattering vector (π π§ ) available with the GIXOS pseudo-XRR approach allows for a higher spatial resolution than with conventional XRR. Experimental results are presented for various lipid systems, showing strong agreement between conventional specular XRR and pseudo-XRR methods. This agreement validates the proposed approach and highlights its utility for analyzing soft, thin films.
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Shen, Chen [Deutsches Elektronen-Synchrotron (DESY), Hamburg (Germany)] (ORCID:0000000278551764), Zhang, Honghu [Brookhaven National Laboratory (BNL), Upton, NY (United States). National Synchrotron Light Source II (NSLS-II)] (ORCID:0000000317847825), KlΓΆsgen, Beate [Deutsches Elektronen-Synchrotron (DESY), Hamburg (Germany); Univ. of Southern Denmark, Odense (Denmark)] (ORCID:0000000223340388), Ocko, Benjamin M. [Brookhaven National Laboratory (BNL), Upton, NY (United States). National Synchrotron Light Source II (NSLS-II)] (ORCID:0000000325961206). 2025-10-03. Extending the capillary wave model to include the effect of bending rigidity: X-ray reflectivity and diffuse scattering. https://doi.org/10.1103/znt1-fmx6
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