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DOE OSTI · 2556841

Atomic layer deposited aluminum nitride for interface protection of lithium germanium thiophosphate solid electrolytes

Abstract

Lithium germanium thiophosphate (LGPS) is an attractive solid-state electrolyte material due to its exceptionally high ionic conductivity (~1.2 × 10 –2 S cm –1 ), comparable to many organic liquid electrolytes commonly used in batteries. Despite the high conductivity of LGPS, the susceptibility of LGPS to deleterious degradation reactions has impeded its commercial adoption into solid-state batteries. In particular, the poor voltage stability of LGPS with high-voltage cathode or lithium metal potentials often results in dramatically increasing cell impedance during galvanic cycling. Here, we use aluminum nitride (AlN) as a protection layer for Li metal anode, applied directly to the LGPS at 250 °C using plasma-enhanced atomic layer deposition, to enhance cell performance by preventing LGPS-Li metal reactions. We compare the surface chemistry and electrochemical cycling performance of atomic layer-deposited AlN grown using both plasma N 2 and NH 3 precursors. Galvanostatic cycling and electrochemical impedance spectroscopy show that AlN-coated LGPS cells perform better than bare LGPS cells in contact with Li metal anodes, with the AlN able to improve cycling longevity by over a factor of 3 in certain cases. Finally, we utilize x-ray photoelectron spectroscopy (XPS) line scans to highlight the slow room-temperature reactivity between AlN and evaporated lithium metal, and a computational model is built to aid further XPS analysis.

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BibTeXRIS

Klueter, Sam [Univ. of Maryland, College Park, MD (United States); University of Maryland], Wang, Yang [Univ. of Maryland, College Park, MD (United States)] (ORCID:0000000182199014), Kallon, Elias [Univ. of Maryland, College Park, MD (United States)], Knab, Aidan [Univ. of Maryland, College Park, MD (United States)], Fontecha, Daniela [Univ. of Maryland, College Park, MD (United States)] (ORCID:0000000232907630), Lee, Cholho [SK On Co., Ltd., Seoul (Korea, Republic of)] (ORCID:0000000345359140), Rubloff, Gary W. [Univ. of Maryland, College Park, MD (United States)] (ORCID:0000000219013982), Lee, Sang Bok [Univ. of Maryland, College Park, MD (United States)] (ORCID:0000000313757099), Kozen, Alexander C. [Univ. of Maryland, College Park, MD (United States); Univ. of Vermont, Burlington, VT (United States)] (ORCID:0000000253112757). 2025-03-26. Atomic layer deposited aluminum nitride for interface protection of lithium germanium thiophosphate solid electrolytes. https://doi.org/10.1116/6.0004419

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