@misc{indiciae9a16fb8a3ce3,
  title = {Atomic layer deposited aluminum nitride for interface protection of lithium germanium thiophosphate solid electrolytes},
  author = {Klueter, Sam [Univ. of Maryland, College Park, MD (United States); University of Maryland] and Wang, Yang [Univ. of Maryland, College Park, MD (United States)] (ORCID:0000000182199014) and Kallon, Elias [Univ. of Maryland, College Park, MD (United States)] and Knab, Aidan [Univ. of Maryland, College Park, MD (United States)] and Fontecha, Daniela [Univ. of Maryland, College Park, MD (United States)] (ORCID:0000000232907630) and Lee, Cholho [SK On Co., Ltd., Seoul (Korea, Republic of)] (ORCID:0000000345359140) and Rubloff, Gary W. [Univ. of Maryland, College Park, MD (United States)] (ORCID:0000000219013982) and Lee, Sang Bok [Univ. of Maryland, College Park, MD (United States)] (ORCID:0000000313757099) and Kozen, Alexander C. [Univ. of Maryland, College Park, MD (United States); Univ. of Vermont, Burlington, VT (United States)] (ORCID:0000000253112757)},
  year = {2025},
  doi = {10.1116/6.0004419},
  url = {https://www.osti.gov/biblio/2556841},
  note = {Source identifier: 2556841}
}