DOE OSTI · 2542505
Method of making thin films of sodium fluorides and their derivatives by ALD
Abstract
A method of making thin films of sodium fluorides and their derivatives by atomic layer deposition (“ALD”). A sodium precursor is exposed to a substrate in an ALD reactor. The sodium precursor is purged, leaving the substrate with a sodium intermediate bound thereon. A fluorine precursor is exposed to the bound sodium intermediate in the ALD reactor. The fluorine precursor is purged and a sodium fluoride film is formed on the substrate.
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Mane, Anil U., Elam, Jeffrey W., Kang, Donghyeon, Kuraitis, Sara, Graugnard, Elton. 2024-08-20. Method of making thin films of sodium fluorides and their derivatives by ALD. https://www.osti.gov/biblio/2542505
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