DOE OSTI · 1531980
Method for atomic layer deposition
Abstract
An atomic layer deposition method is disclosed for preparing polypeptides. The method comprises providing a solid-phase support comprising a reactive amine monolayer in an atomic layer deposition (ALD) chamber. The solid-phase support is contacted with a first protected amino acid substituted with a protecting group by atomic layer deposition, wherein the protecting group is bonded to a non-side chain amino group of the protected amino acid. A carboxylic acid group of the first protected amino acid is reacted with the reactive amine monolayer, thereby coupling the first protected amino acid to the solid-phase support to produce a coupled-product.
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Jiang, Ying-Bing, Cecchi, Joseph L., Fu, Yaqin, Brinker, C. Jeffrey. 2017-03-28. Method for atomic layer deposition. https://www.osti.gov/biblio/1531980
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