NASA NTRS · 20060041003
Quantum Interferometric Lithography: Exploiting Enganglement to Beat the Diffraction Limit
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Dowling, J., Boto, A., Abrams, D., Williams, C.. 2000-05-07. Quantum Interferometric Lithography: Exploiting Enganglement to Beat the Diffraction Limit. https://ntrs.nasa.gov/citations/20060041003
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