TY  - RPRT
TI  - Quantum Interferometric Lithography: Exploiting Enganglement to Beat the Diffraction Limit
AU  - Dowling, J.
AU  - Boto, A.
AU  - Abrams, D.
AU  - Williams, C.
PY  - 2000
UR  - https://ntrs.nasa.gov/citations/20060041003
ID  - 20060041003
ER  -