NASA NTRS · 19790033327
Large area silicon sheet by EFG
Abstract
The edge-defined, film-fed growth (EFG) technique has been employed to grow silicon ribbons for photovoltaic applications. Considerable progress has been made in recent years in developing the technique to the point that long lengths of silicon ribbon can be routinely grown. In order to attain the full low-cost potential of the EFG technique, several further developments such as the growth of thinner and wider ribbons, increase in ribbon growth rate, and improvements in material quality are needed. The technological problems to be solved and the approaches employed to achieve these goals are discussed.
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Rao, C. V. H., Surek, T., Mackintosh, B., Ravi, K. V., Wald, F. V.. 1978-01-01. Large area silicon sheet by EFG. https://ntrs.nasa.gov/citations/19790033327
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