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Results for “MICROWAVE PLASMA PROBE”

Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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At least 19 records
All sourcesNASA NTRSDOE OSTI
NASA NTRS1965

A microwave probe for plasma plumes.

Swinging-arm microwave probe to measure electron density and collision frequency profiles transverse to plasma jet plumes

MICROWAVE PLASMA PROBE↗
NASA NTRS1981

Experimental investigations of turbulence in magnetized, partially ionized plasmas

An experimental investigation of turbulent fluctuations associated with gradient cross-field and Farley-Buneman instabilities is described. The experiments are carried out in magnetized plasma columns with an imposed radial electric field. Microwave scattering and probe measurements provide the plasma diagnostics. Particular attention is given to the varying characteristics of the turbulent spectra for both potential and density as a function of neutral gas pressure.

Mikkelsen, T.↗
NASA NTRS1976

High-beta effects and anomalous diffusion in plasmas expanding into magnetic fields

A metallic laser-produced plasma is allowed to expand transversely into an applied magnetic field, under conditions where the typical ion cyclotron radius is much larger, and the electron cyclotron radius much smaller, than the experimental dimensions. A stationary background plasma may also be present. Initially, the flow energy density exceeds (B squared/8 times pi), where B is the ambient magnetic field. Magnetic coil probes, Langmuir probes, and microwave diagnostics are used to study the plasma-field interaction. Field compression at the leading edge and field exclusion within the expanding plasma are seen. The diagnostic measurements and comparison with a theoretical model demonstrate plasma turbulence and anomalously high diffusion of field into the expanding plasma.

Koopman, D. W.↗
NASA NTRS1993

Experimental studies of an ECR plasma thruster

The Electron Cyclotron Resonance (ECR) thruster is a proposed electrodeless space electric propulsion device with interesting and little understood physics. A laboratory ECR thruster was run in a vacuum tank at pressures in the 10 exp -5 torr range using 2.12 GHz microwave beam and Ar gas propellant. Movable diagnostic probes (a Faraday cup and a gridded energy analyzer) measured plasma characteristics as propellant gas flow rate and input microwave power level were varied. Ion energy and flux data were used to calculate I(sp), propulsive efficiency, and thrust. The ion flux profiles show an unexpected depression on the thruster axis for low tank pressures that disappears as the tank pressure increases. Ion energies decrease as the flow rate and pressure increase, but the microwave power level affects the energy only negligibly. The calculated propulsion parameters demonstrate that the efficiency of the laboratory device is low, and that tank pressure greatly changes the performance.

Kaufman, D. A.↗
NASA NTRS1982

Performance characteristics of a microwave plasma disk ion source

The development, design, and preliminary performance characteristics of a microwave plasma disk ion source are presented. Several important design concepts indigenous to microwave plasmas have been utilized in the development of this ion source: generation of a resonantly sustained microwave discharge inside a microwave/plasma coupler, probe and length tuning of the microwave/plasma coupler, and minimization of plasma volume. The experimental results for a 2.45 GHz, eight cm ion source excited in the TE(211) and TM(011) modes are described. Results are presented for electromagnetic mode excitation, electron density, coupling efficiency and loaded cavity Q, and I-V characteristics and efficiencies. It is preliminarily shown that a microwave disk-like plasma can be sustained adjacent to the grids with either TE or TM cavity modes at pressures below 2 x 10 to the -4th torr. Over 80% of the power absorbed in the cavity is coupled into the plasma.

Asmussen, J.↗
NASA NTRS1972

Momentum transfer interaction of a laser-produced plasma with a low-pressure background.

The expansion of a laser-produced metallic plasma into a photoionized hydrogen background has been experimentally studied. Langmuir probe and microwave diagnostics have detected an interaction front which decelerates with a dependence on background density and time consistent with a momentum coupling between the laser plasma and the ionized fraction of the background. An ion percursor has also been observed. Calculations of scattering cross sections indicate that multiple-encounter Coulomb scattering will dominate collisional momentum transfer. The leading edge of the laser plasma contains multiply charged ions of charge state z greater than or equal to 5, and collisional effects appear adequate to explain the principal features of the momentum coupling. The ion precursor may have a collisionless origin.

Koopman, D. W.↗
NASA NTRS1988

Tunable Microwave Cavity For Ion Source

Movable probe and tuning wall adjusted to obtain resonance at microwave frequency used to generate plasma in cell at one end of microwave cavity. Electroless discharge without disadvantages of dc-cathode-discharge and RF-induction methods. To achieve precise positioning, coaxial probe extends into microwave cavity through tube.

Nakanishi, Shigeo↗
NASA NTRS1999

Diagnostic for Plasma Enhanced Chemical Vapor Deposition and Etch Systems

In order to meet NASA's requirements for the rapid development and validation of future generation electronic devices as well as associated materials and processes, enabling technologies ion the processing of semiconductor materials arising from understanding etch chemistries are being developed through a research collaboration between Stanford University and NASA-Ames Research Center, Although a great deal of laboratory-scale research has been performed on many of materials processing plasmas, little is known about the gas-phase and surface chemical reactions that are critical in many etch and deposition processes, and how these reactions are influenced by the variation in operating conditions. In addition, many plasma-based processes suffer from stability and reliability problems leading to a compromise in performance and a potentially increased cost for the semiconductor manufacturing industry. Such a lack of understanding has hindered the development of process models that can aid in the scaling and improvement of plasma etch and deposition systems. The research described involves the study of plasmas used in semiconductor processes. An inductively coupled plasma (ICP) source in place of the standard upper electrode assembly of the Gaseous Electronics Conference (GEC) radio-frequency (RF) Reference Cell is used to investigate the discharge characteristics and chemistries. This ICP source generates plasmas with higher electron densities (approximately 10(exp 12)/cu cm) and lower operating pressures (approximately 7 mTorr) than obtainable with the original parallel-plate version of the GEC Cell. This expanded operating regime is more relevant to new generations of industrial plasma systems being used by the microelectronics industry. The motivation for this study is to develop an understanding of the physical phenomena involved in plasma processing and to measure much needed fundamental parameters, such as gas-phase and surface reaction rates. species concentration, temperature, ion energy distribution, and electron number density. A wide variety of diagnostic techniques are under development through this consortium grant to measure these parameters. including molecular beam mass spectrometry (MBMS). Fourier transform infrared (FTIR) spectroscopy, broadband ultraviolet (UV) absorption spectroscopy, a compensated Langmuir probe. Additional diagnostics. Such as microwave interferometry and microwave absorption for measurements of plasma density and radical concentrations are also planned.

Cappelli, Mark A.↗
NASA NTRS2007

Slotted antenna waveguide plasma source

A high density plasma generated by microwave injection using a windowless electrodeless rectangular slotted antenna waveguide plasma source has been demonstrated. Plasma probe measurements indicate that the source could be applicable for low power ion thruster applications, ion implantation, and related applications. This slotted antenna plasma source invention operates on the principle of electron cyclotron resonance (ECR). It employs no window and it is completely electrodeless and therefore its operation lifetime is long, being limited only by either the microwave generator itself or charged particle extraction grids if used. The high density plasma source can also be used to extract an electron beam that can be used as a plasma cathode neutralizer for ion source beam neutralization applications.

Foster, John↗