Reduced temperature preparation of atomically clean Si surfaces to augment CMOS with atomic precision devices.
Abstract not provided.
Anderson, Evan Michael↗
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Results for “atomically precise”
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Reduced temperature preparation of atomically clean Si surfaces to augment CMOS with atomic precision devices.
Abstract not provided.
Pena, Luis Fabian↗
Reduced temperature preparation of atomically clean Si surfaces to augment CMOS with atomic precision devices.
Abstract not provided.
Pena, Luis Fabian↗
Atomic precision advanced manufacturing (APAM) of ultra-doped nanostructures for advanced CMOS devices and interconnects.
Abstract not provided.
Scrymgeour, David↗
Modeling and Assessment of Atomic Precision Advanced Manufacturing (APAM) Enabled Vertical Tunneling Field Effect Transistor.
Abstract not provided.
Gao, Xujiao↗
Reduced temperature preparation of atomically clean Si surfaces to augment CMOS with atomic precision devices.
Abstract not provided.
Anderson, Evan Michael↗
Path towards a vertical TFET enabled by atomic precision advanced manufacturing.
Abstract not provided.
Lu, Tzu-Ming↗
Atomic Precision Advanced Manufacturing and Lessons for Area-Selective Deposition.
Abstract not provided.
Schmucker, Scott↗
Development of low thermal budget Si epitaxy and high-k/ metal gate stack for atomically precise electronic devices.
Abstract not provided.
Anderson, Evan↗
Area-Selective Atomic Layer Deposition Templated by Atomic Precision Fabrication.
Abstract not provided.
Frederick, Esther↗
Current Paths in an Atomic Precision Advanced Manufactured Device Imaged by Nitrogen Vacancy Diamond Magnetic Microscopy.
Abstract not provided.
Basso, Luca↗
Atomic Precision Patterning and Alignment for Dopant-based Quantum Devices.
Abstract not provided.
Owen, J. H. G↗
Atomic Precision Advanced Manufacturing for Ultraprecise 2D Bipolar Devices.
Abstract not provided.
Owen, James↗
Pathways for atomic-precision incorporation of donors and acceptors in silicon.
Abstract not provided.
Campbell, Quinn↗
Direct Integration of Atomic Precision Devices into a MOS-Compatible Process.
Abstract not provided.
Ivie, Jeffrey↗
Modeling and Design of Atomic Precision Advanced Manufacturing (APAM) Enabled Bipolar Devices.
Abstract not provided.
Gao, Xujiao↗