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At least 415 records · Page 23

Resolving the Heat Generated from ZrO 2 Atomic Layer Deposition Surface Reactions

Abstract In situ pyroelectric calorimetry and spectroscopic ellipsometry were used to investigate surface reactions in atomic layer deposition (ALD) of zirconium oxide (ZrO 2 ). Calibrated and time‐resolved in situ ALD calorimetry provides new insights into the thermodynamics and kinetics of saturating surface reactions for tetrakis(dimethylamino)zirconium(IV) (TDMAZr) and water. The net ALD reaction heat ranged from 0.197 mJ cm −2 at 76 °C to 0.155 mJ cm −2 at 158 °C, corresponding to an average of 4.0 eV/Zr at all temperatures. A temperature dependence for reaction kinetics was not resolved over the range investigated. The temperature dependence of net reaction heat and distribution among metalorganic and oxygen source exposure is attributed to factors including growth rate, equilibrium surface hydroxylation, and the extent of the reaction. ZrO 2 ‐forming surface reactions were investigated computationally using DFT methods to better understand the influence of surface hydration on reaction thermodynamics.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Control of Thickness and Chemical Properties of Atomic Layer Deposition Overcoats for Stabilizing Cu/γ-Al 2 O 3 Catalysts

Whereas sintering and leaching of copper nanoparticles during liquid-phase catalytic processing can be prevented by using atomic layer deposition (ALD) to overcoat the nanoparticles with AlOx, this acidic overcoat leads to reversible deactivation of the catalyst by resinification and blocking of the pores within the overcoat during hydrogenation of furfural. We demonstrate that decreasing the overcoat thickness from 45 to 5 ALD cycles is an effective method to increase the rate per gram of catalyst and to decrease the rate of deactivation for catalysts pretreated at 673 K, and a fully regenerable copper catalyst can be produced with only five ALD cycles of AlOx. Moreover, although an overcoat of MgOx does not lead to stabilization of copper nanoparticles against sintering and leaching during liquid-phase hydrogenation reactions, the AlOx overcoat can be chemically modified to decrease acidity and deactivation through the addition of MgOx, while maintaining stability of the copper nanoparticles.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Techno-economic analysis of the use of atomic layer deposited transition metal oxides in silicon heterojunction solar cells

The industry for producing silicon solar cells and modules has grown remarkably over the past decades, with more than a 100-fold reduction in price over the past 45?years. The main solar cell fabrication technology has shifted over that time and is currently dominated by the passivated emitter and rear cell (PERC). Other technologies are expected to increase in market share, including tunnel-oxide passivated contact (TOPCon) and heterojunction technology (HJT). In this paper, we examine the cost potential for using atomic layer deposition (ALD) to form transition metal oxide (TMO) layers (MoO x , TiO x and aluminium-doped zinc oxide [AZO]) to use as lower cost alternatives of the p-doped, n-doped and indium tin oxide (ITO) layers, respectively, the layers normally used in HJT solar cells. Using a bottom-up cost and uncertainty model with equipment cost data and process experience in the lab, we find that the production cost of these variations will likely be lower per wafer than standard HJT, with the main cost drivers being the cost of the ALD precursors at high-volume production. We then considered what efficiency is required for these sequences to be cost effective in $/W and discuss whether these targets are technically feasible. This work motivates further work in developing these ALD TMO processes to increase their efficiency towards their theoretical limits to take advantage of the processing cost advantage.

14 SOLAR ENERGY↗

Ionic Conductive and Highly-Stable Interface for Alkali Metal Anodes

Alkali metals are regarded as the most promising candidates for advanced anode for the next-generation batteries due to their high specific capacity, low electrochemical potential, and lightweight. However, critical problems of the alkali metal anodes, especially dendrite formation and interface stabilization, remain challenging to overcome. The solid electrolyte interphase (SEI) is a key factor affecting Li and Na deposition behavior and electrochemical performances. Herein, a facile and universal approach is successfully developed to fabricate ionic conductive interfaces for Li and Na metal anodes by modified atomic layer deposition (ALD). In this process, the Li metal (or Na metal) plays the role of Li (or Na) source without any additional Li (or Na) precursor during ALD. Moreover, the key questions about the influence of ALD deposition temperature on the compositions and structure of the coatings are addressed. The optimized ionic conductive coatings have significantly improved the electrochemical performances. In addition, the electrochemical phase-field model is performed to prove that the ionic conductive coating is very effective in promoting uniform electrodeposition. Further, this approach is universal and can be potentially applied to other different metal anodes. At the same time, it can be extended to other types of coatings or other deposition techniques.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Atomic Layer Deposition Niobium Nitride Films for High-Q Resonators

Niobium nitride (NbN) is a useful material for fabricating detectors because of its high critical temperature and relatively high kinetic inductance. In particular, NbN can be used to fabricate nanowire detectors and mm-wave transmission lines. When deposited, NbN is usually sputtered, leaving room for concern about uniformity at small thicknesses. In this work, we present atomic layer deposition niobium nitride (ALD NbN) as an alternative technique that allows for precision control of deposition parameters such as film thickness, stage temperature, and nitrogen composition. Atomic-scale control over film thickness admits a high degree of uniformity for films 4–30 nm thick; control over deposition temperature gives rise to growth rate changes, which can be used to optimize film thickness and critical temperature. In order to charac- terize ALD NbN in the radio-frequency regime, we construct single-layer micro- wave resonators and test their performance as a function of stage temperature and input power. ALD processes can admit high resonator quality factors, with ≥ 43% of resonators above Q i = 10 6 , which in turn increase detector multiplexing capabilities. i Furthermore, we find critical temperatures in the range of 7.5–10.9 K that vary as a function of cycle count and deposition temperature.

79 ASTRONOMY AND ASTROPHYSICS↗

The impact of core-shell nanotube structures on fracture in ceramic nanocomposites

Multi-wall carbon nanotubes (MWCNTs) can be used to create ceramic nanocomposites with improved fracture toughness. In the present work, atomic layer deposition (ALD) was employed to deposit thin oxide layers on MWCNTs. These core-shell structures were then used to create nanocomposites by using a polymer derived ceramic (PDC) to produce the matrix. Variations in both the initial MWCNT structure and the oxide layers led to substantial differences in fiber-pullout behavior. Single tube pullout tests also showed that the oxide coatings led to stronger bonding with the ceramic matrix. With high defect density MWCNTs, this led to shorter pull-out lengths which is consistent with the conventional understanding of fracture in ceramic matrix composites. However, with low defect density MWCNTs longer pullout lengths were observed with the oxide layers. To interpret the different trends that were observed, we believe that the ALD coatings should not be viewed simply as a means of altering the interfacial properties. Instead, the coated MWCNTs should be viewed as more complex core-shell fibers where both interface and internal properties can be controlled with the ALD layers.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Vapor-phase grafting of a model aminosilane compound to Al 2 O 3 , ZnO, and TiO 2 surfaces prepared by atomic layer deposition

Atomic layer deposition (ALD) is a highly versatile surface functionalization technique that can conformally coat both planar and porous substrates. Here we use ALD metal oxide layers to establish a well-defined starting surface for vapor-phase surface organic modification. Vapor-phase (3-aminopropyl)triethoxysilane (APTES) surface silanization of ALD Al 2 O 3 , ZnO and TiO 2 surfaces were studied at 100 °C, 150 °C and 200 °C. In situ quartz crystal microbalance (QCM) and Fourier-transform infrared (FTIR) spectroscopy measurements, and ex situ atomic force microscopy (AFM) and X-ray photoelectron spectroscopy (XPS) measurements showed uniform monolayer silane formation through self-limiting APTES reaction. We observed a higher surface density of grafted APTES species following silanization at 100 °C compared to 200 °C, and we attribute this to the temperature-dependent reactivity of the surface hydroxyls and changes in the mode of APTES reaction. The FTIR and XPS measurements revealed that APTES reacts with Al 2 O 3 and ZnO exclusively through metal siloxy bond formation. However, APTES reacts with TiO 2 through both siloxy bond formation and ammonium salt formation via the amine group.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Atomic layer deposition in porous electrodes: A pore-scale modeling study

Coating porous electrodes of Li-ion batteries with functional materials by atomic layer deposition (ALD) can enhance their capacity stability. Because of the complex microstructure of the porous electrodes, predicting the required exposure time of the precursors for achieving a desired coating and the coating characteristics for a given exposure time remains difficult. Here, a three-dimensional (3D) pore-scale lattice Boltzmann model is developed to investigate the reactive transport processes during the ALD of reconstructed electrodes and to assess the accuracy of one-dimensional (1D) mean-field models. The effects of the hierarchical structure of pores and their connectivity on the coating process of ALD are investigated and the detailed coating characteristics in the electrodes are resolved. Electrodes with smaller pore sizes requires a longer exposure time to achieve full coating. At the same depth within an electrode, the smaller pores are coated more slowly than the wider pores (especially at high Damkohler numbers) and the coating speed of well-connected pores are faster than that of poorly connected pores. Furthermore, simulations also reveal that the 1D mean-field model can capture the average coating characteristics reasonably well when pores in the electrodes are well connected but may perform poorly if the pores are poorly connected.

25 ENERGY STORAGE↗

Towards improved conversion of wet waste to jet fuel with atomic layer deposition-coated hydrodeoxygenation catalysts

The conversion of wet waste-derived volatile fatty acids into jet fuel-range hydrocarbons is a promising route for increasing the production of sustainable aviation fuel; however, the cost and moderate alkane selectivity of Pt-based hydrodeoxygenation catalysts present challenges for commercialization. Here, to address this, we used atomic layer deposition to apply TiO 2 overcoats to Pt/Al 2 O 3 catalysts and create new interface sites that exhibited 8 times higher site time yield of the desirable n-alkane product than uncoated catalyst. Through TPR/TPD, XPS, CO DRIFTS, and DFT calculations, we found that the increased selectivity of the ALD-coated catalyst was due to the creation of O vacancies at the Pt-TiO 2 interface under reducing conditions, resulting in new Ti 3+ acid sites near the active metal. Maximum conversion and alkane selectivity during HDO was achieved with an ALD-coated 0.5% wt Pt catalyst, indicating that TiO 2 ALD can be used to maximize the utility of precious-metal catalysts.

09 BIOMASS FUELS↗

Effect of the SiO 2 interlayer properties with solid-source hydrogenation on passivated contact performance and surface passivation

We investigate how SiO x oxide interlayers prepared by different techniques (chemical, thermal) in combination with hydrogen released from an ALD Al 2 O 3 source layer govern passivation in 1) passivated contacts based on doped poly-Si layers and tunneling SiO 2 , and 2) wafer surface passivation by Al 2 O 3 . Profiles of O and H in these structures with engineered, buried SiOx interlayers were measured by Time-of-Flight SIMS (TOF-SIMS) at nanometer resolution. Passivated contacts perform best with thermally oxidized SiOx, while chemical SiO x causes poly-Si film blistering and performance degradation. ALD Al 2 O 3 acts as passivating H source, significantly improving B-doped and intrinsic poly-Si contacts for IBC cells. Fast-diffusing hydrogen from the Al 2 O 3 source layer appears to penetrate Si wafer thickness, improving the passivation of structures at the opposite side. In contrast to the passivated contacts, chemical SiOx interlayer promotes wafer surface passivation by ALD Al 2 O 3 , while similarly thin thermal SiO 2 suppresses passivation and built-in charge.

14 SOLAR ENERGY↗

Understanding cation doping achieved by atomic layer deposition for high-performance Li-Ion batteries

As Li ion battery (LIB) technology develops, its nanoscale design is attracting more and more interest. Atomic layer deposition (ALD) has emerged as a promising technique to provide conformal and ultrathin coating for LIB materials. In this work, an iron oxide (FeO x ) ALD was performed on LiMn 1.5 Ni 0.5 O-5 4 (LMNO) cathode particles, followed by an annealing process. Here, Fe was doped into LMNO during the ALD process; and it was found that lattice oxygen loss and structural change of LMNO occurred at a reaction temperature of 450 °C under vacuum. Meanwhile, Fe diffused from the surface to the bulk of LMNO. After post-annealing, FeO x -coated LMNO recovered its structure and lattice oxygen under proper annealing conditions, and exhibited significant enhancement of specific capacity, rate capability, and cyclic stability.

25 ENERGY STORAGE↗

Surface Fe clusters promote syngas reaction to oxygenates on Rh catalysts modified by atomic layer deposition

Converting syngas to higher oxygenates is a promising strategy for sustainably producing fuels and chemicals used every day. Rh-based catalysts promoted with metal oxides have long been of interest for oxygenate synthesis, but the role of promoters and the structure of the catalyst during reaction are often not well understood. In this work, we characterize a Rh/SiO 2 catalyst modified by Fe 2 O 3 deposited by atomic layer deposition (ALD). Here, we show that Fe 2 O 3 deposits selectively on the Rh nanoparticles and enhances both the turnover frequency and the oxygenate selectivity of the catalysts. A maximum 29% selectivity towards higher oxygenates is achieved with just 1 cycle of Fe 2 O 3 ALD, and we relate the trends in selectivity to the changing availability of surface sites that drive higher alcohol (e.g., ethanol and propanol) formation. Further, we show that the ALD promoter mitigates catalyst sintering, improving the stability of these materials. In-situ X-ray absorption spectroscopy experiments reveal that the Fe 2 O 3 undergoes reduction during the catalyst pretreatment and forms Fe clusters on the surface of the Rh that migrate but remain stable under syngas reaction conditions. We find that modification of the Rh with these surface Fe species is key to the enhanced alcohol production observed in these materials.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Enhanced Catalyst Durability for Bio-Based Adipic Acid Production by Atomic Layer Deposition

Harsh reaction environments challenge the lifetime productivity of conventional catalysts and impede emerging biobased chemical processes. Condensed-phase processing of muconic acid, a biobased platform chemical, leads to problematic levels of catalyst leaching and fouling. Atomic layer deposition (ALD) can improve catalyst durability using protective metal oxide coatings; however, a targeted coating strategy and cost models thereof are needed for application-specific deactivation challenges that can surmount these challenges while accounting for process implications. Herein, we utilize thin (<5 wt% Al) Al2O3 ALD coatings to increase the lifetime productivity of Pd/TiO2 during muconic acid hydrogenation to adipic acid. The ALD coating decreases Pd leaching by >3x and markedly improves the thermal stability of Pd and TiO2. Economic analysis for an adipic acid biorefinery supports that increased material costs and reduced catalyst productivity can be justified through lifetime extension. Broadly, this work lays the foundation for reducing the cost of biobased chemical processes through catalyst stability.

Settle, Amy↗

Selective growth of Al 2 O 3 on size-selected platinum clusters by atomic layer deposition

In heterogeneous catalysis, atomic layer deposition (ALD) has been developed as a tool to stabilize and reduce carbon deposition on supported nanoparticles. Here, we discuss use of high vacuum ALD to deposit alumina films on size-selected, sub-nanometer Pt/SiO 2 model catalysts. Mass-selected Pt 24 clusters were deposited on oxidized Si(100), to form model Pt 24 /SiO 2 catalysts with particles shown to be just under 1 nm, with multilayer three dimensional structure. Alternating exposures to trimethylaluminum and water vapor in an ultra-high vacuum chamber were used to grow alumina on the samples without exposing them to air. Here, the samples were probed in situ using X-ray photoelectron spectroscopy (XPS), low-energy ion scattering spectroscopy (ISS), and CO temperature-programmed desorption (TPD). Additional samples were prepared for ex situ experiments using grazing incidence small angle xray scattering spectroscopy (GISAXS). Alumina growth is found to initiate at least 60 times more efficiently at the Pt 24 cluster sites, compared to bare SiO 2 /Si, with a single ALD cycle depositing a full alumina layer on top of the clusters, with substantial additional alumina growth initiating on SiO 2 sites surrounding the clusters. As a result, the clusters were completely passivated, with no exposed Pt binding sites.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Carbon monoxide alleviates ethanol-induced oxidative damage and inflammatory stress through activating p38 MAPK pathway

Stress-inducible protein heme oxygenase-1(HO-1) is well-appreciative to counteract oxidative damage and inflammatory stress involving the pathogenesis of alcoholic liver diseases (ALD). The potential role and signaling pathways of HO-1 metabolite carbon monoxide (CO), however, still remained unclear. To explore the precise mechanisms, ethanol-dosed adult male Balb/c mice (5.0 g/kg.bw.) or ethanol-incubated primary rat hepatocytes (100 mmol/L) were pretreated by tricarbonyldichlororuthenium (II) dimmer (CORM-2, 8 mg/kg for mice or 20 μmol/L for hepatocytes), as well as other pharmacological reagents. Our data showed that CO released from HO-1 induction by quercetin prevented ethanol-derived oxidative injury, which was abolished by CO scavenger hemoglobin. The protection was mimicked by CORM-2 with the attenuation of GSH depletion, SOD inactivation, MDA overproduction, and the leakage of AST, ALT or LDH in serum and culture medium induced by ethanol. Moreover, CORM-2 injection or incubation stimulated p38 phosphorylation and suppressed abnormal Tnfa and IL-6, accompanying the alleviation of redox imbalance induced by ethanol and aggravated by inflammatory factors. The protective role of CORM-2 was abolished by SB203580 (p38 inhibitor) but not by PD98059 (ERK inhibitor) or SP600125 (JNK inhibitor). Thus, HO-1 released CO prevented ethanol-elicited hepatic oxidative damage and inflammatory stress through activating p38 MAPK pathway, suggesting a potential therapeutic role of gaseous signal molecule on ALD induced by naturally occurring phytochemicals. - Highlights: • CO alleviated ethanol-derived liver oxidative and inflammatory stress in mice. • CO eased ethanol and inflammatory factor-induced oxidative damage in hepatocytes. • The p38 MAPK is a key signaling mechanism for the protective function of CO in ALD.

60 APPLIED LIFE SCIENCES↗

Dihydroartemisinin protects against alcoholic liver injury through alleviating hepatocyte steatosis in a farnesoid X receptor-dependent manner

Alcoholic liver disease (ALD) is a common etiology of liver diseases, characterized by hepatic steatosis. We previously identified farnesoid X receptor (FXR) as a potential therapeutic target for ALD. Dihydroartemisinin (DHA) has been recently identified to possess potent pharmacological activities on liver diseases. This study was aimed to explore the impact of DHA on ALD and further elaborate the underlying mechanisms. Gain- or loss-of-function analyses of FXR were applied in both in vivo and in vitro studies. Results demonstrated that DHA rescued FXR expression and activity in alcoholic rat livers. DHA also reduced serodiagnostic markers of liver injury, including aspartate aminotransferase, alanine aminotransferase, alkaline phosphatase, and lactate dehydrogenase. DHA improved alcohol-induced liver histological lesions, expression of inflammation genes, and inflammatory cell infiltration. In addition, DHA not only attenuated hyperlipidemia but also reduced hepatic steatosis through regulating lipogenesis and lipolysis genes. In vitro experiments further consolidated the concept that DHA ameliorated ethanol-caused hepatocyte injury and steatosis. Noteworthily, DHA effects were reinforced by FXR agonist obeticholic acid or FXR expression plasmids but abrogated by FXR antagonist Z-guggulsterone or FXR siRNA. In summary, DHA significantly improved alcoholic liver injury by inhibiting hepatic steatosis, which was dependent on its activation of FXR in hepatocytes. - Highlights: • DHA rescues FXR expression in alcoholic livers. • DHA improves alcoholic liver inflammation and steatosis in a FXR-dependent way. • DHA alleviates ethanol-induced hepatocyte steatosis by activation of FXR.

60 APPLIED LIFE SCIENCES↗

Site-Selective Atomic Layer Deposition at Thermally Generated Surface Oxygen Vacancies on Rutile TiO 2

Unique atomic arrangements (i.e., defects) on material surfaces may exhibit distinctive reactivity that affords opportunities for selective surface chemistry exclusively at those sites. While theoretically appealing, site-selective atomic layer deposition (ALD) processes remain largely unrealized experimentally. Here we provide evidence for site-selective ALD that exclusively targets oxygen vacancies thermally generated at the surface of TiO 2 single crystals. High-resolution in situ ellipsometry reveals the nucleation behavior of dimethylaluminum isopropoxide (DMAI) and water at process conditions precisely tuned for selective hydroxylation of surface defects. An island growth model for nucleation and atomic force microscopy (AFM) imaging are consistent with a site-selective growth mechanism that depends on the surface oxygen vacancy density. This approach to direct ALD reactions at defective surface sites may provide future opportunities for targeted remediation of electronically imperfect interfaces.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Self-Catalyzed, Low-Temperature Atomic Layer Deposition of Ruthenium Metal Using Zero-Valent Ru(DMBD)(CO) 3 and Water

Ruthenium (Ru) films are deposited using atomic layer deposition (ALD), promoted by a self-catalytic reaction mechanism. Using zero-valent, η 4 -2,3-dimethylbutadiene Ruthenium tricarbonyl (Ru(DMBD)(CO) 3 ) and H 2 O, Ru films are deposited at a rate of 0.1 nm/cycle. The temperature for steady deposition lies between 160 and 210 °C. Film structure and composition are confirmed via X-ray diffraction, high-resolution transmission electron microscopy, and X-ray photoelectron spectroscopy. The room-temperature electrical resistivity of 10 nm Ru films is found to be 39 μΩ·cm. In situ quadrupole mass spectrometry and density functional theory are used to understand ALD surface reactions. The ligand, dimethylbutadiene dissociatively desorbs on the surface. On the other hand, the carbonyl ligand is catalyzed by the Ru center. This leads to the water gas shift reaction, forming CO 2 and H 2 . Modulating deposition temperature affects these two ligand dissociation reactions. This in turn affects nucleation, growth, and hence, Ru film properties. Self-catalyzed reactions provide a pathway for low-temperature ALD with milder co-reactants.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗