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At least 37 records · Page 2
All sourcesNASA NTRSDOE OSTI
NASA NTRS1976

A 30-cm diameter argon ion source

A 30-cm diameter argon ion source was evaluated. Ion source beam currents up to 4A were extracted with ion energies ranging from 0.2 to 1.5 KeV. An ion optics scaling relation was developed for predicting ion beam extraction capability as a function of total extraction voltage, gas type and screen grid open area. Ignition and emission characteristics of several hollow cathode geometries were assessed for purposes of defining discharge chamber and neutralizer cathodes. Also presented are ion beam profile characteristics which exhibit broad beam capability well suited for ion beam sputtering applications.

Sovey, J. S.↗
NASA NTRS1980

Miniature cyclotron resonance ion source using small permanent magnet

An ion source using the cyclotron resonance principle is described. A miniaturized ion source device is used in an air gap of a small permanent magnet with a substantially uniform field in the air gap of about 0.5 inch. The device and permanent magnet are placed in an enclosure which is maintained at a high vacuum (typically 10 to the minus 7th power) into which a sample gas can be introduced. The ion beam end of the device is placed very close to an aperture through which an ion beam can exit into the apparatus for an experiment.

Anicich, V. G.↗
NASA NTRS1971

Ion sources for electric propulsion

Ion systems, which accelerate ions of Cs, Hg, or colloid particles by electrostatic fields, are furthest advanced and ready for application. Four kinds of ion sources have been developed: The contact ionization source for Cs as propellants, the electron bombardment source for Cs or Hg, the RF ionization source for Hg, and the hollow needle spray nozzle for colloidal glycerol particles. In each case, the ion beam must be neutralized by injection of electrons shortly behind the exit orifice to avoid adverse space charge effects.

Stuhlinger, E.↗
NASA NTRS1986

Spacecraft mass spectrometer ion source employing field emission cathodes

An ion source that utilizes a pair of thin-film field emission cathodes to provide current for electric impact ionization is studied. The field emission cathodes are composed of microscopically small needle tips and an extraction electrode; the cathodes generate a 200-eV, 0.1-mA electron beam. The multistep process for the manufacturing of the field emission cathodes is examined. The operation of the ion source, which ionizes atoms and molecules that enter the mass spectrometer with a ram velocity of about 80 km/sec, is described.

Curtis, C. C.↗
NASA NTRS2005

Characterization of an 8-cm Diameter Ion Source System

Results of tests characterizing an 8-cm diameter ion source are presented. The tests were conducted in three separate vacuum test facilities at the University of Alabama-Huntsville, Colorado State University, and L3 Communications' ETI division. Standard ion optics tests describing electron backstreaming and total-voltage-limited impingement current behavior as a function of beam current were used as guidelines for selecting operating conditions where more detailed ion beam measurements were performed. The ion beam was profiled using an in-vacuum actuating probe system to determine the total ion current density and the ion charge state distribution variation across the face of the ion source. Both current density and ExB probes were utilized. The ion current density data were used to obtain integrated beam current, beam flatness parameters, and general beam profile shapes. The ExB probe data were used to determine the ratio of doubly to singly charged ion current. The ion beam profile tests were performed at over six different operating points that spanned the expected operating range of the DAWN thrusters being developed at L3. The characterization tests described herein reveal that the 8-cm ion source is suitable for use in (a) validating plasma diagnostic equipment, (b) xenon ion sputtering and etching studies of spacecraft materials, (c) plasma physics research, and (d) the study of ion thruster optics at varying conditions.

Li, Zhongmin↗
NASA NTRS1969

Spherical ion source

Radial focusing of electrons in ion source produces greater ion densities, resulting in higher resolution and focus capability for a given source volume. Electron beam is focused near exit aperture by spherical fields. High density ions allow focusing ion beam to high density at echo, allowing high current through small aperture.

Hall, L. G.↗
NASA NTRS1976

Application of ion thruster technology to a 30-cm multipole sputtering ion source

A 30-cm electron-bombardment ion source has been designed and fabricated for micromachining and sputtering applications. This source has a multipole magnetic field that employs permanent magnets between permeable pole pieces. An average ion current density of 1 ma/sq cm with 500-eV argon ions was selected as a design operating condition. The ion beam at this operating condition was uniform and well collimated, with an average variation of + or -5 percent over the center 20 cm of the beam at a distance up to 30 cm from the ion source.

Robinson, R. S.↗
NASA NTRS1982

Performance characteristics of a microwave plasma disk ion source

The development, design, and preliminary performance characteristics of a microwave plasma disk ion source are presented. Several important design concepts indigenous to microwave plasmas have been utilized in the development of this ion source: generation of a resonantly sustained microwave discharge inside a microwave/plasma coupler, probe and length tuning of the microwave/plasma coupler, and minimization of plasma volume. The experimental results for a 2.45 GHz, eight cm ion source excited in the TE(211) and TM(011) modes are described. Results are presented for electromagnetic mode excitation, electron density, coupling efficiency and loaded cavity Q, and I-V characteristics and efficiencies. It is preliminarily shown that a microwave disk-like plasma can be sustained adjacent to the grids with either TE or TM cavity modes at pressures below 2 x 10 to the -4th torr. Over 80% of the power absorbed in the cavity is coupled into the plasma.

Asmussen, J.↗
NASA NTRS1963

SPUTTERING ION SOURCE FOR SOLIDS

Sputtering argon ion source used for analysis of solids provides more stable operation than a spark source and allows electrometric recording of the mass spectrum

MASS SPECTROSCOPY↗
NASA NTRS1970

High temperature ion source

Modified Nielsen-type ion source produces temperatures up to 1500 degrees C and permits obtaining a plasma from low vapor-pressure materials. Design minimizes thermal stresses. Dual-filament discharge chamber achieves the high temperature and provides independent control of the heating and electron emission functions.

Swift, R.↗
NASA NTRS2012

Ion source with corner cathode

An ion source may include first, second, and third electrodes. The first electrode may be a repeller having a V-shaped groove. The second electrode may be an electron emitter filament disposed adjacent the base of the V-shaped groove. The third electrode may be an anode that defines an enclosed volume with an aperture formed therein adjacent the electron emitter filament. A potential of the first electrode may be less than a potential of the second electrode, and the potential of the second electrode may be less than a potential of the third electrode. A fourth electrode that is disposed between the electron emitter filament and the anode may be used to produce a more collimated electron beam.

Herrero, Federico A.↗
NASA NTRS1980

Rectangular beam (5 X 40 cm multipole ion source)

A 5 x 40 cm rectangular-beam ion source was designed and fabricated. A multipole field configuration was used to facilitate design of the modular rectangular chamber, while a three-grid ion optics system was used for increased ion current densities. For the multipole chamber, a magnetic integral of 0.000056 Tesla-m was used to contain the primary electrons. This integral value was reduced from the initial design value, with the reduction found necessary for discharge stability. The final value of magnetic integral resulted in discharge losses at typical operating conditions which ranged from 600 to 1000 eV/ion, in good agreement with the design value of 800 eV/ion. The beam current density at the ion optics was limited to about 3.2 mA/sq cm at 500 eV and to about 3.5 mA/sq cm at 1000 ev. The effects of nonuniform ion current, dimension tolerance, and grid thermal warping were considered. The use of multiple rectangular-beam ion sources to process wider areas than would be possible with a single source (approx. 40 cm) was also studied. Beam profiles were surveyed at a variety of operating conditions and the results of various amounts of beam overlap calculated.

Haynes, C. M.↗
NASA NTRS1986

Upwelling O(+) ion source characteristics

The characteristics of an upwelling ion source are discussed. A typical upwelling event is analyzed using Dynamic Explorer 1 satellite retarding ion mass spectrometer (RIMS) observations of the low-energy plasma, and energetic ion and local electromagnetic field observations. The RIMS spectrograms of the O(+) ion species, radial and axial head data for O(+), and spin plan O(+) distribution functions are examined. The features of the upwelling observed include: (1) transverse ion heating to temperature of 100,000 K, (2) large outward flows of O(+), (3) enhanced flow of H(+) and He (+), (4) moderately strong field-aligned current sheets, (5) an associated intense eastward convection channel, and (6) strong wave emissions in the range near and below the proton gyrofrequency. The association between the upwelling O(+) signature and auroral current is investigated. Plasma wave and electric field environments are studied and plasma flows and densities are derived. It is noted that the mechanism for ion heating which defines the source region for these polar ion outflows is related to field-aligned currents and an associated auroral convection channel or jet.

Moore, T. E.↗