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Calculated potential increase in solar cell array conversion efficiency with dispersion by diffraction grating
A technique has been developed which permits toroidal, and coma-corrected toroidal, diffraction gratings to be replicated from spherical master gratings by the use of elastically-deformable substrates. Toroidal gratings correct for astigmatism and, thus, make it possible to construct stigmatic spectrometers that employ a single reflective diffraction grating. These spectrometers are particularly useful for the extreme-ultraviolet (EUV) wavelength range, where reflection coefficients are low, since the single optical surface provides for dispersion, focusing, and astigmatism correction. The fabrication procedures for the pure toroidal, and coma-corrected toroidal, gratings are described, and initial test results are presented. The use of the toroidal gratings in a high-resolution sounding-rocket EUV spectroheliometer, and in both the coronal diagnostics spectrometer and the ultraviolet coronagraph spectrometer on the ESA/NASA solar and heliospheric observatory mission, is described briefly, and the use of this technique for the fabrication of a coma-corrected toroidal grating for the prime Rowland spectrograph of the FUSE/Lyman mission is briefly discussed.
The efficiency of a concave diffraction grating in a given order is obtained by measuring the intensities of the diffracted and incident beams and taking their ratio. A valid measurement requires that both the incident and diffracted beams be collected by the detector. At grazing incidence, however, the diffracted beam may spread beyond the detector due to aberrations. In addition, the diffracted beams of consecutive orders may overlap so that unambiguous efficiency measurements cannot be made. The effect of aberrations on efficiency measurements has been studied, using ray tracing, for the geometry of the measuring instrument in use at the Naval Research Laboratory. This instrument is attached to a VUV monochromator which furnishes a diverging beam. The main effect of aberrations for this instrument is a spread of the diffracted beam in the direction of dispersion. The width of the diffracted beam is wavelength dependent and is minimal at the horizontal focus, spreading to longer and shorter wavelengths. Reducing the divergence of the incident beam reduces the spread but, for small radius gratings, not always sufficiently so that the entire diffracted beam can be collected by the detector. The distance from the detector to the grating can also be adjusted to aid in collecting all the diffracted beam.
Among the many existing rigorous methods for analyzing diffraction of electromagnetic waves by diffraction gratings, the coupled-wave approach stands out because of its versatility and simplicity. It can be applied to volume gratings and surface relief gratings, and its numerical implementation is much simpler than others. In addition, its predictions were experimentally validated in several cases. These facts explain the popularity of the coupled-wave approach among many optical engineers in the field of diffractive optics. However, a comprehensive analysis of the convergence of the model predictions has never been presented, although several authors have recently reported convergence difficulties with the model when it is used for metallic gratings in TM polarization. Herein, three points are made: (1) in the TM case, the coupled-wave approach converges much slower than the modal approach of Botten et al; (2) the slow convergence is caused by the use of Fourier expansions for the permittivity and the fields in the grating region; and (3) is manifested by the slow convergence of the eigenvalues and the associated modal fields. The reader is assumed to be familiar with the mathematical formulations of the coupled-wave approach and the modal approach.
A device for position encoding of a rotating shaft in which a polygonal mirror having a number of facets is mounted to the shaft and a monochromatic light beam is directed towards the facets. The facets of the polygonal mirror each have a low line density diffraction grating to diffract the monochromatic light beam into a number of diffracted light beams such that a number of light spots are created on a linear array detector. An analog-to-digital converter is connected to the linear array detector for reading the position of the spots on the linear array detector means. A microprocessor with memory is connected to the analog-to-digital converter to hold and manipulate the data provided by the analog-to-digital converter on the position of the spots and to compute the position of the shaft based upon the data from the analog-to-digital converter.
A device for position encoding of a rotating shaft in which a polygonal mirror having a number of facets is mounted to the shaft and a monochromatic light beam is directed towards the facets. The facets of the polygonal mirror direct the light beam to a stand-alone low line density diffraction grating to diffract the monochromatic light beam into a number of diffracted light beams such that a number of light spots are created on a linear array detector. An analog-to-digital converter is connected to the linear array detector for reading the position of the spots on the linear array detector means. A microprocessor with memory is connected to the analog-to-digital converter to hold and manipulate the data provided by the analog-to-digital converter on the position of the spots and to compute the position of the shaft based upon the data from the analog-lo-digital converter.
Large diffraction gratings by interferometrically controlled commercial measuring machine
A simple visual test for the evaluation of concave diffraction gratings is described. It is twice as sensitive as the Foucault knife edge test, from which it is derived, and has the advantage that the images are straight and free of astigmatism. It is particularly useful for grating with high ruling frequency where the above image faults limit the utility of the Foucault test. The test can be interpreted quantitatively and can detect zonal grating space errors of as little as 0.1 A.
The objectives were to address currently unanswered fundamental questions concerning the fine scale structure of the chromosphere, transition region, and corona. The unique characteristics of the spectroheliometer was used in combination with plasma diagnostic techniques to study the temperature, density, and velocity structures of specific features in the solar outer atmosphere. A unified understanding was sought of the interplay between the time dependent geometry of the magnetic field structure and the associated flows of mass and energy, the key to which lies in the smallest spatial scales that are unobservable with current EUV instruments. Toroidal diffraction gratings were fabricated and tested by a new technique using an elastically deformable substrate. The toroidal diffraction gratings was procured and tested to be used for the evaluation of the Multi-Anode Microchannel Array (MAMA) detector systems for the Solar Ultraviolet Measurements of Emitted Radiation (SUMER) and UV Coronagraph Spectrometer (UVCS) instruments on the SOHO mission.
Optical modulation through Doppler frequency shift obtained by rotating radial diffraction grating
This program was directed toward the production of Echelle diffraction gratings by a light-driven, electrochemical etching technique (photoelectrochemical etching). Etching is carried out in single crystal materials, and the differential rate of etching of the different crystallographic planes used to define the groove profiles. Etching of V-groove profiles was first discovered by us during the first phase of this project, which was initially conceived as a general exploration of photoelectrochemical etching techniques for grating fabrication. This highly controllable V-groove etching process was considered to be of high significance for producing low pitch Echelles, and provided the basis for a more extensive Phase 2 investigation.
Techniques for ruling improved large diffraction gratings
The effect of multilayer coating application on the performance of a diffraction grating in the EUV spectral region was evaluated by examining the performance of a 3600-line/mm and a 1200-line/mm replica blazed gratings, designed for operation in the 300-A spectral region in first order. A ten-layer IrSi multilayer optimized for 304 A was deposited using electron-beam evaporation. The grating efficiency was measured on the SURF II calibration beamline in a chamber designed for calibrating the solar EUV rocket telescope and spectrograph multilayer coatings. A significant (by a factor of about 7) enhancement in grating efficiency in the 300-A region was demonstrated.
A high-precision optical method is presented for aligning diffraction grating molds with the edges of specimens in moire interferometry. The alignment fixture is simple and convenient to operate. The conventional method of grating-mold alignment has a wide band of uncertainty in the range of error which is not compatible with the required precision of high-sensitivity moire interferometry. Following a description of the alignment technique, both the single-edge and parallel-edge guide bar optical alignment methods are introduced and compared.
Gray-scale x-ray lithography is undergoing development as a technique for fabricating blazed diffraction gratings. As such, gray-scale x-ray lithography now complements such other grating-fabrication techniques as mechanical ruling, holography, ion etching, laser ablation, laser writing, and electron-beam lithography. Each of these techniques offers advantages and disadvantages for implementing specific grating designs; no single one of these techniques can satisfy the design requirements for all applications. Gray-scale x-ray lithography is expected to be advantageous for making gratings on steeper substrates than those that can be made by electron-beam lithography. This technique is not limited to sawtooth groove profiles and flat substrates: various groove profiles can be generated on arbitrarily shaped (including highly curved) substrates with the same ease as sawtooth profiles can be generated on flat substrates. Moreover, the gratings fabricated by this technique can be made free of ghosts (spurious diffraction components attributable to small spurious periodicities in the locations of grooves). The first step in gray-scale x-ray lithography is to conformally coat a substrate with a suitable photoresist. An x-ray mask (see Figure 1) is generated, placed between the substrate and a source of collimated x-rays, and scanned over the substrate so as to create a spatial modulation in the exposure of the photoresist. Development of the exposed photoresist results in a surface corrugation that corresponds to the spatial modulation and that defines the grating surface. The grating pattern is generated by scanning an appropriately shaped x-ray area mask along the substrate. The mask example of Figure 1 would generate a blazed grating profile when scanned in the perpendicular direction at constant speed, assuming the photoresist responds linearly to incident radiation. If the resist response is nonlinear, then the mask shape can be modified to account for the nonlinearity and produce a desired groove profile. An example of grating grooves generated by this technique is shown in Figure 2. A maximum relative efficiency of 88 percent has been demonstrated.
Numerical methods, using rigorous coupled wave theory, are used to design rectangular relief diffraction gratings for an infrared application which requires comparable first order efficiencies in the TE and TM polarization states. The depth, period, and fill factor of the grating are varied to identify optimal two level binary lamellar grating profiles which predict efficiencies for individual TM and TE polarizations above 75 percent, while keeping the difference between the two efficiencies within 10 percent. The application at hand is a rotating, transmissive diffractive scanner for space-based coherent lidar. The operating wavelength is 2.0 microns. A collimated, circularly polarized beam is incident on the diffractive scanner at the Bragg angle; 30 and 45 degree beam deflection angles being studied. Fused silica is the substrate material of choice. Selected designs are fabricated on 3 inch fused silica substrates using lithographic methods. The performance of the test pieces is measured and compared to theoretical predictions.
The state of current planar techniques in the fabrication of Fresnel zone plates and diffraction gratings is reviewed. Among the fabrication techniques described are multilayer resist techniques; scanning electron beam lithography; and holographic lithography. Consideration is also given to: X-ray lithography; ion beam lithography; and electroplating. SEM photographs of the undercut profiles obtained in a type AZ 135OB photoresistor by holographic lithography are provided.
As a dispersing device for spectroscopy, the prism was by 1950 being supplanted by the diffraction grating, which provided broader spectrum coverage, gave higher intrinsic dispersion, and was more flexible to use. Today most gratings are three-dimensional and blazed, being embossed with thousands of identical mirrors. The relative merits of gratings in comparison with new interferometric scanning devices are examined, taking into account Fourier spectroscopy. Problems of grating ruling are discussed together with the status of ruling engines, and questions of ruling with mechanical engines.