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At least 37 records · Page 2

Atom-atom inelastic collisions and three-body atomic recombination in weakly ionized argon plasmas

A stationary collisional-radiative model including both inelastic electron-atom and atom-atom collisions is used to examine nonequilibrium weakly ionized argon plasmas with atomic densities 10 to the 16th to 10 to the 20th/cu cm, temperatures below 6000 K, and with different degrees of radiation trapping. It is shown that three-body atomic recombination becomes important at high particle densities. Comparison is made between the present approach and Thomson's theory for atomic recombination.

Braun, C. G.

X-ray Photoelectron Spectroscopy Study of Argon-Plasma-Treated Fluoropolymers

Films of poly(tetrafluoroethylene) (PTFE) and of a tetrafluoroethylene-perfluoroalkyl vinyl ether (approximately 49:1) copolymer (PFA) were exposed to a radio-frequency argon plasma and then examined by X-ray photoelectron spectroscopy (XPS). The use of fluoropolymer films nearly free of surface hydrocarbon contamination as well as the use of a monochromatized X-ray source for XPS removed two factors contributing to conflicting reports on the effect of exposure time on the fluorine-to-carbon (F/C) and oxygen-to-carbon (O/C) ratios for several Ar-plasma-treated fluoropolymers. Contrary to literature indications, a common pattern was found for PTFE and PFA: a moderate decrease in F/C ratio (from 1.99 to 1.40, and from 1.97 to 1.57, respectively), together with a moderate increase in O/C ratio (from negligible to about 0.10, and from 0.012 to about O.10, respectively) at very short exposures, after which the F/C ratios remained essentially constant on prolonged exposures, while the O/C ratios for PTFE and PFA leveled off at 0.11 and 0.15, respectively. The XPS C(sub 1s), spectra for these polymers exposed to the Ar plasma for 20 min were similar and presented, besides a prominent peak at 292.0 eV (CF2,) and a minor peak at 294.0 or 294.1 eV (CF3), a composite band of four curve-resolved peaks (approximately 285-290 eV) representing various CH, CC, CO, CN, and CF functionalities.

Golub, Morton A.

Numerical simulations of a nonequilibrium argon plasma in a shock-tube experiment

A code developed for the numerical modeling of nonequilibrium radiative plasmas is applied to the simulation of the propagation of strong ionizing shock waves in argon gas. The simulations attempt to reproduce a series of shock-tube experiments which will be used to validate the numerical models and procedures. The ability to perform unsteady simulations makes it possible to observe some fluctuations in the shock propagation, coupled to the kinetic processes. A coupling mechanism by pressure waves, reminiscent of oscillation mechanisms observed in detonation waves, is described. The effect of upper atomic levels is also briefly discussed.

Cambier, Jean-Luc

Operating characteristics of a hydrogen-argon plasma torch for supersonic combustion applications

The residence time of the combustible mixture in the combustion chamber of a scramjet engine is much less than the time normally required for complete combustion. Hydrogen and hydrocarbon fuels require an ignition source under conditions typically found in a scramjet combustor. Analytical studies indicate that the presence of hydrogen atoms should greatly reduce the ignition delay in this environment. Because hydrogen plasmas are prolific sources of hydrogen atoms, a low-power, uncooled hydrogen plasma torch has been built and tested to evaluate its potential as a possible flame holder for supersonic combustion. The torch was found to be unstable when operated on pure hydrogen; however, stable operation could be obtained by using argon as a body gas and mixing in the desired amount of hydrogen. The stability limits of the torch are delineated and its electrical and thermal behavior documented. An average torch thermal efficiency of around 88 percent is demonstrated.

Barbi, E.

Ionization dynamics of intense laser-produced argon plasmas revealed by NLTE modeling

The ionization dynamics and transient behavior of under-dense plasma irradiated by an intense laser are investigated. We report two significant effects in the ionization behavior: (1) a surprisingly large delay in ionization response and (2) a stepwise ionization process which involves collisional and laser-driven photoionization (LDP) processes. Ionization induced by intense lasers can exhibit delayed responses due to rapid changes in conditions, particularly when atomic transition processes occur more slowly than the relevant time scales. Furthermore, modeling reveals that the two-step ionization process—collisional excitation followed by LDP—plays an important role in this ionization delay, with collisional excitation acting as the bottleneck. Even low-energy photons (∼3.5 eV) can predominantly ionize plasmas, challenging the conventional belief that such energies are insufficient to overcome the binding energy of bound electrons. These findings underscore the necessity of including such processes into plasma simulations for various laser-plasma experiments.

Collisional excitation

Anode heat transfer for a flowing argon plasma at elevated electron temperature.

Theoretical investigation of heat transfer from a preionized gaseous plasma flowing over an anode surface at an elevated electron temperature in the presence of an electric field normal to the surface. A laminar boundary layer is considered in which only the velocity profile is locally similar and fluid properties are assumed to change uniformly in the gas flow direction. Results obtained by an approximation method show that for moderate current densities, the velocity and temperature distributions are insensitive to current. In addition, the effect of elevated electron temperature is negligible on convective heat transfer, but is significant for the overall heat transfer due to the enthalpy transport by current. Total heat flux to the anode is obtained by evaluating the Nusselt number and adding terms due to the potential drop in the sheath and the surface work function.

Bose, T. K.

Use of a nitrogen-argon plasma to improve adherence of sputtered titanium carbide coatings on steel

Friction and wear experiments on 440-C steel surfaces that had been RF-sputtered with titanium carbide when a small percentage of nitrogen was added to the plasma were conducted. X-ray photoelectron spectroscopy and X-ray diffraction were used to analyze the resultant coatings. Results indicate that a small partial pressure of nitrogen (about 0.5%) markedly improves the adherence, friction, and wear properties when compared with coatings applied on sputter-etched oxidized surfaces or in the presence of a small oxygen partial pressure. The improvements are related to the formation of an interface containing a mixture of the nitrides of titanium and iron, which are harder than their corresponding oxides.

Brainard, W. A.

Measurements of seeded argon-hydrogen plasma properties.

Seeded argon-hydrogen plasmas have been produced at Georgia Tech in order to experimentally measure composition, temperature, radiant heat output and opacity. The plasma, seeded with submicron tungsten particles, simulates the propellant of a gaseous core nuclear rocket. These measurements are needed to predict the dynamic behavior of the operating gas core reactor. The temperature range in which the seed has vaporized but the hydrogen itself has not yet become opaque is known as the seed-hydrogen opacity window. Preliminary opacity data in this temperature range will be presented.

Benns, R. A.

Design and evaluation of a new injector configuration for supersonic combustion

Ignition and flameholding behavior data are presented from experiments with a novel scramjet injector configuration consisting of five small upstream pilot fuel injectors, a rearward-facing step, and three primary fuel injectors downstream of the step; all injection is perpendicular to the Mach 2 airflow, and the ignition source is located in the recirculation region downstream of the step. The design attempts to minimize the amount of igniter energy required for ignition, but without introduction of the large losses associated with bluff bodies. Argon plasma, argon-hydrogen plasma, pyrophoric silane/hydrogen, and surface-discharge ignition sources are tested. The injector is found to be able to hold flames at 1400 R total temperatures without the use of large bluff bodies; the argon-hydrogen plasma was the most effective igniter.

Wagner, Timothy C.

Detection of Chamber Conditioning by CF4 in the GEC Cell

During oxide etch processes, buildup of fluorocarbon residues on reactor sidewalks can cause to drift and will necessitate time for conditioning and cleaning of the reactor. Various measurements in CF4 and Ar plasmas are made in an attempt to identify a metric able to indicate the chamber condition. Mass spectrometry and a Langmuir probe shows that the buildup of fluorocarbon films on the reactor surface causes a decrease in plasma floating potential, plasma potential, and ion energy in argon plasmas. This change in floating potential is also observed in CF4 plasma operation, and occurs primarily during the first hour and a half of plasma operation. A slight rise in electron density is also observed in the argon plasmas. Because the change is seen in an argon plasma, it is indicative of altered physical, not chemical, plasma-surface interactions. Specifically, the insulating films deposited on metal surfaces alter the electromagnetic fields seen by the plasma, affecting various parameters including the floating potential and electron density. An impedance probe placed on the inductive coil shows a slight reduction in plasma impedance due to this rising electron density. The optical emission of several species, including CF, C2, atomic Si and atomic C, is also monitored for changes in density resulting from the buildup of film on the chamber wall. Changes in the optical emission spectrum are comparable to the noise levels in their measurement.

Cruden, Brett A.

Detection of Chamber Conditioning Through Optical Emission and Impedance Measurements

During oxide etch processes, buildup of fluorocarbon residues on reactor sidewalls can cause run-to-run drift and will necessitate some time for conditioning and seasoning of the reactor. Though diagnostics can be applied to study and understand these phenomena, many of them are not practical for use in an industrial reactor. For instance, measurements of ion fluxes and energy by mass spectrometry show that the buildup of insulating fluorocarbon films on the reactor surface will cause a shift in both ion energy and current in an argon plasma. However, such a device cannot be easily integrated into a processing system. The shift in ion energy and flux will be accompanied by an increase in the capacitance of the plasma sheath. The shift in sheath capacitance can be easily measured by a common commercially available impedance probe placed on the inductive coil. A buildup of film on the chamber wall is expected to affect the production of fluorocarbon radicals, and thus the presence of such species in the optical emission spectrum of the plasma can be monitored as well. These two techniques are employed on a GEC (Gaseous Electronics Conference) Reference Cell to assess the validity of optical emission and impedance monitoring as a metric of chamber conditioning. These techniques are applied to experimental runs with CHF3 and CHF3/O2/Ar plasmas, with intermediate monitoring of pure argon plasmas as a reference case for chamber conditions.

Cruden, Brett A.

XPS Study of Plasma- and Argon Ion-Sputtered Polytetrafluoroethylene

The similarity of plasma-polymerized tetrafluoroethylene (PPTFE) and the fluoropolymer film deposited by rf (radio frequency) plasma sputtering (SPTFE) of polytetrafluoroethylene (PTFE), noted earlier in the literature, has been reconfirmed. FT-IR (Fourier Transform Infrared), XPS (X ray Photoelectron Spectroscopy) and UV (ultraviolet) spectroscopy has been employed in apparently the first study to involve preparation of PPTFE and SPTFE in the same reactor and under comparable low-power plasma conditions. Most of the work concerned the use of He or Ar as sputtering gas, but some runs were also carried out with the other rare gases Ne, Kr and Xe. The C1s XPS spectra of SPTFE films displayed a relatively higher content of CF2 groups, and yielded higher F/C (fluorine / carbon) ratios, than PPTFE films, while the SPTFE films were somewhat more transparent in the UV than PPTFE. The F/C ratios for SPTFE were essentially independent of the rare gas used for sputtering. Increasing rf power from 10 to 50 W for Xe plasma-sputtering of PTFE resulted in successively lower F/C ratios (1.55 to 1.21), accompanied by sputtering of the glass reactor occurring at 40 W and above. Some limited XPS, FT-IR and UV data are presented on Ar ion-sputtered PTFE.

Golub, Morton A.

Correlations between plasma variables and the deposition process of Si films from chlorosilanes in low pressure RF plasma of argon and hydrogen

The dissociation of chlorosilanes to silicon and its deposition on a solid substrate in a RF plasma of mixtures of argon and hydrogen were investigated as a function of the macrovariables of the plasma. The dissociation mechanism of chlorosilanes and HCl as well as the formation of Si in the plasma state were studied by sampling the plasma with a quadrupole mass spectrometer. Macrovariables such as pressure, net RF power input and locations in the plasma reactor strongly influence the kinetics of dissociation. The deposition process of microcrystalline silicon films and its chlorine contamination were correlated to the dissociation mechanism of chlorosilanes and HCl.

Avni, R.