DOE OSTI · 3365829
Investigating Nitrogen Diffusion in Silicon through Scanning Tunneling Microscopy
Abstract
Presentation for EIPBN (3Beams) focusing on nitrogen diffusion and chemical changes at the surface of silicon. Includes presentation and several backup slides, mostly STM images.
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Sheridan, Thomas Robert [Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)] (ORCID:0000000262474418), Ivie, Jeffrey Andrew [Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)] (ORCID:0000000198428475), Allemang, Christopher Richard [Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)] (ORCID:0000000187120782), Campbell, DeAnna Marie [Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)] (ORCID:0000000235051065). 2025-05-01. Investigating Nitrogen Diffusion in Silicon through Scanning Tunneling Microscopy. https://doi.org/10.2172/3365829
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