DOE OSTI · 2505070
Amorphization and siliconization of silicon carbide as a first wall material
Abstract
The understanding and prediction of silicon carbide (SiC) material evolution exposed to SOL plasma conditions is of prime interest because SiC represents a promising main chamber wall plasma-facing material for next-step fusion devices (low hydrogenic diffusion, good mechanical and thermal properties under neutron irradiation). Gross and net Si erosion rates from SiC surfaces in contact with a well-diagnosed L-mode plasma in the DIII-D tokamak have been simulated and the surface concentrations of impurities have been tracked as a function of time. Coupled simulation of surface model and impurity transport demonstrates amorphization of crystalline SiC exposed to L-mode plasma due to the accumulation of displacement damages under ion irradiation. This affects the lifetime of SiC plasma facing components. Surface evolution is tightly coupled to impurity transport in the plasma and therefore needs to be integrated with impurity transport simulations to effectively predict Si erosion rates and sub-surface concentrations as a function of time. The simulation workflow couples a semi-analytical surface model to the impurity transport code GITR. The surface model is a homogeneous mixed-material model that tracks physical & chemical sputtering and reflection of impurities. Gross erosion is primarily influenced by the background plasma parameters and redeposition patterns are mainly influenced by the prompt redeposition due to the gyro-orbits of impurity ions. Although crystalline form of SiC is preferable for fusion wall applications because of resistance to neutron irradiation, this work indicates that crystalline SiC will undergo amorphization under D plasma contact with implications of higher sputtering and fuel retention. These results direct us to explore the effects of amorphization on crystalline SiC and further the physics basis of SiC usage as first wall material for fusion environments.
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De, Aritra [Oak Ridge Associated Universities (ORAU), Oak Ridge, TN (United States)] (ORCID:0000000178828068), Guterl, Jerome [General Atomics, San Diego, CA (United States)] (ORCID:0000000210493094), Bergstrom, Zachary [General Atomics, San Diego, CA (United States)] (ORCID:000000025463790X), Abrams, Tyler [General Atomics, San Diego, CA (United States)] (ORCID:0000000296056871), Sinclair, Gregory [General Atomics, San Diego, CA (United States)] (ORCID:000000034195177X), Elder, John David [University of Toronto, ON (Canada)] (ORCID:0000000333505841), Rudakov, Dmitry [University of California, La Jolla, San Diego, CA (United States)] (ORCID:0000000252664269). 2025-01-24. Amorphization and siliconization of silicon carbide as a first wall material. https://doi.org/10.1088/1741-4326%2Fada8bd
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