DOE OSTI · 2293953
Atomic layer deposition with passivation treatment
Abstract
A method includes: 1) performing an atomic layer deposition cycle including (a) introducing precursors into a deposition chamber housing a substrate to deposit a material on the substrate; and (b) introducing a passivation gas into the deposition chamber to passivate a surface of the material; and 2) repeating 1) a plurality of times to form a film of the material.
Keep this discovery
Explore connections, maps & timelines
Prinz, Friedrich B., Xu, Shicheng, English, Timothy, Provine, John, Thian, Dickson, Torgersen, Jan. 2023-12-05. Atomic layer deposition with passivation treatment. https://www.osti.gov/biblio/2293953
Cite the original work for its findings. Save a collection to share your selection of sources.