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NASA NTRS · 20210003031

Nanometer X-ray Lithography

Malek, C.·Hartley, F.
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Abstract

New developments for X-ray nanomachinging include pattern transfer onto non-planar surfaces coated with eletrodeposited resists using synchrotron radion X-rays through extremely high-resolution masks made by chemically assisted focused ion beam lithography.

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X-rayslithographyonnon-planarsurfacesconformalcoatinglargedepth-of-fieldnanolithography

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Malek, C., Hartley, F.. 1999-10-29. Nanometer X-ray Lithography. https://ntrs.nasa.gov/citations/20210003031

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