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Malek, C.

Publications and source records attributed to Malek, C..

Fast prototyping of high-aspect ratio, high-resolution x-ray masks by gas-assisted focused ion beam

The capacity of chemically-assisted focused ion beam (fib) etching systems to undertake direct and highly anisotropic erosion of thin and thick gold (or other high atomic number [Z])coatings on x-ray mask membranes/substrates provides new levels of precision, flexibility, simplification and rapidity in the manufacture of mask absorber patterns, allowing the fast prototyping of high aspect ratio, high-resolution masks for deep x-ray lithography.

fast prototyping of high-aspect ratio high-resolut↗

Nanometer X-ray Lithography

New developments for X-ray nanomachinging include pattern transfer onto non-planar surfaces coated with eletrodeposited resists using synchrotron radion X-rays through extremely high-resolution masks made by chemically assisted focused ion beam lithography.

X-rays↗

X-Ray Exposure of Electron-Deposited Photoresist for Conformal Lithography on Corrugated Surfaces

Proximity printing using synchrotron X-ray lithography provides high resolution pattern transfer with large depth of field, low diffraction effects and no reflection from the substrate. Electro-plating of photo-resist allows deposition of thin, uniform films over geometrically complex and topographically diverse, electrically conductive surfaces.

Electron-deposited resist X-ray lithography Deep d↗

Fabricating Sub-collimating Grids for an X-ray Solar Imaging Spectrometer using LIGA Techniques

This paper describes fabrication of sub-collimating X-ray grids that are used in an instrument for the High Energy Solar Spectroscopic Imager ( HESSI ), a proposed NASA mission that will promote understanding of solar particle acceleration and explosive energy release in the magnetized plasmas at the Sun. The HESSI comprises 12 rotating pairs of high-aspect-ratio, high-Z grids; each pair is separated by 1.7 meters and backed by a single Ge detector.

x-ray↗