NASA NTRS ยท 19840021022
High density circuit technology, part 4
Abstract
An accurate study and evaluation of dielectric thin films is conducted in order to find the material or combination of materials which would optimize NASA'S double layer metal process. Emphasis is placed on polyimide dielectrics because of their reported outstanding dielectric characteristics (including electrical, chemical, thermal, and mechanical) and ease of processing, as well as their rapid acceptance by the semiconductor industry.
Keep this discovery
Explore connections, maps & timelines
Wade, T. E.. 1982-03-01. High density circuit technology, part 4. https://ntrs.nasa.gov/citations/19840021022
Cite the original work for its findings. Save a collection to share your selection of sources.