NASA NTRS · 19720023638
Mask and pattern characteristics
Abstract
The use of the mask and pattern facility to include information on equipment accuracy, limitations, and pattern making capabilities is discussed. An insight is provided into potential areas of pattern applications, the sequence of mask making, as well as possible inputs and outputs available to the user.
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Routh, D. E.. 1972-08-01. Mask and pattern characteristics. https://ntrs.nasa.gov/citations/19720023638
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