NASA NTRS · 19690000619
Pulsed high-voltage dc RF sputtering
Abstract
Sputtering technique uses pulsed high voltage direct current to the object to be plated and a radio frequency sputtered film source. Resultant film has excellent adhesion, and objects can be plated uniformly on all sides.
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Przybyszewski, J. S., Jr., Shaltens, R. K.. 1969-12-01. Pulsed high-voltage dc RF sputtering. https://ntrs.nasa.gov/citations/19690000619
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