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Wittry, David B.

Publications and source records attributed to Wittry, David B..

Dual cathode system for electron beam instruments

An electron beam source having a single electron optical axis is provided with two coplanar cathodes equally spaced on opposite sides from the electron optical axis. A switch permits selecting either cathode, and a deflection system comprised of electromagnets, each with separate pole pieces equally spaced from the plane of the cathodes and electron optical axis, first deflects the electron beam from a selected cathode toward the electron optical axis, and then in an opposite direction into convergence with the electron optical axis. The result is that the electron beam from one selected cathode undergoes a sigmoid deflection in two opposite directions, like the letter S, with the sigmoid deflection of each being a mirror image of the other.

Bradley, James G.

Dual-Cathode Electron-Beam Source

Beam from either cathode electromagnetically aligned with exit port. Electron beam from either of two cathodes deflected by magnetic and electric fields to central axis. Mechanical alignment of beam easy because cathode axes, anode apertures, and electron trajectories coplanar. Applications where uninterrupted service needed: scanning electron microscopes, transmission electron microscopes, electron-beam lithography equipment, Auger instruments, and microfocused x-ray sources.

Bradley, James G.