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Thakoor, A. P.

Publications and source records attributed to Thakoor, A. P..

40 records · Page 3

Corrosion behavior of magnetron sputter-deposited (Mo/0.6/Ru/0.4/)82B18 and Mo82B18 amorphous metal films

Amorphous metallic films of Mo49Ru33B18 and Mo82B18 have been prepared by magnetron sputtering, and their corrosion behavior was investigated and compared with amorphous liquid-quenched Mo49Ru33B18 and crystalline Mo i acidic and basic solutions. Sputtered Mo49Ru33B18 showed lower corrosion rates compared with liquid-quenched Mo49Ru33B18, owing to the superior surface smoothness and uniformity of the former. Amorphous Mo82B18 showed low corrosion rates in both acidic and basic aqueous solutions. Comparison of the corrosion properties of Mo49Ru33B18 with Mo82B18 and Mo demonstrates the roles of the alloys' constituents. Ru significantly extends the passive region to high-anodic potentials, but, at less-anodic potentials, Mo82B18 has the lowest corrosion rate.

Williams, R. M.↗

Observation of surface states on gold films by electron tunneling spectroscopy

It is pointed out that inelastic electron tunneling spectroscopy (IETS) is a useful technique for the study of vibrational modes of molecules adsorbed on the surface of the insulating layer in a metal-insulator-metal tunnel junction. A detailed study of electron tunneling in aluminum-aluminum oxide-gold (Al-Al2O3-Au) tunnel junctions has been conducted with an overall goal of exploring possible mechanisms in such a thin film device useful for chemical sensing. For an understanding of the electronic effects in the presence of chemicals in a junction, the electronic surface properties of the metallic films in a clean tunnel junction must be established. The present investigation is concerned with room temperature observations of electronic states on the surface of highly oriented gold film in Al-Al2O3-Au junctions.

Lambe, J.↗

Influence of the microstructure on the corrosion behavior of magnetron sputter-quenched amorphous metallic alloys

The microstructure and corrosion behavior of magnetron sputter deposited amorphous metallic films of (Mo6ORu40)82B18 under varying sputtering atmospheres have been investigated. The microstructural details and topology of the films have been studied by scanning electron microscopy and correlated with the deposition conditions. By reducing the pressure of pure argon gas, the characteristic features of rough surface and columnar growth full of vertical voids can be converted into a mirror-smooth finish with very dense deposits. Films deposited in the presence of O2 or N2 exhibit columnar structure with vertical voids. Film deposited in pure argon at low pressure show remarkably high corrosion resistance due to the formation of a uniform passive surface layer. The influence of the microstructure and surface texture on the corrosion behavior is discussed.

Thakoor, A. P.↗