Effects of phosphorus diffusions in epitaxial silicon layers.
Phosphorus diffusion into epitaxial silicon layers studied by electrical and structural characteristics of epitaxial diffused planar junctions
Chu, T. L.↗
Engineering topics
Stickler, R.
Publications and source records attributed to Stickler, R..
Microinhomogeneity problems in silicon.
Electron microscopy analysis of microinhomogeneities in commercial Si used in preparation of p-n junction devices
INHOMOGENEITY↗
A study of the relationship of crystal defects to reliability of epitaxial silicon planar devices summary report, jul. 1964 - jun. 1965
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Chu, T. L.↗