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Meier, G. H.

Publications and source records attributed to Meier, G. H..

8 records
All sourcesNASA NTRSDOE OSTI
NASA NTRS1983

Low temperature hot corrosion

The reaction of Co-Cr, Ni-Cr, Co-Cr-Al, and Ni-Cr-Al alloys with Na2SO4 in the presence of SO3 at temperatures between 700 and 750 C leads to the formation of liquid CoSO4-Na2SO4 or NiSO4-Na2SO4 deposits on the alloy surface. The formation of Cr2O3 and/or Al2O3 below this deposit results in a locally low P(O2) and a higher P(S2) and P(SO2). It is noted that these conditions can prevent protective oxide formation either by sulfide formation in the alloy, which localizes the Cr and/or Al in discrete particles, or by acid fluxing involving a reaction between Al2O3 or Cr2O3 and SO2 to form a salt-soluble species and subsequent reprecipitation as porous oxides in regions of higher P(O2). These processes may occur simultaneously, although a given alloy generally exhibits features of predominantly one type. Here, the Ni-Cr and Ni-Cr-Al alloys, and to some extent the Co-Cr alloys, exhibit features indicative of the sulfidation mechanism, whereas the morphology for the Co-Cr-Al alloy is more consistent with a predominant acid fluxing mechanism.

Chiang, K. T.↗
NASA NTRS1982

Mechanism of hot corrosion of IN-738

The Na2SO4 - induced hot corrosion of IN-738 in the temperature range 900 C to 1000 C is characterized by an initiation stage during which the corrosion rate is slow followed by a propagation stage during which the corrosion rate is markedly accelerated. In the second stage, corrosion is accelerated due essentially to a sulfidation/oxidation mechanism; in the third stage, the rate becomes catastrophic due to acid fluxing induced by an accumulation of refractory metal oxides (particularly MoO3) in the Na2SO4. The sequential stages in the corrosion process are described and a mechanism proposed. The influence of alloy microstructure on the corrosion mechanism is also discussed.

Meier, G. H.↗
NASA NTRS1980

Hot corrosion of Co-Cr, Co-Cr-Al, and Ni-Cr alloys in the temperature range of 700-750 deg C

The effect of SO3 pressure in the gas phase on the Na2SO4 induced hot corrosion of Co-Cr, Ni-Cr, and Co-Cr-Al alloys was studied in the temperature range 700 to 750 C. The degradation of the Co-Cr and Ni-Cr alloys was found to be associated with the formation of liquid mixed sulfates (CoSO4-Na2SO4 or NiSO4-Na2SO4) which provided a selective dissolution of the Co or Ni and a subsequent sulfidation oxidation mode of attack which prevented the maintenance of a protective Cr2O3 film. A clear mechanism was not developed for the degradation of Co-Cr-Al alloys. A pitting corrosion morphology was induced by a number of different mechanisms.

Chiang, K. T.↗
NASA NTRS1979

An investigation of the initiation stage of hot corrosion in Ni-base alloys

The mechanisms which lead to the destruction of a normally protective scale during the initial stages of hot corrosion of 14 nickel-base alloys contaminated with Na2SO4 and other condensed deposits were investigated. A continuous reading microbalance was used to record weight changes at temperatures between 900 C and 1000 C at 1 atmosphere pressure of slowly flowing oxygen. The reaction was initiated by raising a preheated furnace around the quartz tube in which the specimen was supported with oxygen flowing. The furnace was raised in a time period of seconds. At 900 C, the system and specimen came to thermal equilibrium in less than one minute. Oxidized specimens were studied using optical and scanning electron metallography and X-ray diffraction techniques. Transmission electron microscopy and electron diffraction spectroscopy were also used to identify the structure of carbides in some of the commercial alloys.

Huang, T. T.↗
NASA NTRS1979

An investigation of the initiation stage of hot corrosion in Ni-base alloys

The commercial nickel base alloy, IN-738, and high purity laboratory alloys were prepared to simulate the effects of the major elements in IN-738. Results indicate that the initiation of hot corrosion attack of IN-738 and other similar alloys is the result of local penetration of molten salt through the protective oxide scale.

Huang, T. T.↗
NASA NTRS1976

Development and study of chemical vapor deposited tantalum base alloys

A technique for the chemical vapor deposition of alloys was developed. The process, termed pulsing, involves the periodic injection of reactant gases into a previously-evacuated reaction chamber where they blanket the substrate almost instantaneously. Formation of alternating layers of the alloy components and subsequent homogenization allows the formation of an alloy of uniform composition with the composition being determined by the duration and relative numbers of the various cycles. The technique has been utilized to produce dense alloys of uniform thickness and composition (Ta- 10 wt % W) by depositing alternating layers of Ta and W by the hydrogen reduction of TaCl5 and WCl6. A similar attempt to deposit a Ta - 8 wt % W - 2 wt% Hf alloy was unsuccessful because of the difficulty in reducing HfCl4 at temperatures below those at which gas phase nucleation of Ta and W occurred.

Meier, G. H.↗
NASA NTRS1975

Preparation of tantalum-based alloys by a unique CVD process

The paper describes a sequential pulsing technique for deposition of refractory alloys and evaluates the technique for the deposition of the tantalum-base alloys Ta-10W (Ta-10 st% W) and T-111 (Ta-8 wt% W-2 wt% Hf). The deposition cycle for Ta-10W was chosen as alternate injections of TaCl5 plus hydrogen and WCl6 plus hydrogen. The cycle for T-111 was chosen as injections of TaCl5 plus hydrogen interspersed with injections of WCl6 plus hydrogen. A temperature range of 900-1300 C was chosen for both alloys. The ability of the pulse process to blanket a uniformly heated section of substrate with a mixture of gases, whose composition varies not with position on the substrate but instead with time of residence in the reactor, allows metal of uniform thickness to be deposited. It is shown that Ta and W can be deposited at high temperature with the formation of a dense columnar grain structure, so that the feasibility of preparing uniformly thick deposits of these elements by a 'pulsing' modification of CVD is demonstrated. A similar attempt to deposit T-111 was unsuccessful due to the difficulty in reducing HfCl4.

Bryant, W. A.↗