Asymmetry in Charge Sensing for Silicon MOS Double Quantum Dot with Finite Bias.
Abstract Not Provided
Nguyen, Khoi Thi↗
Engineering topics
Grubbs, Robert K
Publications and source records attributed to Grubbs, Robert K.
Asymmetry in Charge Sensing for Silicon MOS Double Quantum Dot with Finite Bias.
Abstract Not Provided
Lilly, Michael↗
Asymmetry in Charge Sensing for Silicon MOS Double Quantum Dot with Finite Bias.
Abstract Not Provided
Lilly, Michael↗
Nanostructure templating using low temperature atomic layer deposition
Methods are described for making nanostructures that are mechanically, chemically and thermally stable at desired elevated temperatures, from nanostructure templates having a stability temperature that is less than the desired elevated temperature. The methods comprise depositing by atomic layer deposition (ALD) structural layers that are stable at the desired elevated temperatures, onto a template employing a graded temperature deposition scheme. At least one structural layer is deposited at an initial temperature that is less than or equal to the stability temperature of the template, and subsequent depositions made at incrementally increased deposition temperatures until the desired elevated temperature stability is achieved. Nanostructure templates include three dimensional (3D) polymeric templates having features on the order of 100 nm fabricated by proximity field nanopatterning (PnP) methods.
77 NANOSCIENCE AND NANOTECHNOLOGY↗