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Chutjian, A.

Publications and source records attributed to Chutjian, A..

At least 145 records · Page 8

Experimental investigations of low-energy (4 to 40 eV) collisions of O(-)(P2) ions and O(P3) atoms with surfaces

Using a newly-developed, magnetically confined source, low-energy, ground state oxygen negative ions and neutral atoms are generated. The energy range is variable, and atom and neutrals have been generated at energies varying from 2 eV to 40 eV and higher. It was found that the interaction of these low-energy species with a solid magnesium fluoride target leads to optical emissions in the (at least) visible and infrared regions of the spectrum. Researchers describe y details of the photodetachment source, and present spectra of the neutral and ion glows in the wavelength range 250 to 850 nm (for O(-)) and 600 to 850 nm (for O), and discuss the variability of the emissions for incident energies between 4 and 40 eV.

Chutjian, A.↗

Measurement of threshold temperature effects in dissociative electron attachment to HI and DI

From accurate spectroscopic constants it is found that the thermal dissociative-attachment process (DA) in DI should be exothermic only for rotational levels J greater than 8 in v = O. Here, measurement of an enhancement of DA with rotational temperature T in the range 298-468 K is reported. The effect is easily accounted for by the increase in total fractional population of excited J levels in DI relative to HI. The effect affords a rotational analog to the use of vibrationally excited molecules (e.g., HCl) in a plasma to control electron conduction.

Chutjian, A.↗

Experimental investigations of low-energy (4-40 eV) collisions of O-(2P) ions and O(3P) atoms with surfaces

Using a newly-developed, magnetically confined source, low-energy, ground state oxygen negative ions and neutral atoms are generated. The energy range is variable, and atom and neutrals have been generated at energies varying from 2 eV to 40 eV and higher. It was found that the interaction of these low-energy species with a solid magnesium fluoride target leads to optical emissions in the (at least) visible and infrared regions of the spectrum. Researchers describe y details of the photodetachment source, and present spectra of the neutral and ion glows in the wavelength range 250 to 850 nm (for O/-/) and 600 to 850 nm (for O), and discuss the variability of the emissions for incident energies between 4 and 40 eV.

Orient, O. J.↗

Comparison of experimental and calculated attachment rate constants for CFCl3 and CCl4 in the temperature range 294-500 K

Electron-attachment cross sections and rate constants have been measured and calculated for the dissociative attachment processes e + CFCl3 - Cl(-) + CFCl2 and e + CCl4 - Cl(-) + CCl3. Good agreement over the electron-energy range 1-200 meV is found in energy dependence between present calculated cross sections and experimental cross sections at 300 K. The same calculation, with suitable adjustment of thermal populations, was used to calculate electron-attachment rate constants in the range 50-600 K. Experimental rate constants for CFCl3 and CCl4 were measured at temperatures of 294, 404, and 496 K (CFCl3) and 294, 400, and 500 K (CCl4) using the Cavalleri electron-density sampling method. Good agreement is found between present measurements and calculations, poor agreement with flowing-afterglow Langmuir-probe (FALP) data in CFCl3 at the higher temperatures, and reasonable agreement with FALP data for CCl4.

Orient, O. J.↗

Oxidation of silicon with a 5 eV O(-) beam

A silicon wafer has been oxidized at room temperature in vacuum using a pure, ground-state beam of O(-) ions. The beam was of sufficiently low energy that no displacement damage or implantation was energetically possible. The resulting SiO2 films were analyzed with X-ray photoelectron spectroscopy. A logarithmic dependence of oxide thickness on dose was observed, with an extrapolated oxidation efficiency of unity for the clean silicon surface. A distinct initial oxidation phase was observed, with an anomalously high level of silicon suboxides. In addition, the valence-band offset between the silicon and the oxide was unusually small, suggesting a large interfacial dipole.

Hecht, M. H.↗

Electron attachment lineshapes, cross sections and rate constants at ultra-low energies in several halomethyl and haloethyl molecules

Electron attachment lineshapes, cross sections and rate constants are reported for the molecules CH2Br2, CF2Br2, CF3Br, CBrCl3, BrCN, C2H2Br4, CH3l, C2H5l and 1,1,1,-C2Cl3F3. Use is made of the krypton photoionization method. In addition, the signal intercomparison technique is used to obtain individual channel cross sections and rate constants for Br(-) and CN(-) formation from BrCN, and for Br(-) and Br2(-) formation from CF2Br2. Present results in 1,1,1,-C2Cl3F3 using a new ion extraction grid geometry are compared with earlier results, and differences discussed in terms of the electric field equipotentials of two extraction systems used in the present work. Approximate potential energy curves for BrCN are presented, and the temperature dependence of the Br(-) channel cross section discussed.

Alajajian, S. H.↗

Space vehicle glow and its impact on spacecraft systems

Spacecraft glow poses a contamination threat to low orbital altitude optical sensor systems. The complexity of the phenomena entails a multifaceted approach to system design for vehicle glow minimization. In the case of Space Shuttle cloud glow, which involves line and band emission, filtering and careful optical sensor wavelength selection may also prove useful; Space Shuttle thruster glow mitigation entails the limitation of thruster firings during sensor operations. Careful selection of instrument baffle materials and coatings, as well as control of surface temperatures, are recommended as ways of limiting glow impact for instruments directed in the direction of vehicle movement.

Garrett, H. B.↗

Measurement of electron-attachment line shapes, cross sections, and rate constants in HI and DI at ultralow electron energies

Electron-attachment cross sections are reported in the electron energy range 0-150 MeV, at an energy resolution of 6.5 MeV (full width at half maximum) for the molecules HI and DI. Use is made of the Kr photoionization method to obtain cross sections for HI, and a signal intercomparison technique to obtain cross sections and the thermal-attachment rate constant for DI. Attachment properties of the two molecules are very similar. The ratio of attachment cross sections is discussed in terms of the reduced-mass dependence of the dissociation width and the survival probability, and in terms of spectroscopic thresholds and rotational populations for attachment at 300 K. Approximate potential-energy curves for the lowest states of the neutral molecule and negative ion are given.

Alajajian, S. H.↗

Effects on H(-) production in a multicusp ion source by mixture of H2 with H2O, NH3, CH4, N2H4, and SF6

Effects of H(-) production in a multicusp ion source are measured by separately mixing with hydrogen small amounts (0.33-10 percent) of water, ammonia, methane, and hydrazine these are molecules which produce large amounts of H(-) via dissociative attachment (DA) resonances at higher electron energies. The mixing was done in a separate reservoir, with careful measurement of individual pressures. Experimental enhancements of 1.4 and less were observed, whereas calculated enhancements, using accurate DA cross sections for ground-state H2, should have produced factors of 1.5, 3.0, 1.3, and 2.4 enhancements for water, ammonia methane, and hydrazine, respectively, at a mean electron energy of 1.0 eV in the extraction region. The difference is accounted for by including, in the enhancement calculation, vibrationally and rotationally excited H2 molecules, with v-double prime = 5-11, and J-double prime = 0-5, and the large DA cross sections for the excited H2 (v-double prime, J-double prime). The relative populations of H2 (v-double prime, J-double prime) thus obtained are found to be substantially smaller than those predicted by theoretical calculations. The effect on H(-) current was also studied by mixing small amounts of SF6 with H2. A 1.5 percent mixture was found to reduce the H(-) output by one half.

Orient, O. J.↗

Electron attachment in F2 - Conclusive demonstration of nonresonant, s-wave coupling in the limit of zero electron energy

Dissociative electron attachment to F2 has been observed in the energy range 0-140 meV, at a resolution of 6 meV (full width at half maximum). Results show conclusively a sharp, resolution-limited threshold behavior consistent with an s-wave cross section varying as sq rt of epsilon. Two accurate theoretical calculations predict only p-wave behavior varying as the sq rt of epsilon. Several nonadiabatic coupling effects leading to s-wave behavior are outlined.

Chutjian, A.↗

An intercomparison technique for measuring thermal attachment cross sections and rate constants in distinct final channels

A new technique is introduced for comparing negative-ion signal rates in which a common ion is produced by dissociative attachment in a series of molecules. Measurements are carried out at electron energies less than 100 MeV and at resolutions of 6-8 MeV (FWHM). The technique is demonstrated by detection of the Cl(-) signal in CFCl3, CCl4, CF2Cl2, 1,1,2-C2Cl3F3, 1,1,1-C2Cl3F3 and C2Cl4. Measurements for 1,1,1-C2Cl3F3 show that there is a significant open channel, other than Cl(-) formation, which accounts for about 60 percent of negative-ion formation in thermal-multiple-collision (swarm) experiments. Channel cross sections and rate constants are given for the process Cl(-)/1,1,1-Cl2Cl3F3, as well as in C2Cl4, for the separate channels Cl(-)/C2Cl4 and C2Cl4(-)/C2Cl4.

Alajajian, S. H.↗

Field-Reversal Source for Negative Halogen Ions

Large zero-energy electron-attachment cross sections result in intense ion beams. Concept for producing negative halogen ions takes advantage of large cross sections at zero kinetic energy for dissociative attachment of electrons to such halogen-containing gases as SF6, CFCI3, and CCI4.

Chutjian, A.↗

Measurements of electron attachment lineshapes and cross sections at ultra-low electron energies for CF2Cl2, c-C4F6, c-C4F8 and c-C7F14

Electron-attachment cross sections are reported in the electron energy range 0-160 meV, and at energy resolutions of 7.0 and 7.5 meV (FWHM), for the molecules CF2Cl2 (dichlorodifluoromethane), c-C4F6 (perfluorocyclobutene), c-C4F8 (perfluorocyclobutane), and c-C7F14 (perfluoromethylcyclohexane). Use is made of the Kr photoionization method. Measured attachment lineshapes are deconvoluted from the spectral slit function, and are converted to cross sections by normalization through thermal attachment-rate constants. Comparisons are made with attachment cross sections derived from several independent sets of swarm-measured rate constants, and with collisional ionization (high-Rydberg attachment) data.

Chutjian, A.↗

Plasma interactions and surface/material effects

A discussion on plasma interactions and surface/material effects is summarized. The key issues in this area were: (1) the lack of data on the material properties of common spacecraft surface materials; (2) lack of understanding of the contamination and decontamination processes; and (3) insufficient analytical tools to model synergistic phenomena related to plasma interactions. Without an adequate database of material properties, accurate system performance predictions cannot be made. The interdisciplinary nature of the surface-plasma interactions area makes it difficult to plan and maintain a coherent theoretical and experimental program. The shuttle glow phenomenon is an excellent example of an unanticipated, complex interaction involving synergism between surface and plasma effects. Building an adequate technology base for understanding and predicting surface-plasma interactions will require the coordinated efforts of engineers, chemists, and physicists. An interdisciplinary R and D program should be organized to deal with similar problems that the space systems of the 21st century may encounter.

Mandel, M.↗

Experimental apparatus for photon/ion coincidence measurements of dielectronic recombination

An inclined beams apparatus for the measurement of absolute cross sections for dielectronic recombination between free electrons and singly or multiply charged ions is described. The collision products, a photon and a lower-charge-state ion, are detected in delayed coincidence. Measurements of dielectronic recombination in C(3+) are described to illustrate the use of the apparatus and techniques. Verification of the calibrations and operation of the apparatus is demonstrated through measurements of charge transfer and electron impact excitation.

Gardner, L. D.↗

Comparison of calculated and experimental thermal attachment rate constants for SF6 in the temperature range 200-600 K

Electron-attachment cross sections are calcualted for the process e(-) + SF6 yields SF6(-) in the energy range 1-200 meV. An electron scattering approximation is used in which diatomiclike potential energy curves near the equilibrium SF6 ground state are constructed from recent spectroscopic data. Excellent agreement is found over the entire energy range with experimental attachment cross sections at a temperature of 300 K for s-wave (l = 0) scattering. The same calculation, with appropriate adjustment of the thermal populations, is used to calculate attachment rate constants in the range 50-600 K for both s- and p-wave scattering.

Orient, O. J.↗

Measurements of electron attachment lineshapes and cross sections at ultralow electron energies for c-C6F10, c-C6F12, C8F16 and 1,1,2-C2Cl3F3

Electron attachment cross sections are reported in the electron energy range 0-160 meV and at energy resolutions of 4.5-7.5 meV (FWHM) for the molecules c-C6F10 (perfluorocyclohexene), c-C6F12 (perfluoro-1,2-dimethylcyclobutane), C8F16 (perfluoro-1,3-dimethylcyclohexane) and 1,1,2-C2Cl3F3 (1,1,2-trichlorotrifluoroethane). Use is made of the Kr photoionization technique, and measured attachment lineshapes are converted to cross sections by normalization through attachment rate constants. Comparisons are made with attachment cross sections derived from swarm-measured rate constants. Similar to previous results in eight other molecules, the present four molecules exhibit resolution-limited onsets at a threshold consistent with an s-wave attachment behavior and with a neutral-negative-ion curve crossing at zero energy.

Alajajian, S. H.↗