Multi-Objective Optimization for Power Electronics used in Grid-Tied Energy Storage Systems.
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Engineering topics
Publications and source records attributed to Atcitty, Stanley.
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Gd{sub 2}O{sub 3} films were prepared on (0001)-oriented Al{sub x}Ga{sub 1−x}N (0 ≤ x ≤ 0.67) thin film substrates via reactive molecular-beam epitaxy. X-ray diffraction revealed that these films possessed the cubic bixbyite structure regardless of substrate composition and were all 111-oriented with in-plane rotations to account for the symmetry difference between the oxide film and nitride epilayer. Valence band offsets were characterized by X-ray photoelectron spectroscopy and were determined to be 0.41 ± 0.02 eV, 0.17 ± 0.02 eV, and 0.06 ± 0.03 eV at the Gd{sub 2}O{sub 3}/Al{sub x}Ga{sub 1−x}N interfaces for x = 0, 0.28, and 0.67, respectively.
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