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At least 19 records

Planar techniques for fabricating X-ray diffraction gratings and zone plates

The state of current planar techniques in the fabrication of Fresnel zone plates and diffraction gratings is reviewed. Among the fabrication techniques described are multilayer resist techniques; scanning electron beam lithography; and holographic lithography. Consideration is also given to: X-ray lithography; ion beam lithography; and electroplating. SEM photographs of the undercut profiles obtained in a type AZ 135OB photoresistor by holographic lithography are provided.

Smith, H. I.

Transmission X-ray diffraction grating alignment using a photoelastic modulator

A high-resolution alignment technique which utilizes the partial polarization property of fine period transmission gratings has been developed. It is especially useful when the grating period is sufficiently small so that there are no visible diffracted orders. This technique uses a photoelastic modulator (PEM) to produce an intensity signal that is proportional to the sine of twice the angle between the grating lines and the PEM crystal axis. The experimentally demonstrated resolution of this technique on 200-nm period gold transmission gratings is better than 1 arc sec. This technique was developed to align X-ray transmission gratings for spectroscopy and interferometry applications.

Anderson, Erik H.

Very high X-ray efficiency from a blazed grating

The efficiency of X-ray diffraction from reflection gratings has been investigated experimentally using a gold-coated plane grating of 25 x 120 mm with a nominal blaze angle of 21 deg in a conical diffraction mount. Results show that conical diffraction is capable of producing very high dispersion efficiencies. The peak of first order at 13.3 A is 40%; at 44 A, the peak is 34%. The most immediate application of this result is to X-ray astronomy where sources are weak.

Cash, W.

Diffraction grating transmission efficiencies for XUV and soft X rays

The manufacture and properties of a grating intended for extrasolar X-ray studies are described. The manufacturing process uses a split laser beam exposing an interference pattern on the photoresist-coated glass plated with a nickel parting layer. The grating, supporting structure, and mounting frame are electrodeposited on the nickel parting layer, and the final product is lifted from the glass substrate by selective etching of the nickel. A model was derived which relates the number of counts received in a given order m as a function of photon wavenumber. A 4-deg beam line was used to measure the efficiencies of gold transmission gratings for diffraction of X-rays in the range of 45 to 275 eV. The experimental results are in good agreement with model calculations.

Schnopper, H. W.

Variable magnification variable dispersion glancing incidence imaging x-ray spectroscopic telescope

A variable magnification variable dispersion glancing incidence x-ray spectroscopic telescope capable of multiple high spatial revolution imaging at precise spectral lines of solar and stellar x-ray and extreme ultraviolet radiation sources includes a pirmary optical system which focuses the incoming radiation to a primary focus. Two or more rotatable carries each providing a different magnification are positioned behind the primary focus at an inclination to the optical axis, each carrier carrying a series of ellipsoidal diffraction grating mirrors each having a concave surface on which the gratings are ruled and coated with a mutlilayer coating to reflect by diffraction a different desired wavelength. The diffraction grating mirrors of both carriers are segments of ellipsoids having a common first focus coincident with the primary focus. A contoured detector such as an x-ray sensitive photogrpahic film is positioned at the second respective focus of each diffraction grating so that each grating may reflect the image at the first focus to the detector at the second focus. The carriers are selectively rotated to position a selected mirror for receiving radiation from the primary optical system, and at least the first carrier may be withdrawn from the path of the radiation to permit a selected grating on the second carrier to receive radiation.

Hoover, Richard B.

Ultra-High-Spectral-Resolution X-Ray/EUV Monochromator

Ultra-high-spectral-resolution X-Ray/EUV monochromator depends on Bragg reflection from multilayer coats and diffraction by mutlilayer-coated grating to select narrow wavelength band from input beam. Its monochromatic output beam of accurately known wavelength very useful in testing and calibration of x-ray telescopes, x-ray microscopes, photographic films, and photodetectors; in research in biological and biomedical disciplines, x-ray crystallography, properties and processing of materials, and x-ray lasers; and in x-ray lithography.

Hoover, Richard B.

Transmission grating spectroscopy and the Advanced X-ray Astrophysics Facility (AXAF)

The use of transmission gratings with grazing-incidence telescopes in celestial X-ray astrononmy is reviewed. The basic properties of transmission grating spectrometers and the use of 'phased' gratings to enhance the diffraction efficiency are outlined. The fabrication of the gratings is examined, giving special attention to the AXAF High Energy Transmission Grating. The performance of finite-period thick gratings is briefly discussed, and the performance of the transmission grating spectrometers planned for SPECTROSAT and AXAF are examined.

Schattenburg, M. L.

Instrument design and test results of the new all-reflection spatial heterodyne spectrometer

An all-reflection spatial heterodyne spectrometer (SHS) has been recently developed. The advantages over conventional high-resolution grating spectrometers are that the SHS requires no mechanical scanning, a self-compensating optical design permits easy alignment, and it is much smaller than other spectrometers of comparable resolution. Since all beam-splits and recombinations occur by reflection off of a diffraction grating, the interferometer is capable of operating well into the extreme ultraviolet (EUV) and possibly into the soft X-ray region. A description of the design and the characteristics of the instrument is presented. Also, test results, including sample interferograms as well as their Fourier-transformed spectra, at both visible and UV wavelengths are shown. Finally, we report on future developments and possible applications.

Bush, Brett C.

Performance of high spatial frequency X-ray transmission gratings

The performance of high spatial frequency 'phased' X-ray transmission gratings developed for the High Energy Transmission Grating Spectrometer on the Advanced X-ray Astrophysics FAcility (AXAF) is examined. The gratings tested here nominally consist of 1-micron-thick gold lines of 0.2 micron period covering approximately 5 sq cm of a polyimide membrane. A table-top setup at MIT employs the gratings in reflection to diffract UV (325 nm) laser light. It is used to measure grating periods and indicates that period variations within and between gratings are a few parts in 10,000. Tests performed at the Marshall Space Flight Center 304 m X-ray Facility using 1.5 keV X-rays in transmission corroborate the UV measurements and demonstrate geometrically-limited resolving powers of E/Delta E about 750. Finally, X-ray transmission tests performed in the MIT 25 m X-ray facility provide measurements of period, line thickness, space-to-period ratio, tilt of grating lines, and efficiency.

Fischbach, K. F.

X-ray spectrographs using radial groove gratings

A high efficiency spectrograph design for the EUV and soft X rays is presented. This grazing incidence system uses a plane surface reflection grating with rulings that are radial, like the spokes of a wheel. The grating is placed in a beam of light that is converging to a focus. The single reflection off the grating is in the conical diffraction mount ensuring maximum performance from the system. Aberrations and performance levels are discussed. The gratings can be manufactured with existing ruling engines. Sample applications to an X-ray monochromator and an EUV stellar spectrograph are discussed.

Cash, W. C., Jr.

Influence of process parameter variation on the reflectivity of sputter-deposited W-C multilayer diffraction gratings

Multilayer W-C diffraction gratings with nominal d spacings of 35 A have been fabricated by magnetron sputter deposition. The peak and integrated reflectivities of these films have been measured with Al K-alpha X-rays and compared to theoretical values. The rms surface roughness has been evaluated. The influence of several sputtering-system process parameters on the reflectivities has been investigated.

Sager, B.

Measuring EUV Line Emission from the Hot Interstellar Medium

In the local interstellar medium, the presence of hot gas was inferred from measurements of oxygen VI absorption in the ultraviolet, and from diffuse emission in the extreme ultraviolet (EUV) and soft X-ray regions. A spectrometer that is very sensitive to gas in this temperature range is described. The spectrometer uses an array of plane ruled gratings at grazing incidence in the extreme off plane mount. A set of Kirkpatrick-Baez mirrors focuses the conically diffracted light on to one of two microchannel plate detectors. The field of view of the instrument is 0.2 deg by 12 deg. The predicted sensitivity ranges from 50 to 200 ph/(sq cm sec str) with a resolving power of 15 to 50 over the 50 to 700 angstrom wavelength band.

Labov, S.

The soft X-ray/EUV calibration facility at the University of Colorado

The components of the calibration facility at the University of Colorado are described. The system is capable of analyzing the performance of optical components in the wavelength range from 2.7 to 2500 A. The system uses two light sources: a water-cooled hollow cathode gas discharge source and a soft X-ray source. The 2.2-m grazing incidence monochrometer, slits, large chamber, and computer-controlled manipulator are examined. The NBS aluminum oxide photodiode, a flowing gas proportional counter, and an imaging microchannel plate device are employed to detect the light. The optics, detectors, and data acquisition system are computer controlled. The facility is applicable for evaluating the performance of diffraction gratings, multilayer mirrors, reflective coatings, spectrographs, surface roughness scattering, and absolute detector efficiencies. Examples demonstrating the capabilities of the facility and a diagram of the facility are presented.

Windt, David L.

Amorphous silicon carbide coatings for extreme ultraviolet optics

Amorphous silicon carbide films formed by sputtering techniques are shown to have high reflectance in the extreme ultraviolet spectral region. X-ray scattering verifies that the atomic arrangements in these films are amorphous, while Auger electron spectroscopy and Rutherford backscattering spectroscopy show that the films have composition close to stoichiometric SiC, although slightly C-rich, with low impurity levels. Reflectance vs incidence angle measurements from 24 to 1216 A were used to derive optical constants of this material, which are presented here. Additionally, the measured extreme ultraviolet efficiency of a diffraction grating overcoated with sputtered amorphous silicon carbide is presented, demonstrating the feasibility of using these films as coatings for EUV optics.

Kortright, J. B.

Review of rigorous coupled-wave analysis and of homogeneous effective medium approximations for high spatial-frequency surface-relief gratings

A review of the rigorous coupled-wave analysis as applied to the diffraction of electro-magnetic waves by gratings is presented. The analysis is valid for any polarization, angle of incidence, and conical diffraction. Cascaded and/or multiplexed gratings as well as material anisotropy can be incorporated under the same formalism. Small period rectangular groove gratings can also be modeled using approximately equivalent uniaxial homogeneous layers (effective media). The ordinary and extraordinary refractive indices of these layers depend on the gratings filling factor, the refractive indices of the substrate and superstrate, and the ratio of the freespace wavelength to grating period. Comparisons of the homogeneous effective medium approximations with the rigorous coupled-wave analysis are presented. Antireflection designs (single-layer or multilayer) using the effective medium models are presented and compared. These ultra-short period antireflection gratings can also be used to produce soft x-rays. Comparisons of the rigorous coupled-wave analysis with experimental results on soft x-ray generation by gratings are also included.

Glytsis, Elias N.

Advanced optical instruments technology

The science objectives for proposed NASA missions for the next decades push the state of the art in sensitivity and spatial resolution over a wide range of wavelengths, including the x-ray to the submillimeter. While some of the proposed missions are larger and more sensitive versions of familiar concepts, such as the next generation space telescope, others use concepts, common on the Earth, but new to space, such as optical interferometry, in order to provide spatial resolutions impossible with other concepts. However, despite their architecture, the performance of all of the proposed missions depends critically on the back-end instruments that process the collected energy to produce scientifically interesting outputs. The Advanced Optical Instruments Technology panel was chartered with defining technology development plans that would best improve optical instrument performance for future astrophysics missions. At this workshop the optical instrument was defined as the set of optical components that reimage the light from the telescope onto the detectors to provide information about the spatial, spectral, and polarization properties of the light. This definition was used to distinguish the optical instrument technology issues from those associated with the telescope, which were covered by a separate panel. The panel identified several areas for optical component technology development: diffraction gratings; tunable filters; interferometric beam combiners; optical materials; and fiber optics. The panel also determined that stray light suppression instruments, such as coronagraphs and nulling interferometers, were in need of general development to support future astrophysics needs.

Shao, Mike

Echelle spectrographs at grazing incidence

It is shown that by using the conical diffraction mount, existing echelle gratings can be used at grazing incidence to achieve high spectral resolution in the extreme UV and soft X rays. Design considerations for grazing incidence echelle spectrographs are examined, and two sample designs are discussed. The first, for use in the extreme UV, has a primary mirror and an entrance slit to the spectrograph. The system has a resolution of 10,000, operates at any wavelength longward of 100 A, and covers 30% of the spectrum at a single setting. The X-ray spectrograph uses objective gratings to obtain spectral resolution of 28,000 over any factor of 2 in. wavelength. It operates to wavelengths as short as 4 A.

Cash, W.