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Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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At least 19 records
All sourcesNASA NTRSDOE OSTI
DOE OSTI2024

Research and Development to Reduce Impurity Production and Transport of the Impurities to the Target in Linear Plasma Devices Using Helicon Plasma Sources

Linear plasma devices used to test plasma facing materials (PFMs) and components for fusion reactors are often suffering under the production of intrinsic impurities from the plasma source system. Most linear plasma devices use internal electrodes (hollow cathodes, reflex arc, or cascading arc), which typically are the source of the main impurities. The next-generation plasma generators use radio frequency (RF) plasma sources like helicons to avoid internal electrodes. However, high power operation of helicons has proven to result in impurity production due to the high rectified sheath voltages created. Depending on the plasma parameters and magnetic configuration, these impurities can be transported to the target and deposited there to unacceptable high levels. Here, in this contribution, the experimental results from Proto-MPEX are summarized, and the conclusions of the impurity source physics are given. Methods to reduce the impurity production, the impurity transport, and the net deposition on the target are presented. These methods to reduce the impurity production include Faraday screens to reduce the sheath voltage drop, high-Z refractory coatings to reduce the erosion yield, and wall conditioning methods. Methods to reduce the impurity transport include changes in the magnetic configuration as well as electron heating to change axial and radial temperature profiles. Preliminary results on the effectiveness of some of these methods are presented.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
DOE OSTI2023

Design of the Lanthanum hexaboride based plasma source for the large plasma device at UCLA

The Large Plasma Device (LAPD) at UCLA (University of California, Los Angeles) produces an 18 m long, magnetized, quiescent, and uniform plasma at a high repetition rate to enable studies of fundamental plasma physics. Here, we report on a major upgrade to the LAPD plasma source that allows for more robust operation and significant expansion of achievable plasma parameters. The original plasma source made use of a heated barium oxide (BaO) coated nickel sheet as an electron emitter. This source had a number of drawbacks, including a limited range of plasma density (≲4.0 × 10 12 cm −3 ), a limited discharge duration (∼10 ms), and susceptibility to poisoning following oxygen exposure. Further, the new plasma source utilizes a 38 cm diameter lanthanum hexaboride (LaB 6 ) cathode, which has a significantly higher emissivity, allowing for a much larger discharge power density, and is robust to exposure to air. Peak plasma density of up to 3.0 × 10 13 cm −33 in helium gas has been achieved. The typical operating pressure is ∼10 −5 Torr, while dynamic pressure can be achieved through the gas-puffing technique. Discharges as long as 70 ms have been produced, enabling a variety of long-time-scale studies of processes, such as turbulent particle transport. The new source has been in continuous operation for 14 months, having survived air leaks, power outages that led to rapid temperature changes on the cathode and heater, and planned machine openings. We describe the design, construction, and initial operation of this novel new large-area LaB6 plasma source.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
NASA NTRS1985

A tandem mirror plasma source for hybrid plume plasma studies

A tandem mirror device to be considered as a hot plasma source for the hybrid plume rocket concept is discussed. The hot plamsa from this device is injected into an exhaust duct, which will interact with an annular hypersonic layer of neutral gas. The device can be used to study the dynamics of the hybrid plume, and to verify the numerical predictions obtained with computer codes. The basic system design is also geared towards low weight and compactness, and high power density at the exhaust. The basic structure of the device consists of four major subsystems: (1) an electric power supply; (2) a low temperature, high density plasma gun, such as a stream gun, an MPD source or gas cell; (3) a power booster in the form of a tandem mirror machine; and (4) an exhaust nozzle arrangement. The configuration of the tandem mirror section is shown.

Yang, T. F.↗
DOE OSTI2023

Ion concentration ratio measurements of ion beams generated by a commercial microwave electron cyclotron resonance plasma source

A commercially available electron cyclotron resonance (ECR) plasma source (GenII Plasma Source, tectra GmbH) is widely used for surface processing. This plasma source is compatible with ultrahigh vacuum systems, and its working pressure is relatively low, around 10 –6 –10 –4 Torr even without differential pumping. Here, we report ion flux concentration ratios for each ion species in an ion beam from this source, as measured by a mass/energy analyzer that is a combination of a quadrupole mass spectrometer, an electrostatic energy analyzer, and focusing ion optics. In this study, the examined beams were those arising from plasmas produced from feed gases of H 2 , D 2 , N 2 , O 2 , Ar, and dry air over a range of input power and working pressures. H 2 (D 2 ) plasmas are widely used for nuclear fusion applications and, hence, the ion concentration ratios of H + , H 2 + , and H 3 + reported here will be useful information for research that applies this plasma source to well-controlled plasma-material interaction studies. Ion energy distributions, stability of operation, and impurity concentrations were also assessed for each of the plasma species investigated.

47 OTHER INSTRUMENTATION↗
NASA NTRS2007

Slotted antenna waveguide plasma source

A high density plasma generated by microwave injection using a windowless electrodeless rectangular slotted antenna waveguide plasma source has been demonstrated. Plasma probe measurements indicate that the source could be applicable for low power ion thruster applications, ion implantation, and related applications. This slotted antenna plasma source invention operates on the principle of electron cyclotron resonance (ECR). It employs no window and it is completely electrodeless and therefore its operation lifetime is long, being limited only by either the microwave generator itself or charged particle extraction grids if used. The high density plasma source can also be used to extract an electron beam that can be used as a plasma cathode neutralizer for ion source beam neutralization applications.

Foster, John↗
NASA NTRS1985

A tandem mirror plasma source for a hybrid plume plasma propulsion concept

This paper describes a tandem mirror magnetic plasma confinement device to be considered as a hot plasma source for the hybrid plume rocket concept. The hot plasma from this device is injected into an exhaust duct, which will interact with an annular layer of hypersonic neutral gas. Such a device can be used to study the dynamics of the hybrid plume and to experimentally verify the numerical predictions obtained with computer codes. The basic system design is also geared toward being lightweight and compact, as well as having high power density (i.e., several kW/sq cm) at the exhaust. This feature is aimed toward the feasibility of 'space testing'. The plasma is heated by microwaves. A 50 percent heating efficiency can be obtained by using two half-circle antennas. The preliminary Monte Carlo modeling of test particles result reported here indicates that interaction does take place in the exhaust duct. Neutrals gain energy from the ion, which confirms the hybrid plume concept.

Yang, T. F.↗
NASA NTRS2019

High-Frequency Density Oscillations from a Plasma Source Used for Simulating Low-Earth Orbit Plasma Environment

We present data from ground-based, vacuum-chamber tests demonstrating the ability to modulate the output of a plasma source capable of producing a low-Earth orbit (LEO) type plasma. We obtained plasma oscillations up to 2.5 kHz impingent on stationary test equipment, which corresponds to meter-level ionospheric structures in LEO. This plasma source is, therefore, suitable for developing scientific instruments that measure the LEO plasma environment, in situ, with meter-level spatial resolution. Measurements were made using a fixed-bias collector and an electrometer sampling at 40 kHz. A mechanical aperture was established at the output of the plasma source via two concentric grids. The outer grid was free to rotate in the azimuthal direction with respect to the fixed inner grid. An identical, alternating hole pattern in the two grids resulted in a variable aperture that cycles through 90 open/close cycles per revolution. The frequency of the plasma oscillations is limited by the mechanism used to spin the grids and the bearing assembly on which the grids rotate. Higher frequencies are obtainable by upgrading the drive mechanism, allowing the possibility of centimeter-level spatial resolution.

McTernan, Jesse K.↗
NASA NTRS1998

Measurements of the Plasma Parameters and Low Frequency Oscillations in the Fisk Plasma Source

A new plasma device, the Fisk Plasma Source (FPS), has been developed at Fisk University. This plasma device is used to study the physics of low temperature plasmas and plasma-material interactions. The FPS device is a stainless steel vacuum 6-way cross vacuum vessel with at 10-inch inner diameter. Low temperature argon plasmas are generated using DC glow discharge and thermionic filament techniques. Spatial profiles of the plasma density, plasma potential, and electron temperature are measured using Langmuir probes. We present initial experimental measurements of density and temperature profiles in the FPS device. Experimental and theoretical studies of low frequency oscillations observed in the FPS device are also presented.

Thomas, Edward, Jr.↗
DOE OSTI2022

Single-beam plasma source deposition of carbon thin films

A single-beam plasma source was developed and used to deposit hydrogenated amorphous carbon (a-C:H) thin films at room temperature. The plasma source was excited by a combined radio frequency and direct current power, which resulted in tunable ion energy over a wide range. The plasma source could effectively dissociate the source hydrocarbon gas and simultaneously emit an ion beam to interact with the deposited film. Using this plasma source and a mixture of argon and C 2 H 2 gas, a-C:H films were deposited at a rate of ~26 nm/min. The resulting a-C:H film of 1.2 µm thick was still highly transparent with a transmittance of over 90% in the infrared range and an optical bandgap of 2.04 eV. Young’s modulus of the a-C:H film was ~80 GPa. The combination of the low-temperature high-rate deposition of transparent a-C:H films with moderately high Young’s modulus makes the single-beam plasma source attractive for many coatings applications, especially in which heat-sensitive and soft materials are involved. Here, the single-beam plasma source can be configured into a linear structure, which could be used for large-area coatings.

14 SOLAR ENERGY↗
DOE OSTI2022

Growth of Highly Transparent Amorphous Carbon Films Using Beam Plasma Source

A single beam plasma source was used to deposit hydrogenated amorphous carbon (a-C:H) coatings at room temperature. Using methane source gas, a-C:H coatings were deposited at different radio frequency (RF) power to fabricate transparent and durable coatings. The film deposition rate was almost linearly proportional to the ion source power. Hydrogenated amorphous carbon films of ~100 nm thickness appeared to be highly transparent from UV to the infrared range with a transmittance of ~90% and optical bandgap of ~3.7 eV. The coatings also possess desirable mechanical properties with Young’s modulus of ~78 GPa and density of ~1.9 g/cm3. The combined material properties of high transmittance and high durability make the ion-source-deposited a-C:H coatings attractive for many applications.

36 MATERIALS SCIENCE↗
NASA NTRS1986

Quiet Plasma Source

Synthesis of plasma from separate ion and electron emitters suppresses electromagnetic interference. Source employs separate emitters for electrons and ions. Plasma source used to simulate variety of astrophysical phenomena and space-plasma effects. For example, used in studies of propagation of electromagnetic waves in plasmas. Serves as interference-free charge neutralizer.

Leung, P. L.↗
NASA NTRS1998

Plasma Processing of Metallic and Semiconductor Thin Films in the Fisk Plasma Source

The use of plasmas to process materials has become widespread throughout the semiconductor industry. Plasmas are used to modify the morphology and chemistry of surfaces. We report on initial plasma processing experiments using the Fisk Plasma Source. Metallic and semiconductor thin films deposited on a silicon substrate have been exposed to argon plasmas. Results of microscopy and chemical analyses of processed materials are presented.

Lampkin, Gregory↗
NASA NTRS1986

Plasma Source for Charge Control

Plasma source neutralizes electrical charge on spacecraft. When triggered by command from spacecraft potential monitor or from control system, plasma apparatus responds within about 1 s, generating charged plasma of required polarity. Discharging system to be tested on Air Force Geophysics Laboratory BERT-1 (Beam Emission Rocket Test) sounding rocket.

Aston, G.↗
NASA NTRS2018

Hall Current Plasma Source Having a Center-Mounted or a Surface-Mounted Cathode

A miniature Hall current plasma source apparatus having magnetic shielding of the walls from ionized plasma, an integrated discharge channel and gas distributor, an instant-start hollow cathode mounted to the plasma source, and an externally mounted keeper, is described. The apparatus offers advantages over other Hall current plasma sources having similar power levels, including: lower mass, longer lifetime, lower part count including fewer power supplies, and the ability to be continuously adjustable to lower average power levels using pulsed operation and adjustment of the pulse duty cycle. The Hall current plasma source can provide propulsion for small spacecraft that either do not have sufficient power to accommodate a propulsion system or do not have available volume to incorporate the larger propulsion systems currently available. The present low-power Hall current plasma source can be used to provide energetic ions to assist the deposition of thin films in plasma processing applications.

Martinez, Rafael A.↗
NASA NTRS1987

Hollow cathode plasma source for active spacecraft charge control

A prototype plasma source spacecraft discharge device has been developed to control overall and differential spacecraft surface charging. The plasma source is based on a unique hollow cathode discharge, where the plasma generation process is contained completely within the cathode. This device can be operated on argon, krypton, or xenon and has a rapid cold start time of less than 4 s. The discharge system design includes a spacecraft-discharge/net-charge sensing circuit which provides the ability to measure the polarity, magnitude, pulse shape, and time duration of a discharging event. Ion currents of up to 325 microA and electron currents ranging from 0.02 to 6.0 A have been extracted from the device. In addition, the spacecraft discharge device successfully discharged capacitively biased plates, from as high as + or - 2500 V, to ground potential, and discharged and clamped actively biased plates at +5 V with respect to ground potential during ground simulation testing.

Deininger, William D.↗
DOE OSTI2024

Temporal evolution of the light emitted by a thin, laser-ionized plasma source

We present an experimental and simulation-based investigation of the temporal evolution of light emission from a thin, laser-ionized helium plasma source. We demonstrate an analytic model to calculate the approximate scaling of the time-integrated, on-axis light emission with the initial plasma density and temperature, supported by the experiment, which enhances the understanding of plasma light measurement for plasma wakefield accelerator (PWFA) plasma sources. Our model simulates the plasma density and temperature using a split-step Fourier code and a particle-in-cell code. A fluid simulation is then used to model the plasma and neutral density, and the electron temperature as a function of time and position. We then show the numerical results of the space-and-time-resolved light emission and that collisional excitation is the dominant source of light emission. We validate our model by measuring the light emitted by a laser-ionized plasma using a novel statistical method capable of resolving the nanosecond-scale temporal dynamics of the plasma light using a cost-effective camera with microsecond-scale timing jitter. This method is ideal for deployment in the high radiation environment of a particle accelerator that precludes the use of expensive nanosecond-gated cameras. Our results show that our models can effectively simulate the dynamics of a thin, laser-ionized plasma source. In addition, this work provides a detailed understanding of the plasma light measurement, which is one of the few diagnostic signals available for the direct measurement of PWFA plasma sources.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
DOE OSTI2025

Erosion of high-Z refractory coatings for helicon plasma source window

Proto-MPEX (Materials Plasma Exposure eXperiment), a linear plasma device (LPD), using a high power radio frequency (RF) (⩾100 kW, 13.56 MHz) helicon plasma source, has suffered RF sheath-induced window erosion. The sputtered impurities from the window surface transport toward the downstream target affecting plasma-material interaction studies. The rectified sheath voltage formed was high enough to cause window erosion by light ions due to its low-Z components (e.g. Si 3 N 4 and AlN). Hence, we are proposing impurity mitigation strategies, which involve the application of a Faraday screen to lower the rectified sheath voltage and the application of high-Z refractory coatings on the existing window plasma-facing surface. In this work, we report the erosion of two different coatings, i.e., tantalum oxide (Ta 2 O 5 ) and hafnium oxide (HfO 2 ) on a silicon nitride (Si 3 N 4 ) window material under conditions of low-energy deuterium (D) ion impact, well below the Ta 2 O 5 sputtering energy threshold (i.e. 250 eV). The test samples were RF-biased and exposed to a high D-ion fluence (∼10 26 m −2 ) in Plasma Interaction with Surface Component Experimental Station (PISCES-A) LPD. The experimentally measured sputtering yields of the high-Z refractory coatings below the sputtering energy threshold of Ta 2 O 5 indicate an increased erosion due to the plasma impurities, especially due to oxygen. Improving the vacuum level could reduce the oxygen impurities and increase the lifespan of the coated helicon window for plasma operation. Post-surface analysis indicates no preferential erosion of oxygen or enrichment of the high-Z surface component. This is likely due to an effective energy transfer from the impurity ion for sputtering of the high-Z component in the coating. With the reduced rectified sheath voltage at the window surface and improved vacuum conditions, the proposed high-Z refractory coatings offer a promising solution for reducing window erosion in future MPEX plasma operations at ORNL.

RF bias↗