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Results for “extreme ultraviolet lithography”

Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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All sourcesNASA NTRSDOE OSTI
NASA NTRS1996

Development of a Wafer Positioning System for the Sandia Extreme Ultraviolet Lithography Tool

A wafer positioning system was recently developed by Sandia National Laboratories for an Extreme Ultraviolet Lithography (EUVL) tool. The system, which utilizes a magnetically levitated fine stage to provide ultra-precise positioning in all six degrees of freedom, incorporates technological improvements resulting from four years of prototype development. This paper describes the design, implementation, and functional capability of the system. Specifics regarding control system electronics, including software and control algorithm structure, as well as performance design goals and test results are presented. Potential system enhancements, some of which are in process, are also discussed.

Wronosky, John B.↗
NASA NTRS1991

Compact X-Ray And Extreme-Ultraviolet Monochromator

Monochromator for x-ray and extreme-ultraviolet radiation provides higher spectral resolution than achieved with thin-metal-foil broad-band-pass filters. Uses Bragg reflection to band-pass-filter radiation from high-intensity, broad-spectrum source. Operates over much broader x-ray and extreme-ultraviolet spectrum than devices based upon natural crystals. Intended to filter continuum radiation from sources like synchrotrons, laser plasma sources, free-electron lasers, and wigglers to produce monochromatic beams for testing and analysis of x-ray and extreme-ultraviolet telescopes and microscopes, for calibration of photographic films and detectors, for biological and biomedical research, for x-ray lithography, for processing of materials, and for research in properties of materials.

Hoover, Richard B.↗
NASA NTRS1992

Multilayer Monochromator For Hard X Rays And Gamma Rays

Compact monochromator for hard x rays and gamma rays provides high spectral resolution with high throughput. Resembles instruments in "Compact X-Ray and Extreme-Ultraviolet Monochromator" (MFS-28499), "Scanning X-Ray or Extreme-Ultraviolet Monochromator" (MFS-28492), "Ultra-High-Spectral-Resolution X-Ray/EUV Monochromator" (MFS-28500), and "Four-Mirror X-Ray and Extreme-Ultraviolet Monochromator" (MFS-28498). Operates on principle of multilayer Bragg reflector. Used in nuclear, astronomical, and biomedical research, x-ray crystallography, research on processing materials, research in x-ray lasers, and x-ray lithography.

Hoover, Richard B.↗