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At least 19 records

Planar electroluminescent panel techniques

Investigations of planar electroluminescent multipurpose displays with latch-in memory are described. An 18 x 24 in. flat, thin address panel with elements spacing of 0.100 in. was constructed which demonstrated essentially uniform luminosity of 3-5 foot lamberts for each of its 43200 EL cells. A working model of a 4-bit EL-PC (electroluminescent photoconductive) electrooptical decoder was made which demonstrated the feasibility of this concept. A single-diagram electroluminescent display device with photoconductive-electroluminescent latch-in memory was constructed which demonstrated the conceptual soundness of this principle. Attempts to combine these principles in a single PEL multipurpose display with latch-in memory were unsuccessful and were judged to exceed the state-of-the-art for close-packed (0.10 in. centers) photoconductor-electroluminescent cell assembly.

Kerr, C.

Degradation resistance of semiconductor electroluminescent devices

The P type conductivity layer or layers of an electroluminescent device includes zinc as the primary conductivity modifier, and germanium as the secondary conductivity modifier. The combination of zinc and germanium provide an electroluminescent device having improved reliability. In the method of fabricating the P type conductivity layer, the zinc and germanium are simultaneously introduced into the layer during deposition of the layer.

Ladany, Ivan

Development of gallium aluminum phosphide electroluminescent diodes

Work done on the development of gallium aluminum phosphide alloys for electroluminescent light sources is described. The preparation of this wide band gap semiconductor alloy, its physical properties (particularly the band structure, the electrical characteristics, and the light emitting properties) and work done on the fabrication of diode structures from these alloys are broadly covered.

Chicotka, R. J.

Epitaxial growth of III-V compounds for electroluminescent light sources

The epitaxial growth techniques used in the fabrication of III-V compound electroluminescent devices are reviewed. Both vapor and liquid phase epitaxial techniques are discussed, including the applications of these techniques to well established materials as well as newer materials. The state of the art of light-emitting devices fabricated from members of the III-V compounds and their solid solutions is also reviewed.

Chu, T. L.

Recent advances in electroluminescent displays applicable to future crew-station interfaces

The operative principles and progress to date on producing thin-film electroluminescent displays (TFEL) are discussed. TFEL displays consist of conductive, insulating and phosphor film layers deposited on a glass substrate. Applying a 200 V potential between the rows and columns in a multiplexed mode causes light to be emitted. Varying the voltage varies the grey level. The panels provide adequate contrast in full sunlight, and have demanded only 4-6 W for 15 sq in. displays. Alphanumeric, graphics, and video images have been generated with a 51 line by 80 character display. The upper limit on the panel size has not yet been defined. Efforts are under way to produce multicolor displays using red and blue phosphors. Trial units are being studied for avionics displays for, e.g., navigation, multipurpose displays, and attitude/direction indicators.

Miller, M. R.

Legibility of electroluminescent instrument panels investigated

Legibility studies of several EL /electroluminescent/ displays correlate reading time and accuracy with number size, stroke/width ratio, indicia size, pointer width, contrast, ambient illumination, and color background and and contrast. Human factor criteria established on non-EL displays may not apply to EL displays.

Mc Lean, M. V.

Visible light electroluminescent diodes of indium-gallium phosphide

Vapor deposition and acceptor impurity diffusion techniques are used to prepare indium-gallium phosphide junctions. Certain problems in preparation are overcome by altering gas flow conditions and by increasing the concentration of phosphine in the gas. A general formula is given for the alloy's composition.

Clough, R.