The interdiffusion of the components and phase diagram of the system Ti-W
Mutual diffusion characteristics and phase diagram of titanium tungsten mixtures at high temperatures
SEARCH · Engineering Papers
Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.
Quote a phrase for an exact phrase match. Source license links do not imply unrestricted reuse.
Mutual diffusion characteristics and phase diagram of titanium tungsten mixtures at high temperatures
The application of high temperature accelerated test techniques was shown to be an effective method of microcircuit defect screening. Comprehensive microcircuit evaluations and a series of high temperature (473 K to 573 K) life tests demonstrated that a freak or early failure population of surface contaminated devices could be completely screened in thirty two hours of test at an ambient temperature of 523 K. Equivalent screening at 398 K, as prescribed by current Military and NASA specifications, would have required in excess of 1,500 hours of test. All testing was accomplished with a Texas Instruments' 54L10, low power triple-3 input NAND gate manufactured with a titanium- tungsten (Ti-W), Gold (Au) metallization system. A number of design and/or manufacturing anomalies were also noted with the Ti-W, Au metallization system. Further study of the exact nature and cause(s) of these anomalies is recommended prior to the use of microcircuits with Ti-W, Au metallization in long life/high reliability applications. Photomicrographs of tested circuits are included.
TiW crystallizes in the orthorhombic Cmmm space group. The structure is two-dimensional and consists of two TiW sheets oriented in the (0, 1, 0) direction. Ti is bonded in a 4-coordinate geometry to four equivalent W atoms. All Ti–W bond lengths are 2.74 Å. W is bonded in a 4-coordinate geometry to four equivalent Ti atoms.