Role of Si2N2O in the passive oxidation of chemically-vapor-deposited Si3N4
The results of two-step oxidation experiments on chemically-vapor-deposited Si3N4 and SiC at 1350 C show that a correlation exists between the presence of a Si2N2O interphase and the strong oxidation resistance of Si3N4. During normal oxidation, k sub p for SiC was 15 times higher than that for Si3N4, and the oxide scale on Si3N4 was found by SEM and TEM to contain a prominent Si2N2O inner layer. However, when oxidized samples are annealed in Ar for 1.5 h at 1500 C and reoxidized at 1350 C as before, three things happen: the oxidation k sub p increases over 55-fold for Si3N4, and 3.5-fold for SiC; the Si3N4 and SiC oxidize with nearly equal k sub p's; and, most significantly, the oxide scale on Si3N4 is found to be lacking an inner Si2N2O layer. The implications of this correlation for the competing models of Si3N4 oxidation are discussed.