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Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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All sourcesNASA NTRSDOE OSTI
DOE OSTI2020

Materials Data on PmSe by Materials Project

PmSe is Halite, Rock Salt structured and crystallizes in the cubic Fm-3m space group. The structure is three-dimensional. Pm is bonded to six equivalent Se atoms to form a mixture of edge and corner-sharing PmSe6 octahedra. The corner-sharing octahedral tilt angles are 0°. All Pm–Se bond lengths are 2.97 Å. Se is bonded to six equivalent Pm atoms to form a mixture of edge and corner-sharing SePm6 octahedra. The corner-sharing octahedral tilt angles are 0°.

36 MATERIALS SCIENCE↗
DOE OSTI2020

Materials Data on PmSe by Materials Project

PmSe is Wurtzite structured and crystallizes in the hexagonal P6_3mc space group. The structure is three-dimensional. Pm is bonded to four equivalent Se atoms to form corner-sharing PmSe4 tetrahedra. There are one shorter (2.83 Å) and three longer (2.86 Å) Pm–Se bond lengths. Se is bonded to four equivalent Pm atoms to form corner-sharing SePm4 tetrahedra.

36 MATERIALS SCIENCE↗
DOE OSTI2023

Recent developments in photoresists for extreme-ultraviolet lithography

Here, this report describes recent developments and current needs in the field of high-resolution photopolymers and photomolecules briefly describing prior generation lithographic patterning materials. It subsequently concentrates on recent advances in both inorganic and polymeric materials for extreme ultraviolet (EUV) lithography. It is also part of a series of papers written in celebration of the centenary of the Polymeric Materials: Science and Engineering (PMSE) division of the American Chemical Society (ACS). PMSE has long been home to polymer chemists who have made important contributions to advances in semiconductor manufacturing as a result of PMSE's focus on polymer coatings research. While EUV lithography has been an area of research for several decades, only within the last 5 years has the combination of new light sources, EUV optics, tool advances and resist discoveries come together to transition this area from the patterning method of the future to a leading-edge manufacturing technology.

36 MATERIALS SCIENCE↗