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A neural master equation framework for multiscale modeling of molecular processes: application to atomic-scale plasma processes

Plasma-surface interactions (PSI) play a crucial role in microelectronics fabrication; however, their multiscale nature and array of complex, often unknown interactions make computational modeling of PSIs extremely difficult. To this end, we propose a general neural master equation (NME) framework that uses master equations to describe the dynamics of a molecular process, wherein neural networks learned from atomistic simulations represent unknown transitions between different system states. By leveraging the physics-based structure of master equations and data-driven state transitions, the NME framework promotes generalizability and physics interpretability, and can bridge disparate length and time scales. The framework is demonstrated for multiscale modeling of Si atomic layer etching and reactive ion etching, where the learned NME-based surface kinetic models exhibit good predictive and extrapolative capabilities for predicting experimentally relevant observables as a function of process parameters. The NME-based surface kinetic models obey physical constraints, which are violated in models based on neural ordinary differential equations. The proposed NME framework for multiscale modeling of molecular processes can pave the way for the discovery of new chemistries and materials in atomic-scale plasma processes.

Chemical engineering

Recent progress in atomic-scale controlled plasma processing

Atomic-scale control in plasma processing is becoming increasingly critical for fabricating of advanced semiconductor devices, particularly as the industry shifts toward three-dimensional (3D) architectures and high-aspect-ratio (HAR) structures. This review presents a comprehensive overview of recent developments in atomic-scale controlled plasma processes, organized along two key directions: the hierarchical structure of plasma–surface interactions and the generational evolution of atomic layer processing (ALP) technologies. We examined the gas phase, where molecular design enables selective generation of ions and radicals; the boundary layer, where transport phenomena govern species delivery into nanoscale features, and the surface, where temperature-dependent reactions and cyclic processing determine etching selectivity and precision. Building on this foundation, we outline five generations of ALP—from thermal atomic layer deposition to transport-aware, temporally and structurally decoupled processes—highlighting the increasing sophistication of process control. The review further explores the transition from empirical recipe development to science-based, data-driven methodologies. By integrating quantum-chemical modeling, advanced diagnostics, and machine learning, we demonstrated how predictive models can link plasma species composition to process outcomes, enabling autonomous and adaptive control strategies. Finally, this review discusses the broader societal implications of plasma process innovation through the E4 quartet: energy and resource efficiency, environmental sustainability, evolutionary advancement, and educational promotion. These principles guide the development of sustainable and intelligent atomic-scale manufacturing technologies that are not only technically advanced but also socially responsible.

Ishikawa, Kenji [Nagoya Univ. (Japan)] (ORCID:0000

Transition Metal Dichalcogenide MoS 2 : Oxygen and Fluorine Functionalization for Selective Plasma Processing

Low-temperature plasma processing is a promising technique for tailoring transition metal dichalcogenides (TMDs). For chalcogen substitution processing, a key challenge is to identify the ion energy window that enables selective chalcogen removal while preserving the metal lattice. Using ab initio molecular dynamics (AIMD), we demonstrate that oxygen and fluorine functionalization widen the processing window by significantly lowering the sulfur sputtering energy threshold (E sputt,S ) of MoS 2 from ∼30 to ∼10 eV via formation of sputtering products such as SO 2 and SF n . Additionally, we show that experimentally relevant cryogenic temperatures strongly affect E sputt,S (T). The dependence is confirmed via AIMD and also predicted by a mechanistic parameter-free theory, suggesting that E sputt (T) generalizes to other TMDs, functionalizations, and surface impact conditions. Our results highlight oxygen/fluorine functionalization, ionic impact angle, and material temperature to be key control parameters for selective, damage-controlled chalcogen removal in TMD processing.

Polyachenko, Yury [Princeton Plasma Physics Labora

AN OVERVIEW OF PLASMA PROCESSING OF SRF CAVITIES AT JLAB

Plasma processing is a common technique where the free oxygen produced in a low-pressure RF plasma breaks down and removes hydrocarbons from surfaces. This increases the work function and reduces the secondary emission coefficient of the treated surfaces. Jefferson Lab has an ongoing R&D program in plasma processing. The experimental program investigated processing using argon/oxygen and helium/oxygen gas mixtures. The initial focus of the effort was processing C100 cavities by injecting RF power into the HOM coupler ports. We also developed the methods for establishing a plasma C75 cavities where the RF power is injected via the fundamental power-coupler. As part of the process development we processed, three C100 cryomodules in our off-line cryomodule test facility. In May 2023 we processed four C100 cryomodules in-situ in the CEBAF accelerator with the cryomodules returning to an operational status in Sept. 2023. The cumulative improvement in field emission free operation, as measured on a cavity by cavity basis, was 59 MeV or 24%. We recently started processing 7 cryomodules in the CEBAF accelerator in August 2024. Methods systems and results from processing cryomodules and individual cavities in the vertical test will be presented. Current status and future plans will also be presented.

Ganey, Tiffany

Advancing In-Situ Plasma Processing for SRF Cavities at Fermilab

This talk presents Fermilab’s experience with plasma processing applied to both elliptical and low-beta superconducting RF cavities. The development and implementation of the technique are compared across different geometries, with particular emphasis on constraints imposed by cryomodule assembly configurations. The talk also reports on systematic studies aimed at optimizing the processing recipe, including the exploration of various inert gas mixtures and oxygen concentrations. These results aim at providing guidance for tailoring plasma processing conditions to different cavity types and advancing plasma processing applicability in operational cryomodules.

Giaccone, Bianca [Fermilab] (ORCID:000000027275846

Advancing In-Situ Plasma Processing for SRF Cavities at Fermilab

This talk presents Fermilab’s experience with plasma processing applied to both elliptical and low-beta superconducting RF cavities. The development and implementation of the technique are compared across different geometries, with particular emphasis on constraints imposed by cryomodule assembly configurations. The talk also reports on systematic studies aimed at optimizing the processing recipe, including the exploration of various inert gas mixtures and oxygen concentrations. These results aim at providing guidance for tailoring plasma processing conditions to different cavity types and advancing plasma processing applicability in operational cryomodules.

Giaccone, Bianca [Fermilab] (ORCID:000000027275846

First plasma processing trial of a quarter-wave resonator cryomodule at the Facility for Rare Isotope Beams

Studies of plasma processing for reduction of field emission in quarter-wave resonator (QWR) cryomodules are underway at the Facility for Rare Isotope Beams (FRIB), where a total of 104 QWRs are presently in operation. Driving the plasma with a higher-order mode allows for less mismatch at the fundamental power coupler and higher plasma density. The first plasma processing trial for FRIB QWRs in a cryomodule was conducted in January 2024. In-bunker cold tests of the cryomodule showed a significant reduction in field emission x-rays after plasma processing.

Glow & corona plasma discharges

Plasma Processing for SSR Cavities

Overview of plasma processing setup for SSR1 cavities at IJCLab and for SSR2 cavities at Fermilab. Talk presented by Mattia Parise (Fermilab), Materials provided by Bianca Giaccone (Fermilab) and Camille Cheney (IJCLab).

72 PHYSICS OF ELEMENTARY PARTICLES AND FIELDS

Experimental Investigation of Plasma Processing for PIP-II SSR2 Cavities

Field emission and multipacting are critical factors that limit the achievable operational gradient of superconducting radio frequency (SRF) cavities. Plasma processing (PP) has been demonstrated as an effective in-situ technique for mitigating hydrocarbon-induced field emission and multipacting across a range of cavity geometries. In this work, we present the initial development and subsequent application of plasma processing for PIP-II type II spoke resonators (SSR2). The process was carried out at room temperature on an SSR2 cavity equipped with the CM-style high-power coupler and installed in the cryostat. Cavity performance was evaluated through comparative cold tests conducted before and after plasma processing.

Giaccone, Bianca [Fermilab] (ORCID:000000027275846

In Situ Plasma processing of SRF cuperconducting cavities at JLAB, 2024 Update

Jefferson Lab has an ongoing R&D program in plasma processing. The experimental program investi-gated processing using argon/oxygen and heli-um/oxygen gas mixtures. Plasma processing is a com-mon technique where the free oxygen produced by the plasma breaks down and removes hydrocarbons from surfaces. This increases the work function and reduces the secondary emission coefficient. The initial focus of the effort was processing C100 cavities by injecting RF power into the high order mode (HOM) coupler ports. We also developed the methods for establishing a plasma in C75 cryomodules where the RF power is injected via the fundamental power-coupler. Four C100 cryomodules were in situ processed in the CE-BAF accelerator in May 2023 with the cryomodules returning to an operational status in Sept. 2023. The overall operational energy gain for the four cryomod-ules was 49 MeV. Methods, systems and results from processing cryomodules in the CEBAF accelerator and vertical test results are presented. Current status and future plans are discussed.

Powers, T.

Plasma processing of SRF cavities at Jefferson Lab: Experiment results and simulation insight

Plasma processing of superconducting radio frequency (SRF) cavities has been an active research effort at Jefferson Lab (JLab) since 2019, aimed at enhancing cavity performance by removing hydrocarbon contaminants and reducing field emission. In this experiment, processing using argon-oxygen and helium-oxygen gas mixtures to find minimum ignition power at different cavity pressure was investigated. Ongoing simulations are contributing to a better understanding of the plasma surface interactions and the fundamental physics behind the process. These simulations, combined with experimental studies, guide the optimization of key parameters such as gas type, RF power, and pressure to ignite plasma using selected higher-order mode (HOM) frequencies. This paper presents experimental data from argon-oxygen and helium-oxygen gas mixture C75 and C100 cavity plasma ignition studies, as well as simulation results for the C100-type cavity based on the COMSOL model previously applied to the C75 cavity.

Accelerator Physics

Open‐Air Combustion Synthesis with Rapid Plasma Processing of Large‐Area Transparent Conducting Oxides

A vacuum-free, high-throughput synthesis of indium tin oxide (ITO) via Combustion Oxidation with Rapid Plasma Processing (CORP) utilizes a solution-based exothermic combustion reaction to generate the oxide with tunable control of either amorphous or crystalline phases. A subsequent open-air, forming gas plasma treatment is used to introduce oxygen vacancies and promote crystallization. Here, the evolution of the oxide structure is elucidated by extended X-ray absorption spectroscopy fine structure analysis. Using CORP, fabrication of 300 cm 2 of ITO possessing a champion sheet resistance of 38 Ω sq. −1 , visible transmission of 89%, conductivity stability for over 250 days, roughness < 2nm, and Haacke figure of merit (%T 550nm 10 /R s ) of 0.012 Ω −1 is achieved. Cost modeling of CORP demonstrates up to a 67% reduction in price for TCOs using fully continuous, in-line unit operations compared with vacuum sputtering. The work shows a path toward a low-cost, vacuum-free manufacturing method for TCOs at commercial scales.

42 ENGINEERING

Rapid scalable plasma processing of thin-film Li–La–Zr–O solid-state electrolytes

Solid-state electrolytes, such as lithium lanthanum zirconium oxide (LLZO), show promise as technologies for next-generation high-energy-density batteries, but commercial development has been hindered by a lack of scalable processing methods. Current fabrication methods are costly or require long annealing steps to create dense films. We report an atmospheric pressure blown-arc nitrogen plasma jet process to rapidly form sub-micrometer-thick, dense amorphous LLZO (a-LLZO) films from sol-gel precursors. Films are processed in less than 2 min, an order of magnitude faster than what has previously been reported. We demonstrate 500-nm-thick a-LLZO films processed at 350°C with an ionic conductivity of 2 × 10 −6 S/cm at 30°C and 2 × 10 −3 S/cm at 100°C and a conductance of 19 S at 100°C, the highest conductance of any LLZO phase to date. Here, the films exhibit outstanding smooth surface morphology with low defectivity, advancing atmospheric plasma processing as a scalable processing method for solid-state electrolytes.

25 ENERGY STORAGE