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Results for “PLASMA POTENTIAL”

Search indexed NASA NTRS and DOE OSTI research on propulsion, heat transfer, battery materials and energy systems. Follow report and document links to the original sources.

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At least 19 records
All sourcesNASA NTRSDOE OSTI
DOE OSTI2014

Response of the plasma to the size of an anode electrode biased near the plasma potential

As the size of a positively biased electrode increases, the nature of the interface formed between the electrode and the host plasma undergoes a transition from an electron-rich structure (electron sheath) to an intermediate structure containing both ion and electron rich regions (double layer) and ultimately forms an electron-depleted structure (ion sheath). In this study, measurements are performed to further test how the size of an electron-collecting electrode impacts the plasma discharge the electrode is immersed in. This is accomplished using a segmented disk electrode in which individual segments are individually biased to change the effective surface area of the anode. Measurements of bulk plasma parameters such as the collected current density, plasma potential, electron density, electron temperature and optical emission are made as both the size and the bias placed on the electrode are varied. Abrupt transitions in the plasma parameters resulting from changing the electrode surface area are identified in both argon and helium discharges and are compared to the interface transitions predicted by global current balance [S. D. Baalrud, N. Hershkowitz, and B. Longmier, Phys. Plasmas 14, 042109 (2007)]. While the size-dependent transitions in argon agree, the size-dependent transitions observed in helium systematically occur at lower electrode sizes than those nominally derived from prediction. The discrepancy in helium is anticipated to be caused by the finite size of the interface that increases the effective area offered to the plasma for electron loss to the electrode.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
DOE OSTI2016

The onset of plasma potential locking

In this study, we provide insight into the role and impact that a positively biased electrode (anode) has on bulk plasma potential. Using two-dimensional Particle-in-Cell simulations, we investigate the plasma potential as an anode transitions from very small (“probe” mode) to large (“locking” mode). Prior theory provides some guidance on when and how this transition takes place. Initial experimental results are also compared. The simulations demonstrate that as the surface area of the anode is increased transitions in plasma potential and sheath polarity occur, consistent with experimental observations and theoretical predictions. It is expected that understanding this basic plasma behavior will be of interest to basic plasma physics communities, diagnostic developers, and plasma processing devices where control of bulk plasma potential is important.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
DOE OSTI2012

Radio frequency discharge with control of plasma potential distribution

A RF discharge plasma generator with additional electrodes for independent control of plasma potential distribution is proposed. With positive biasing of this ring electrode relative end flanges and longitudinal magnetic field a confinement of fast electrons in the discharge will be improved for reliable triggering of pulsed RF discharge at low gas density and rate of ion generation will be enhanced. In the proposed discharge combination, the electron energy is enhanced by RF field and the fast electron confinement is improved by enhanced positive plasma potential which improves the efficiency of plasma generation significantly. This combination creates a synergetic effect with a significantly improving the plasma generation performance at low gas density. The discharge parameters can be optimized for enhance plasma generation with acceptable electrode sputtering.

43 PARTICLE ACCELERATORS↗
DOE OSTI2012

Negative plasma potential in a multidipole chamber with a dielectric coated plasma boundary

Negative plasma potentials with respect to a grounded wall that was coated with a dielectric have been achieved in an electropositive plasma confined by a multidipole device. A Langmuir probe was used to measure the density and temperatures of the bi-Maxwellian distribution electrons and an emissive probe was used to measure the plasma potential profile near the plasma boundary. For many discharge parameters, the potential profile was that of a typical electropositive sheath, but it was shifted negative due to negative charge accumulated on the plasma-surface boundary. A virtual cathode was observed near the boundary when the neutral pressure, primary electron energy, and/or discharge current were low ({approx}2 x 10{sup -4} Torr, {approx}60 eV, and 80 mA, respectively). The behavior of the sheath potential was shown to be consistent with that predicted by particle balance and a qualitative mechanism for wall charging is presented.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
DOE OSTI2016

Transient plasma potential in pulsed dual frequency inductively coupled plasmas and effect of substrate biasing

An electron emitting probe in saturated floating potential mode has been used to investigate the temporal evolution of plasma potential and the effect of substrate RF biasing on it for pulsed dual frequency (2 MHz/13.56 MHz) inductively coupled plasma (ICP) source. The low frequency power (P{sub 2MHz}) has been pulsed at 1 KHz and a duty ratio of 50%, while high frequency power (P{sub 13.56MHz}) has been used in continuous mode. The substrate has been biased with a separate bias power at (P{sub 12.56MHz}) Argon has been used as a discharge gas. During the ICP power pulsing, three distinct regions in a typical plasma potential profile, have been identified as ‘initial overshoot’, pulse ‘on-phase’ and pulse ‘off-phase’. It has been found out that the RF biasing of the substrate significantly modulates the temporal evolution of the plasma potential. During the initial overshoot, plasma potential decreases with increasing RF biasing of the substrate, however it increases with increasing substrate biasing for pulse ‘on-phase’ and ‘off-phase’. An interesting structure in plasma potential profile has also been observed when the substrate bias is applied and its evolution depends upon the magnitude of bias power. The reason of the evolution of this structure may be the ambipolar diffusion of electron and its dependence on bias power.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
DOE OSTI2014

ICRF-enhanced plasma potentials in the SOL of Alcator C-Mod

We performed an extensive survey of the plasma potential in the scrape-off layer (SOL) of Ion Cyclotron Range-of Frequencies (ICRF)-heated discharges on Alcator C-Mod. Our results show that plasma potentials are enhanced in the presence of ICRF power and plasma potential values of >100 V are often observed. Such potentials are high enough to induce sputtering of high-Z molybdenum (Mo) plasma facing components by deuterium ions on C-Mod. For comparison, the plasma potential in Ohmic discharges is typically less than 10 V, well below the threshold needed to induce Mo sputtering by deuterium ions. ICRF-enhanced plasma potentials are observed in the SOL regions that both magnetically map and do not map to active ICRF antennas. Regions that magnetically map to active ICRF antennas are accessible to slow waves directly launched by the antennas and these regions experience plasma potential enhancement that is partially consistent with the slow wave rectification mechanism. One of the most defining features of the slow wave rectification is a threshold appearance of significant plasma potentials (>100 V) when the dimensionless rectification parameter Λ{sub −o} is above unity and this trend is observed experimentally. We also observe ICRF-enhanced plasma potentials >100 V in regions that do not magnetically map to the active antennas and, hence, are not accessible for slow waves launched directly by the active antennas. However, unabsorbed fast waves can reach these regions. The general trend that we observe in these 'un-mapped' regions is that the plasma potential scales with the strength of the local RF wave fields with the fast wave polarization and the highest plasma potentials are observed in discharges with the highest levels of unabsorbed ICRF power. Similarly, we find that core Mo levels scale with the level of unabsorbed ICRF power suggesting a link between plasma potentials in the SOL and the strength of the impurity source.

75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND↗
DOE OSTI2015

Comparative measurements of plasma potential with ball-pen and Langmuir probe in low-temperature magnetized plasma

The ball-pen probe (BPP) is used for direct plasma potential measurements in magnetized plasma. The probe can adjust the ratio of the electron and ion saturation currents I{sub sat}{sup −}/I{sub sat}{sup +} to be close to one and therefore its I-V characteristic becomes nearly symmetric. If this is achieved, the floating potential of the BPP is close to the plasma potential. Because of its rather simple construction, it offers an attractive probe for measurements in magnetized plasma. Comparative measurements of plasma potential by BPPs of different dimensions as well as one Langmuir probe (LP) in an argon discharge plasma of a cylindrical magnetron were performed at various experimental conditions. An additional comparison by an emissive probe was also performed. All these types of probes provide similar values of plasma potential in a wide range of plasma parameters. Our results for three different BPP dimensions indicate that the BPP can be operated in a cylindrical magnetron DC argon discharge if the value of the ratio of the magnetic field and neutral gas pressure, B/p, is greater than approximately 10 mT/Pa.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
DOE OSTI2020

Experimental studies of the difference between plasma potentials measured by Langmuir probes and emissive probes in presheaths

The plasma potential measured by cylindrical and planar Langmuir probes has been shown to differ from the plasma potential measured by emissive probes in the neighborhood of the presheath near a negatively biased electrode immersed in a weakly collisional low temperature argon plasma. There are two principal results demonstrated in this paper. First, while it is well known that Langmuir probes cannot reliably measure plasma potentials inside of sheaths, results presented here demonstrate that the problem persists in presheaths, the quasineutral plasma bordering sheaths. It is known that emissive probes analyzed in the limit of zero emission accurately measure the plasma potential in the sheath. It is now clear that they are the only known electrostatic probe technique able to measure the plasma potential accurately throughout the presheath. Second, it is shown that the difference between potential measurements made by Langmuir probes and emissive probes in the body of the plasma, farther than a presheath distance from the boundary, is not proportional to T e , as has been previously claimed.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
DOE OSTI2012

Effect of source tuning parameters on the plasma potential of heavy ions in the 18 GHz high temperature superconducting electron cyclotron resonance ion source

Plasma potentials for various heavy ions have been measured using the retarding field technique in the 18 GHz high temperature superconducting ECR ion source, PKDELIS [C. Bieth, S. Kantas, P. Sortais, D. Kanjilal, G. Rodrigues, S. Milward, S. Harrison, and R. McMahon, Nucl. Instrum. Methods B 235, 498 (2005); D. Kanjilal, G. Rodrigues, P. Kumar, A. Mandal, A. Roy, C. Bieth, S. Kantas, and P. Sortais, Rev. Sci. Instrum. 77, 03A317 (2006)]. The ion beam extracted from the source is decelerated close to the location of a mesh which is polarized to the source potential and beams having different plasma potentials are measured on a Faraday cup located downstream of the mesh. The influence of various source parameters, viz., RF power, gas pressure, magnetic field, negative dc bias, and gas mixing on the plasma potential is studied. The study helped to find an upper limit of the energy spread of the heavy ions, which can influence the design of the longitudinal optics of the high current injector being developed at the Inter University Accelerator Centre. It is observed that the plasma potentials are decreasing for increasing charge states and a mass effect is clearly observed for the ions with similar operating gas pressures. In the case of gas mixing, it is observed that the plasma potential minimizes at an optimum value of the gas pressure of the mixing gas and the mean charge state maximizes at this value. Details of the measurements carried out as a function of various source parameters and its impact on the longitudinal optics are presented.

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND ↗
DOE OSTI2012

Ion velocity and plasma potential measurements of a cylindrical cusped field thruster

Measurements of the most probable time-averaged axial ion velocities and plasma potential within the acceleration channel and in the plume of a straight-channeled cylindrical cusped field thruster operating on xenon are presented. Ion velocities for the thruster are derived from laser-induced fluorescence measurements of the 5d[4]{sub 7/2}-6p[3]{sub 5/2} xenon ion excited state transition centered at {lambda}=834.72nm. Plasma potential measurements are made using a floating emissive probe with a thoriated-tungsten filament. The thruster is operated in a power matched condition with 300 V applied anode potential for comparison to previous krypton plasma potential measurements, and a low power condition with 150 V applied anode potential. Correlations are seen between the plasma potential drop outside of the thruster and kinetic energy contours of the accelerating ions.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
DOE OSTI2011

A synchronized emissive probe for time-resolved plasma potential measurements of pulsed discharges

A pulsed emissive probe technique is presented for measuring the plasma potential of pulsed plasma discharges. The technique provides time-resolved data and features minimal disturbance of the plasma achieved by alternating probe heating with the generation of plasma. Time resolution of about 20 ns is demonstrated for high power impulse magnetron sputtering (HIPIMS) plasma of niobium in argon. Spatial resolution of about 1 mm is achieved by using a miniature tungsten filament mounted on a precision translational stage. Repeated measurements for the same discharge conditions show that the standard deviation of the measurements is about 1-2 V, corresponding to 4%-8% of the maximum plasma potential relative to ground. The principle is demonstrated for measurements at a distance of 30 mm from the target, for different radial positions, at an argon pressure of 0.3 Pa, a cathode voltage of -420 V, and a discharge current of about 60 A in the steady-state phase of the HIPIMS pulse.

75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND↗
DOE OSTI2012

Plasma potential mapping of high power impulse magnetron sputtering discharges

Pulsed emissive probe techniques have been used to determine the plasma potential distribution of high power impulse magnetron sputtering (HiPIMS) discharges. An unbalanced magnetron with a niobium target in argon was investigated for a pulse length of 100 {mu}s at a pulse repetition rate of 100 Hz, giving a peak current of 170 A. The probe data were recorded with a time resolution of 20 ns and a spatial resolution of 1 mm. It is shown that the local plasma potential varies greatly in space and time. The lowest potential was found over the target's racetrack, gradually reaching anode potential (ground) several centimeters away from the target. The magnetic presheath exhibits a funnel-shaped plasma potential resulting in an electric field which accelerates ions toward the racetrack. In certain regions and times, the potential exhibits weak local maxima which allow for ion acceleration to the substrate. Knowledge of the local E and static B fields lets us derive the electrons'ExB drift velocity, which is about 10{sup 5} m/s and shows structures in space and time.

36 MATERIALS SCIENCE↗
DOE OSTI2014

Note: On the measurement of plasma potential fluctuations using emissive probes

In this Note, it is pointed out that emissive probes cannot be used to directly and reliably measure plasma potential fluctuations. An experimentally validated model demonstrates indeed that the floating potential fluctuations of an emissive probe which floats at the mean plasma potential depend not only on the plasma potential fluctuations but also on electron density and temperature fluctuations.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
DOE OSTI2011

Plasma potential mapping of high power impulse magnetron sputtering discharges

Pulsed emissive probe techniques have been used to determine the plasma potential distribution of high power impulse magnetron sputtering (HiPIMS) discharges. An unbalanced magnetron with a niobium target in argon was investigated for pulse length of 100 μs at a pulse repetition rate of 100 Hz, giving a peak current of 170 A. The probe data were taken with a time resolution of 20 ns and a spatial resolution of 1 mm. It is shown that the local plasma potential varies greatly in space and time. The lowest potential was found over the target’s racetrack, gradually reaching anode potential (ground) several centimeters away from the target. The magnetic pre-sheath exhibits a funnel-shaped plasma potential resulting in an electric field which accelerates ions toward the racetrack. In certain regions and times, the potential exhibits weak local maxima which allow for ion acceleration to the substrate. Knowledge of the local E and static B fields lets us derive the electrons’ E×B drift velocity, which is about 105 m/s and shows structures in space and time.

36 MATERIALS SCIENCE↗
DOE OSTI2016

Bunker probe: A plasma potential probe almost insensitive to its orientation with the magnetic field

Due to their ability to suppress a large part of the electron current and thus measuring directly the plasma potential, ion sensitive probes have begun to be widely tested and used in fusion devices. For these probes to work, almost perfect alignment with the total magnetic field is necessary. This condition cannot always be fulfilled due to the curvature of magnetic fields, complex magnetic structure, or magnetic field reconnection. In this perspective, we have developed a plasma potential probe (named Bunker probe) based on the principle of the ion sensitive probe but almost insensitive to its orientation with the total magnetic field. Therefore it can be used to measure the plasma potential inside fusion devices, especially in regions with complex magnetic field topology. Experimental results are presented and compared with Ball-Pen probe measurements taken under identical conditions. We have observed that the floating potential of the Bunker probe is indeed little affected by its orientation with the magnetic field for angles ranging from 90° to 30°, in contrast to the Ball-Pen probe whose floating potential decreases towards that of a Langmuir probe if not properly aligned with the magnetic field.

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND ↗
DOE OSTI2015

Control of laser-ablation plasma potential with external electrodes

The potential of a laser-ablation plasma was controlled stably up to +2 kV by using external ring electrodes. A stable electron sheath was formed between the plasma and the external electrodes by placing the ring electrodes away from the boundary of the drifting plasma. The plasma kept the potential for a few μs regardless of the flux change of the ablation plasma. We also found that the plasma potential changed with the expansion angle of the plasma from the target. By changing the distance between the plasma boundary and the external electrodes, we succeeded in controlling the potential of laser-ablation plasma.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗
DOE OSTI2015

Low energy highly charged ion beam facility at Inter University Accelerator Centre: Measurement of the plasma potential and ion energy distributions

A deceleration lens coupled to one of the beam lines of the electron cyclotron resonance based low energy beam facility at Inter University Accelerator Centre is reported. This system is capable of delivering low energy (2.5 eV/q–1 keV/q) highly charged ion beams. The presence of plasma potential hinders the measurements of low energies (<50 eV), therefore, plasma potential measurements have been undertaken using a retarding plate analyzer in unison with the deceleration assembly. The distributions of the ion energies have been obtained and the effect of different source parameters on these distributions is studied.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗