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At least 19 records

Review Article: Advanced nanoscale patterning and material synthesis with gas field helium and neon ion beams

Focused ion beam nanoscale synthesis has emerged as a critical tool for selected area nanofabrication. Helium and neon ion beams from the gas field ion source have recently demonstrated unparalleled resolution among other scanning ion beams. In this review, the authors focus on the nanoscale synthesis applications for these ion species which have been demonstrated to date. The applications and recent work can broadly be grouped into the following categories: (1) Monte Carlo simulations, (2) direct-write milling or sputtering, (3) ion beam lithography, (4) selective ion implantation or defect introduction, and (5) gas-assisted processing. A special emphasis is given toward using He+ and Ne+ for the processing of two dimensional materials, as several groups have demonstrated promising results. Finally, the authors will discuss the future outlook of He+ and Ne+ nanoprocessing techniques and applications.

Stanford, Michael G.↗

Graphene engineering by neon ion beams

Achieving the ultimate limits of materials and device performance necessitates the engineering of matter with atomic, molecular, and mesoscale fidelity. While common for organic and macromolecular chemistry, these capabilities are virtually absent for 2D materials. In contrast to the undesired effect of ion implantation from focused ion beam (FIB) lithography with gallium ions, and proximity effects in standard e-beam lithography techniques, the shorter mean free path and interaction volumes of helium and neon ions offer a new route for clean, resist free nanofabrication. Furthermore, with the advent of scanning helium ion microscopy, maskless He + and Ne + beam lithography of graphene based nanoelectronics is coming to the forefront. Here, we will discuss the use of energetic Ne ions in engineering graphene devices and explore the mechanical, electromechanical and chemical properties of the ion-milled devices using scanning probe microscopy (SPM). By using SPM-based techniques such as band excitation (BE) force modulation microscopy, Kelvin probe force microscopy (KPFM) and Raman spectroscopy, we demonstrate that the mechanical, electrical and optical properties of the exact same devices can be quantitatively extracted. Additionally, the effect of defects inherent in ion beam direct-write lithography, on the overall performance of the fabricated devices is elucidated.

36 MATERIALS SCIENCE↗

Study of background processes with the formation of neutrons in nuclear reactions in the energy range of 26–32 kev

The nature of background processes accompanying astrophysical nuclear reactions induced by hydrogen, helium, and neon ions in deuterated targets with small cross sections has been studied in calculations and experiments. The experiments have been performed at a Hall pulsed plasma accelerator in the ion energy range of 26–32 keV. The yield of background neutrons and γ-quanta with energies below 4 MeV in the proton-induced D(p, γ){sup 3}He reaction is primarily due to the presence of a natural impurity of gaseous deuterium in gaseous hydrogen and the chain of D(D, {sup 3}He)n → (n, γ) or (n, n'γ) reactions. A small contribution comes from the chain of D({sup 1}H, {sup 1}H)D → D(D, {sup 3}He)n → (n, γ) or (n, n'γ) reactions. It has been shown that background neutrons and γ-quanta from the D(4He, γ)6Li reaction are entirely due to the chain of D({sup 4}He, {sup 4}He)D → D(D, {sup 3}He)n → (n, γ) or (n, n'γ) reactions. It has been shown that the yield of neutrons and γ-ray photons detected at the interaction of neon ions with deuterated targets is also entirely due to the chain of elastic- scattering reactions of neon ions on deuterons in the target and to subsequent inelastic processes of interaction of deuterons accelerated at elastic scattering with other deuterons of the target. The main contribution to the yields of background neutrons and γ-quanta comes from doubly charged neon ions. The main conclusion is that the explanation of the yield of neutrons and γ-quanta at the interaction of hydrogen, helium, and neon ions with deuterated targets does not require “exotic” theoretical models.

73 NUCLEAR PHYSICS AND RADIATION PHYSICS↗

Evaluation of neon focused ion beam milling for TEM sample preparation

Summary Gallium‐based focused ion beams generated from liquid–metal sources are widely used in micromachining and sample preparation for transmission electron microscopy, with well‐known drawbacks such as sample damage and contamination. In this work, an alternative (neon) focused ion beam generated by a gas field‐ionization source is evaluated for the preparation of electron‐transparent specimens. To do so, electron‐transparent sections of Si and an Al alloy are prepared with both Ga and Ne ion beams for direct comparison. Diffraction‐contrast imaging and energy dispersive x‐ray spectroscopy are used to evaluate the relative damage induced by the two beams, and cross‐sections of milled trenches are examined to compare the implantation depth with theoretical predictions from Monte Carlo simulations. Our results show that for the beam voltages and materials systems investigated, Ne ion beam milling does not significantly reduce the focused ion beam induced artefacts. However, the Ne ion beam does enable more precise milling and may be of interest in cases where Ga contamination cannot be tolerated.

PEKIN, T. C.↗

A comparison of He and Ne FIB imaging of cracks in microindented silicon nitride

Highlights: • Silicon nitride was successfully imaged with helium and neon ion microscopy. • Indent-induced cracking was resolved on conductively-coated and uncoated samples. • Cracking was found to be primarily intergranular in nature. • The grain microstructure was most visible on the carbon-coated sample. • For the carbon-coated sample, localized charging was observed along crack pathways. - Abstract: Helium ion microscopy (HIM) offers potential as a high spatial resolution technique for imaging insulating samples that are susceptible to charging artifacts. In this study helium and neon ion microscopy are used to image cracking in microindented samples of the non-conductive ceramic silicon nitride. The crack morphology of radial cracks emanating from the microindentations has been characterized for two different compositions of silicon nitride, with and without conductive coatings. Gold coating enhances crack edge contrast, but masks grain contrast for both He and Ne ion-induced secondary electron (ISE) imaging. Carbon coating enables the crystalline and glassy phases to be distinguished, more clearly with Ne-ISE, and the cracking pathway is found to be primarily intergranular. Zones of <100 nm diameter depleted ion-induced secondary electron emission along the crack paths are identified, consistent with charging ‘hotspots’.

36 MATERIALS SCIENCE↗

Real-time radiative divertor feedback control development for the NSTX-U tokamak using a vacuum ultraviolet spectrometer

A radiative divertor technique is planned for the NSTX-U tokamak to prevent excessive erosion and thermal damage of divertor plasma-facing components in H-mode plasma discharges with auxiliary heating up to 12 MW. In the radiative (partially detached) divertor, extrinsically seeded deuterium or impurity gases are used to increase plasma volumetric power and momentum losses. A real-time feedback control of the gas seeding rate is planned for discharges of up to 5 s duration. The outer divertor leg plasma electron temperature T{sub e} estimated spectroscopically in real time will be used as a control parameter. A vacuum ultraviolet spectrometer McPherson Model 251 with a fast charged-coupled device detector is developed for temperature monitoring between 5 and 30 eV, based on the Δn = 0, 1 line intensity ratios of carbon, nitrogen, or neon ion lines in the spectral range 300–1600 Å. A collisional-radiative model-based line intensity ratio will be used for relative calibration. A real-time T{sub e}-dependent signal within a characteristic divertor detachment equilibration time of ∼10–15 ms is expected.

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND ↗

Influence of the chemical nature of implanted ions on the structure of a silicon layer damaged by implantation

The influence of the implantation of silicon single crystals by fluorine, nitrogen, oxygen, and neon ions on the distribution of strain and the static Debye-Waller factor in the crystal lattice over the implanted-layer depth has been investigated by high-resolution X-ray diffraction. The density depth distribution in the surface layer of native oxide has been measured by X-ray reflectometry. Room-temperature implantation conditions have ensured the equality of the suggested ranges of ions of different masses and the energies transferred by them to the target. It is convincingly shown that the change in the structural parameters of the radiation-damaged silicon layer and the native oxide layer depend on the chemical activity of the implanted ions.

75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND↗

Optimizing Normal Tissue Sparing in Ion Therapy Using Calculated Isoeffective Dose for Ion Selection

Purpose: To investigate how the selection of ion type affects the calculated isoeffective dose to the surrounding normal tissue as a function of both normal tissue and target tissue {alpha}/{beta} ratios. Methods and Materials: A microdosimetric biologic dose model was incorporated into a Geant4 simulation of parallel opposed beams of protons, helium, lithium, beryllium, carbon, and neon ions. The beams were constructed to give a homogeneous isoeffective dose to a volume in the center of a water phantom for target tissues covering a range of cobalt equivalent {alpha}/{beta} ratios of 1-20 Gy. Concomitant normal tissue isoeffective doses in the plateau of the ion beam were then compared for different ions across the range of normal tissue and target tissue radiosensitivities for a fixed isoeffective dose to the target tissue. Results: The ion type yielding the optimal normal tissue sparing was highly dependent on the {alpha}/{beta} ratio of both the normal and the target tissue. For carbon ions, the calculated isoeffective dose to normal tissue at a 5-cm depth varied by almost a factor of 5, depending on the {alpha}/{beta} ratios of the normal and target tissue. This ranges from a factor of 2 less than the isoeffective dose of a similar proton treatment to a factor of 2 greater. Conclusions: No single ion is optimal for all treatment scenarios. The heavier ions are superior in cases in which the {alpha}/{beta} ratio of the target tissue is low and the {alpha}/{beta} ratio of normal tissue is high, and protons are superior in the opposite circumstances. Lithium and beryllium appear to offer dose advantages similar to carbon, with a considerably lower normal tissue dose when the {alpha}/{beta} ratio in the target tissue is high and the {alpha}/{beta} ratio in the normal tissue is low.

62 RADIOLOGY AND NUCLEAR MEDICINE↗

Large Photothermal Effect in Sub-40 nm h-BN Nanostructures Patterned Via High-Resolution Ion Beam

The controlled nanoscale patterning of 2D materials is a promising approach for engineering the optoelectronic, thermal, and mechanical properties of these materials to achieve novel functionalities and devices. Herein, high-resolution patterning of hexagonal boron nitride (h-BN) is demonstrated via both helium and neon ion beams and an optimal dosage range for both ions that serve as a baseline for insulating 2D materials is identified. Through this nanofabrication approach, a grating with a 35 nm pitch, individual structure sizes down to 20 nm, and additional nanostructures created by patterning crystal step edges are demonstrated. Raman spectroscopy is used to study the defects induced by the ion beam patterning and is correlated to scanning probe microscopy. Photothermal and scanning near-field optical microscopy measure the resulting near-field absorption and scattering of the nanostructures. These measurements reveal a large photothermal expansion of nanostructured h-BN that is dependent on the height to width aspect ratio of the nanostructures. This effect is attributed to the large anisotropy of the thermal expansion coefficients of h-BN and the nanostructuring implemented. Finally, the photothermal expansion should be present in other van der Waals materials with large anisotropy and can lead to applications such as nanomechanical switches driven by light.

2D materials↗

Two-dimensional positive column structure in a discharge tube with radius discontinuity

The low-pressure (40 and 90 Pa) low-current (4 and 10 mA) direct current discharge in a tube with a sharp change of its radius is studied both numerically and experimentally. A fully self-consistent hybrid numerical model of a two-dimensional non-uniform positive column in neon is developed using a nonlocal approach. The model combines kinetic simulation of the electrons (under two-terms approach) and fluid description of the neon ions and permits to calculate the distribution of all plasma parameters in the direct current discharges in the cameras with cylindrical geometry and radius discontinuity. The simulation results are compared with the measured 585.3 nm neon spectral line absolute intensities and excited 1s{sub 3} metastable neon atom number densities. Non-local electron kinetics in the transition region and formation of standing strata are discussed.

71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSIC↗

Determination of the plasma parameters in the PF-3 facility by the methods of X-ray spectroscopy

NeIX and NeX spectra emitted by the PF-3 high-current (2 MA) plasma focus facility are measured. A numerical model describing the spectral intensities of the emission of helium- and hydrogen-like neon ions from an optically thick plasma is proposed. The electron temperature T{sub e} and electron density n{sub e} in the plasma of the PF-3 facility are determined by comparing the calculated and measured emission spectra of neon.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

In situ mitigation of subsurface and peripheral focused ion beam damage via simultaneous pulsed laser heating

Focused helium and neon ion (He(+)/Ne(+) ) beam processing has recently been used to push resolution limits of direct-write nanoscale synthesis. The ubiquitous insertion of focused He(+) /Ne(+) beams as the next-generation nanofabrication tool-of-choice is currently limited by deleterious subsurface and peripheral damage induced by the energetic ions in the underlying substrate. The in situ mitigation of subsurface damage induced by He(+)/Ne(+) ion exposures in silicon via a synchronized infrared pulsed laser-assisted process is demonstrated. The pulsed laser assist provides highly localized in situ photothermal energy which reduces the implantation and defect concentration by greater than 90%. The laser-assisted exposure process is also shown to reduce peripheral defects in He(+) patterned graphene, which makes this process an attractive candidate for direct-write patterning of 2D materials. In conclusion, these results offer a necessary solution for the applicability of high-resolution direct-write nanoscale material processing via focused ion beams.

36 MATERIALS SCIENCE↗

Spatial fractionation of the dose using neon and heavier ions: A Monte Carlo study

Purpose: This work explores a new radiation therapy approach which might trigger a renewed use of neon and heavier ions to treat cancers. These ions were shown to be extremely efficient in radioresistant tumor killing. Unfortunately, the efficient region also extends into the normal tissue in front of the tumor. The strategy the authors propose is to profit from the well-established sparing effect of thin spatially fractionated beams, so that the impact on normal tissues might be minimized while a high tumor control is achieved. The main goal of this work is to provide a proof of concept of this new approach. With that aim, a dosimetric study was carried out as a first step to evaluate the interest of further explorations of this avenue. Methods: The GATE/GEANT4 v.6.1 Monte Carlo simulation platform was employed to simulate arrays of rectangular minibeams (700 μm × 2 cm) of four ions (Ne, Si, Ar, and Fe). The irradiations were performed with a 2 cm-long spread-out Bragg peak centered at 7 cm-depth. Dose distributions in a water phantom were scored considering two minibeams center-to-center distances: 1400 and 3500 μm. Peak and valley doses, peak-to-valley dose ratios (PVDRs), beam penumbras, and relative contribution of nuclear fragments and electromagnetic processes were assessed as figures of merit. In addition, the type and proportion of the secondary nuclear fragments were evaluated in both peak and valley regions. Results: Extremely high PVDR values (>100) and low valley doses were obtained. The higher the atomic number (Z) of the primary ion is, the lower the valleys and the narrower the penumbras. Although the yield of secondary nuclear products increases with Z, the actual dose being deposited by the secondary nuclear fragments in the valleys starts to be the dominant contribution at deeper points, helping in the sparing of proximal normal tissues. Additionally, a wider center-to-center distance leads to a minimized contribution of heavier secondary fragments in valleys. Conclusions: The computed dose distributions suggest that a spatial fractionation of the dose combined to the use of submillimetric field sizes might allow profiting from the high efficiency of neon and heavier ions for the treatment of radioresistant tumors, while preserving normal tissues. The authors’ results support the further exploration of this avenue. Next steps include the realization of biological experiment to confirm the shifting of normal tissue complication probability curves.

60 APPLIED LIFE SCIENCES↗

Electron impact collision strengths in Ne VII

The lines of Ne VII have been observed in many astronomical objects, and some transitions from high energy levels were observed both in Seyfert galaxies and stellar coronae. Thus, the atomic data for these transitions are important for modeling. Using the code FAC we calculated the collision strengths based on the distorted-wave method with large configuration interactions included. The Maxwellian averaged effective collision strengths covering the typical temperature range of astronomical and laboratory hot plasmas are presented. We extend the calculation of the energy levels to n=4 and 5. The energy levels, wavelengths, spontaneous transition rates, weighted oscillator strengths, and effective collision strengths were reported. Compared with the results from experiment or previous theoretical calculations a general agreement is found. It is found that the resonance effects are important in calculating the effective collision strengths.

74 ATOMIC AND MOLECULAR PHYSICS↗

Ne{sup +} ion sputtering effect on amorphous Ga-In-Zn-O thin-film surface investigated by high-resolution XPS

The effect of Ne{sup +} ion sputtering on amorphous Ga-In-Zn-O (a-GIZO) thin films was investigated by using surface-sensitive, synchrotron-radiation-based, high-resolution X-ray photoelectron spectroscopy (XPS). a-GIZO thin films having different compositions (Ga{sub 2}O{sub 3}:In{sub 2}O{sub 3}:ZnO = 1:1:1, 2:2:1, 3:2:1, 4:2:1) were investigated. It was found out that the amounts of the In and Zn contents relative to that of Ga decreased noticeably after sufficient sputtering, and that there occurred a subgap state above the valence band maximum and metallic states at the In 3d and 4d core levels as well as at the Fermi edge.

75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND↗