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At least 19 records

Angle-resolved Auger electron spectra induced by neon ion impact on aluminum

Auger electron emission from aluminum bombarded with 1 to 5 keV neon ions was studied by angle-resolved electron spectroscopy. The position and shape of the spectral features depended on the incident ion energy, angle of ion incidence, and electron take-off angle with respect to the aluminum surface. These spectral dependencies were interpreted in terms of the Doppler shift given to the Auger electron velocity by the excited atom ejected into the vacuum. For oblique ion incidence it is concluded that a flux of high energy atoms are ejected in a direction close to the projection of the ion beam on the target surface. In addition, a new spectral feature was found and identified as due to Auger emission from excited neon in the aluminum matrix.

Pepper, S. V.↗

Binary collision model for neon Auger spectra from neon ion bombardment of the aluminum surface

A model is developed to account for the angle-resolved Auger spectra from neon ion bombardment of the aluminum surface recently obtained by Pepper and Aron. The neon is assumed to be excited in a single asymmetric neon-aluminum-collision and scattered back into the vacuum where it emits an Auger electron. The velocity of the Auger electron acquires a Doppler shift by virtue of the emission from a moving source. The dependence of the Auger peak shape and energy on the incident ion energy, angle of incidence and on the angle of Auger electron emission with respect to the surface is presented. Satisfactory agreement with the angle resolved experimental observations is obtained. The dependence of the angle-integrated Auger yield on the incident ion energy and angle of incidence is also obtained and shown to be in satisfactory agreement with available experimental evidence.

Pepper, S. V.↗

The Biological Effectiveness of Four Energies of Neon Ions for the Induction of Chromosome Damage in Human Lymphocytes

Chromosomal aberrations were measured in human peripheral blood lymphocytes after in vitro exposure to neon ions at energies of 64, 89, 142, or 267. The corresponding LET values for these energies of neon ranged from 38-103 keV/micrometers and doses delivered were in the 10 to 80 cGy range. Chromosome exchanges were assessed in metaphase and G2 phase cells at first division after exposure using fluorescence in situ hybridization (FISH) with whole chromosome probes and dose response curves were generated for different types of chromosomal exchanges. The yields of total chromosome exchanges were similar for the 64, 89, and 142 MeV exposures, whereas the 267 MeV/u neon with LET of 38 keV/micrometers produced about half as many exchanges per unit dose. The induction of complex type chromosome exchanges (exchanges involving three or more breaks and two or more chromosomes) showed a clear LET dependence for all energies. The ratio of simple to complex type exchanges increased with LET from 18 to 51%. The relative biological effectiveness (RBE) was estimated from the initial slope of the dose response curve for chromosome damage with respect to gamma-rays. The RBE(sub max) values for total chromosome exchanges for the 64 MeV/u was around 30.

George, Kerry↗

Review Article: Advanced nanoscale patterning and material synthesis with gas field helium and neon ion beams

Focused ion beam nanoscale synthesis has emerged as a critical tool for selected area nanofabrication. Helium and neon ion beams from the gas field ion source have recently demonstrated unparalleled resolution among other scanning ion beams. In this review, the authors focus on the nanoscale synthesis applications for these ion species which have been demonstrated to date. The applications and recent work can broadly be grouped into the following categories: (1) Monte Carlo simulations, (2) direct-write milling or sputtering, (3) ion beam lithography, (4) selective ion implantation or defect introduction, and (5) gas-assisted processing. A special emphasis is given toward using He+ and Ne+ for the processing of two dimensional materials, as several groups have demonstrated promising results. Finally, the authors will discuss the future outlook of He+ and Ne+ nanoprocessing techniques and applications.

Stanford, Michael G.↗

Graphene engineering by neon ion beams

Achieving the ultimate limits of materials and device performance necessitates the engineering of matter with atomic, molecular, and mesoscale fidelity. While common for organic and macromolecular chemistry, these capabilities are virtually absent for 2D materials. In contrast to the undesired effect of ion implantation from focused ion beam (FIB) lithography with gallium ions, and proximity effects in standard e-beam lithography techniques, the shorter mean free path and interaction volumes of helium and neon ions offer a new route for clean, resist free nanofabrication. Furthermore, with the advent of scanning helium ion microscopy, maskless He + and Ne + beam lithography of graphene based nanoelectronics is coming to the forefront. Here, we will discuss the use of energetic Ne ions in engineering graphene devices and explore the mechanical, electromechanical and chemical properties of the ion-milled devices using scanning probe microscopy (SPM). By using SPM-based techniques such as band excitation (BE) force modulation microscopy, Kelvin probe force microscopy (KPFM) and Raman spectroscopy, we demonstrate that the mechanical, electrical and optical properties of the exact same devices can be quantitatively extracted. Additionally, the effect of defects inherent in ion beam direct-write lithography, on the overall performance of the fabricated devices is elucidated.

36 MATERIALS SCIENCE↗

New lines of neon ions in the range 50-200 A.

About 180 new spectral lines of Ne V, Ne VI, Ne VII, and Ne VIII have been measured and identified on spectrograms obtained from a large theta-pinch apparatus. The spectrograms covered the range from 50 to 200 A. The lines were classified by means of isoelectronic extrapolations and interpolations.

Hermansdorfer, H.↗

Study of background processes with the formation of neutrons in nuclear reactions in the energy range of 26–32 kev

The nature of background processes accompanying astrophysical nuclear reactions induced by hydrogen, helium, and neon ions in deuterated targets with small cross sections has been studied in calculations and experiments. The experiments have been performed at a Hall pulsed plasma accelerator in the ion energy range of 26–32 keV. The yield of background neutrons and γ-quanta with energies below 4 MeV in the proton-induced D(p, γ){sup 3}He reaction is primarily due to the presence of a natural impurity of gaseous deuterium in gaseous hydrogen and the chain of D(D, {sup 3}He)n → (n, γ) or (n, n'γ) reactions. A small contribution comes from the chain of D({sup 1}H, {sup 1}H)D → D(D, {sup 3}He)n → (n, γ) or (n, n'γ) reactions. It has been shown that background neutrons and γ-quanta from the D(4He, γ)6Li reaction are entirely due to the chain of D({sup 4}He, {sup 4}He)D → D(D, {sup 3}He)n → (n, γ) or (n, n'γ) reactions. It has been shown that the yield of neutrons and γ-ray photons detected at the interaction of neon ions with deuterated targets is also entirely due to the chain of elastic- scattering reactions of neon ions on deuterons in the target and to subsequent inelastic processes of interaction of deuterons accelerated at elastic scattering with other deuterons of the target. The main contribution to the yields of background neutrons and γ-quanta comes from doubly charged neon ions. The main conclusion is that the explanation of the yield of neutrons and γ-quanta at the interaction of hydrogen, helium, and neon ions with deuterated targets does not require “exotic” theoretical models.

73 NUCLEAR PHYSICS AND RADIATION PHYSICS↗

Expected intensities of solar neon-like ions

A study of the expected intensities of the stronger solar neon-like ion emission lines, some not yet observed, is carried out to compare with the observational situation. The potential usefulness of the 2p5 3s(3P2) - 2p6 forbidden line as a density diagnostic is discussed, and new electric quadrupole lines in the soft X-ray range are noted. 'Observability diagrams' are presented as a convenient overview of the known and unobserved lines. The S VII resonance lines appear to have anomalous intensities.

Bhatia, A. K.↗

Observation of subordinate 2p/5/4d-2p/5/3p transitions in neon-like ions from Ca XI to Ni XIX

Subordinate 2p(5)4d-2p(5)3p transitions in the neon-like ions from Ca XI through Ni XIX are identified. Such transitions between excited levels have not previously been reported for ionization stages higher than Al IV, although the resonance lines are known through Zn XXI in the neon isoelectronic sequence. Measurement of the solar flux in such transitions may aid in establishing the relative importance of the several cascade processes giving rise to the observed Fe XVII resonance lines.

Kastner, S. O.↗

Evaluation of neon focused ion beam milling for TEM sample preparation

Summary Gallium‐based focused ion beams generated from liquid–metal sources are widely used in micromachining and sample preparation for transmission electron microscopy, with well‐known drawbacks such as sample damage and contamination. In this work, an alternative (neon) focused ion beam generated by a gas field‐ionization source is evaluated for the preparation of electron‐transparent specimens. To do so, electron‐transparent sections of Si and an Al alloy are prepared with both Ga and Ne ion beams for direct comparison. Diffraction‐contrast imaging and energy dispersive x‐ray spectroscopy are used to evaluate the relative damage induced by the two beams, and cross‐sections of milled trenches are examined to compare the implantation depth with theoretical predictions from Monte Carlo simulations. Our results show that for the beam voltages and materials systems investigated, Ne ion beam milling does not significantly reduce the focused ion beam induced artefacts. However, the Ne ion beam does enable more precise milling and may be of interest in cases where Ga contamination cannot be tolerated.

PEKIN, T. C.↗

A comparison of He and Ne FIB imaging of cracks in microindented silicon nitride

Highlights: • Silicon nitride was successfully imaged with helium and neon ion microscopy. • Indent-induced cracking was resolved on conductively-coated and uncoated samples. • Cracking was found to be primarily intergranular in nature. • The grain microstructure was most visible on the carbon-coated sample. • For the carbon-coated sample, localized charging was observed along crack pathways. - Abstract: Helium ion microscopy (HIM) offers potential as a high spatial resolution technique for imaging insulating samples that are susceptible to charging artifacts. In this study helium and neon ion microscopy are used to image cracking in microindented samples of the non-conductive ceramic silicon nitride. The crack morphology of radial cracks emanating from the microindentations has been characterized for two different compositions of silicon nitride, with and without conductive coatings. Gold coating enhances crack edge contrast, but masks grain contrast for both He and Ne ion-induced secondary electron (ISE) imaging. Carbon coating enables the crystalline and glassy phases to be distinguished, more clearly with Ne-ISE, and the cracking pathway is found to be primarily intergranular. Zones of <100 nm diameter depleted ion-induced secondary electron emission along the crack paths are identified, consistent with charging ‘hotspots’.

36 MATERIALS SCIENCE↗

Real-time radiative divertor feedback control development for the NSTX-U tokamak using a vacuum ultraviolet spectrometer

A radiative divertor technique is planned for the NSTX-U tokamak to prevent excessive erosion and thermal damage of divertor plasma-facing components in H-mode plasma discharges with auxiliary heating up to 12 MW. In the radiative (partially detached) divertor, extrinsically seeded deuterium or impurity gases are used to increase plasma volumetric power and momentum losses. A real-time feedback control of the gas seeding rate is planned for discharges of up to 5 s duration. The outer divertor leg plasma electron temperature T{sub e} estimated spectroscopically in real time will be used as a control parameter. A vacuum ultraviolet spectrometer McPherson Model 251 with a fast charged-coupled device detector is developed for temperature monitoring between 5 and 30 eV, based on the Δn = 0, 1 line intensity ratios of carbon, nitrogen, or neon ion lines in the spectral range 300–1600 Å. A collisional-radiative model-based line intensity ratio will be used for relative calibration. A real-time T{sub e}-dependent signal within a characteristic divertor detachment equilibration time of ∼10–15 ms is expected.

46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND ↗

The effect of track structure on the induction of chromosomal aberrations in murine cells

PURPOSE: To measure chromosome aberrations in C3H 10T1/2 mouse fibroblasts using FISH painting at the first mitosis following exposure to 30 keV/microm hydrogen or neon ions. MATERIALS AND METHODS: Cells in plateau-phase were irradiated with 0.86 MeV protons at the TTT-3 Tandem accelerator in Naples (Italy), or with 400 MeV/n Ne ions at the HIMAC accelerator in Chiba (Japan). Colcemid-blocked cells were harvested at the first mitosis following exposure, and chromosome spreads were hybridized in situ with a fluorescein-labelled composite mouse DNA probe specific for chromosomes 2 and 8. RESULTS: Protons were more efficient than neon ions at the same LET in the induction of chromosome interchanges and breaks. Yields of complex exchanges were similar for both particles at the same dose, but protons produced mostly insertions, while with Ne exposure non-reciprocal exchanges were the most frequent complex-type exchange. CONCLUSIONS: Charged particles with the same LET produce different yields of chromosome aberrations, and some observed differences can be explained based on the available track-structure models.

NASA Center JSC↗

Diamondlike carbon protective coatings for optical windows

Diamondlike carbon (DLC) films were deposited on infrared transmitting optical windows and were evaluated as protective coatings for these windows exposed to particle and rain erosion. The DLC films were deposited on zinc selenide (ZnSe) and zinc sulfide (ZnS) by three different ion beam methods: (1) sputter deposition from a carbon target using an 8-cm argon ion source; (2) direct deposition by a 30-cm hollow cathode ion source with hydrocarbon gas in argon; and (3) dual beam direct deposition by the 30-cm hollow cathode ion source and an 8-cm argon ion source. In an attempt to improve the adherence of the DLC films on ZnSc and ZnS, ion beam cleaning, ion implantation with helium and neon ions, or sputter deposition of a thin, ion beam intermediate coating was employed prior to deposition of the DLC film. The protection that the DLC films afforded the windows from particle and rain erosion was evaluated, along with the hydrogen content, adherence, intrinsic stress, and infrared transmittance of the films. Because of the elevated stress levels in the ion beam sputtered DLC films and in those ion beam deposited with butane, films thicker than 0.1 micron and with good adherence on ZnS and ZnSe could not be generated. An intermediate coating of germanium successfully allowed the DLC films to remain adherent to the optical windows and caused only negligible reduction in the specular transmittance of the ZnS and ZnSe at 10 microns.

Swec, Diane M.↗