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Electrical characteristics of amorphous molybdenum-nickel contacts to silicon

The electrical characteristics of sputtered, amorphous Mo-Ni contacts have been measured on both p- and n-type Si, as functions of composition (30, 54, and 58 at. percent Mo). The contact resistivity on both p(+) and n(+) Si is in the 0.00000 ohm sq cm range. The barrier height for as-deposited samples varies between phi-bp = 0.47-0.42 V on p-type Si and between phi-bn = 0.63-0.68 V on n-type Si, as the composition of the amorphous layer goes from Ni-rich to Mo-rich. The sum phi-bp + phi-bn always equals 1.12 V, within experimental error. After thermal treatment at 500 C for 1/2 h, the contact resistivity changes by a factor of two or less, while the barrier height changes by at most approximately 0.05 V. In light of these results, the amorphous Mo-Ni film makes good ohmic contacts to silicon.

Kung, K. T.-Y.↗

High-Mass Loading of Flower-like Ni-MoS 2 microspheres Toward Efficient Intercalation pseudocapacitive Electrode

This work reports the exploration of intercalation pseudocapacitance in a thicker electrode of flowerlike Ni-doped MoS 2 microspheres that features a mass loading of ~10 mg/cm 2 without sacrificing the gravimetric capacitance (~425 F/g at 5 mV/s). Integration of Ni atoms into MoS 2 microspheres not only stabilized the structural integrity but also ameliorated the rapid intercalation and deintercalation of electrolyte ions even at a commercial-level mass loading. The energy instability by Ni doping significantly changed the local bonding behavior and the overall electronic structure of MoS 2 , facilitating the breaking of the MoS 2 layer and generation of more active edge sites, which are responsible for faster reaction kinetics. The experiments attribute the overall capacitance enhancement in (Mo-Ni)S 2 to the increased rate of electrolyte ion insertion and extraction, which is confirmed by b-values close to 0.5, at different potentials, indicating that the current response predominantly depends on the diffusive mechanism for both MoS 2 and Ni-MoS 2 thicker electrodes. The symmetric device constructed with Ni-MoS 2 microspheres exhibited a capacitance value of 101 F/g in 1 mV/s, for which the energy density is 9 Wh/kg, as well as attained an outstanding cycling stability of 10000 cycles with 60% retention at 2 A/g. In addition to providing insights into the development of 2D TMDs, this work explores the design of robust and highly efficient intercalation electrode material for electrochemical energy storage devices.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Reaction of amorphous Ni-W and Ni-N-W films with substrate silicon

Wiley et al. (1982) have studied sputtered amorphous films of Nb-Ni, Mo-Ni, Si-W, and Si-Mo. Kung et al. (1984) have found that amorphous Ni-Mo films as diffusion barriers between multilayer metallizations on silicon demonstrate good electrical and thermal stability. In the present investigation, the Ni-W system was selected because it is similar to the Ni-Mo system. However, W has a higher silicide formation temperature than Mo. Attention is given to aspects of sample preparation, sample characterization, the interaction between amorphous Ni-W films and Si, the crystallization of amorphous Ni(36)W(64) films on SiO2, amorphous Ni-N-W films, silicide formation and phase separation, and the crystallization of amorphous Ni(36)W(64) and Ni(30)N(21)W(49) layers.

Zhu, M. F.↗

Materials Data on Ni3Mo by Materials Project

Ni3Mo is beta Cu3Ti structured and crystallizes in the orthorhombic Pmmn space group. The structure is three-dimensional. Mo is bonded to twelve Ni atoms to form MoNi12 cuboctahedra that share corners with two equivalent MoNi12 cuboctahedra, corners with sixteen NiNi8Mo4 cuboctahedra, edges with six equivalent MoNi12 cuboctahedra, edges with twelve equivalent NiNi8Mo4 cuboctahedra, faces with six equivalent MoNi12 cuboctahedra, and faces with fourteen NiNi8Mo4 cuboctahedra. There are a spread of Mo–Ni bond distances ranging from 2.51–2.59 Å. There are two inequivalent Ni sites. In the first Ni site, Ni is bonded to four equivalent Mo and eight Ni atoms to form NiNi8Mo4 cuboctahedra that share corners with four equivalent MoNi12 cuboctahedra, corners with fourteen NiNi8Mo4 cuboctahedra, edges with six equivalent MoNi12 cuboctahedra, edges with twelve NiNi8Mo4 cuboctahedra, faces with four equivalent MoNi12 cuboctahedra, and faces with sixteen NiNi8Mo4 cuboctahedra. There are a spread of Ni–Ni bond distances ranging from 2.50–2.59 Å. In the second Ni site, Ni is bonded to four equivalent Mo and eight equivalent Ni atoms to form distorted NiNi8Mo4 cuboctahedra that share corners with eight equivalent MoNi12 cuboctahedra, corners with ten NiNi8Mo4 cuboctahedra, edges with eighteen NiNi8Mo4 cuboctahedra, faces with six equivalent MoNi12 cuboctahedra, and faces with fourteen NiNi8Mo4 cuboctahedra.

36 MATERIALS SCIENCE↗

Materials Data on Ni4Mo by Materials Project

Ni4Mo crystallizes in the tetragonal I4/m space group. The structure is three-dimensional. Mo is bonded to twelve Ni atoms to form MoNi12 cuboctahedra that share corners with twelve NiNi9Mo3 cuboctahedra, edges with eight equivalent MoNi12 cuboctahedra, edges with sixteen NiNi9Mo3 cuboctahedra, faces with two equivalent MoNi12 cuboctahedra, and faces with sixteen NiNi9Mo3 cuboctahedra. There are eight shorter (2.54 Å) and four longer (2.56 Å) Mo–Ni bond lengths. There are two inequivalent Ni sites. In the first Ni site, Ni is bonded to three equivalent Mo and nine Ni atoms to form NiNi9Mo3 cuboctahedra that share corners with three equivalent MoNi12 cuboctahedra, corners with nine NiNi9Mo3 cuboctahedra, edges with four equivalent MoNi12 cuboctahedra, edges with twenty NiNi9Mo3 cuboctahedra, faces with four equivalent MoNi12 cuboctahedra, and faces with fourteen NiNi9Mo3 cuboctahedra. There are a spread of Ni–Ni bond distances ranging from 2.53–2.57 Å. In the second Ni site, Ni is bonded to three equivalent Mo and nine Ni atoms to form NiNi9Mo3 cuboctahedra that share corners with three equivalent MoNi12 cuboctahedra, corners with nine NiNi9Mo3 cuboctahedra, edges with four equivalent MoNi12 cuboctahedra, edges with twenty NiNi9Mo3 cuboctahedra, faces with four equivalent MoNi12 cuboctahedra, and faces with fourteen NiNi9Mo3 cuboctahedra. The Ni–Ni bond length is 2.54 Å.

36 MATERIALS SCIENCE↗

Materials Data on Ni2Mo by Materials Project

Ni2Mo crystallizes in the orthorhombic Immm space group. The structure is three-dimensional. Mo is bonded to two equivalent Mo and ten equivalent Ni atoms to form distorted MoNi10Mo2 cuboctahedra that share corners with two equivalent MoNi10Mo2 cuboctahedra, corners with ten equivalent NiNi7Mo5 cuboctahedra, edges with twelve equivalent MoNi10Mo2 cuboctahedra, edges with twelve equivalent NiNi7Mo5 cuboctahedra, faces with four equivalent MoNi10Mo2 cuboctahedra, and faces with fourteen equivalent NiNi7Mo5 cuboctahedra. Both Mo–Mo bond lengths are 2.65 Å. There are two shorter (2.56 Å) and eight longer (2.61 Å) Mo–Ni bond lengths. Ni is bonded to five equivalent Mo and seven equivalent Ni atoms to form distorted NiNi7Mo5 cuboctahedra that share corners with five equivalent MoNi10Mo2 cuboctahedra, corners with seven equivalent NiNi7Mo5 cuboctahedra, edges with six equivalent MoNi10Mo2 cuboctahedra, edges with eighteen equivalent NiNi7Mo5 cuboctahedra, faces with seven equivalent MoNi10Mo2 cuboctahedra, and faces with eleven equivalent NiNi7Mo5 cuboctahedra. There are a spread of Ni–Ni bond distances ranging from 2.58–2.65 Å.

36 MATERIALS SCIENCE↗