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Measurements are reported of the attenuation of an ion beam in a multidipole double-plasma (DP) device. In addition to charge-exchange collisions of the beam ions with the gas atoms, ion scattering by the three-dimensional turbulence produced by the beam itself is found to contribute significantly to the beam attenuation.
Ion thruster engines for spacecraft propulsion can serve as ion beam sources for potential space processing applications. The advantages of space vacuum environments and the possible gravity effects on thruster ion beam materials operations such as thin film growth, ion milling, and surface texturing were investigated. The direct gravity effect on sputter deposition and vapor deposition processes are discussed as well as techniques for cold and warm welding.
Focused Ion Beam (FIB) systems are increasingly utilized in nanotechnology for nanostructuring, surface modification, doping, and rapid prototyping. Recently, their potential for quantum applications has been explored, leveraging FIB’s direct-write capabilities for in situ single ion implantation, which is crucial for fabricating single photon emitters. Color centers in diamond can function as qubits and are of particular interest due to their capacity to store and transmit quantum information. While Group-IV color centers exhibit high brightness, they require low temperatures to retain coherence. However, lead-vacancy in diamond (PbV) operates at the higher end (4 K) of this temperature spectrum due to larger ground-state splitting, making them particularly interesting. In this context, our study presents results for lead (Pb)-containing alloys with eutectic points below 600 °C and results on using tantalum (Ta) and titanium (Ti) as emitter materials for a Pb liquid metal alloy ion source. We show that a standard FIB system is able to resolve the different Pb isotopes and achieve nanoscale spot sizes, as required for quantum information science applications.
Eight centimeter ion beam sources utilizing xenon and argon have been developed that operate over a wide range of beam energies and currents. Three types of processes have been studied: sputter deposition, ion beam machining, and ion beam surface texturing. The broad range of source operating conditions allows optimum sputter deposition of various materials. An ion beam source was used to ion mill laser reflection holograms using photoresist patterns on silicon. Ion beam texturing was tried with many materials and has a multitude of potential applications.
The technology of broad-beam ion sources is reviewed from the viewpoint of the sputtering-deposition user. This review includes a short description of the development of discharge chambers, accelerator systems, and cathodes; the present alternatives for these components and the expected future improvements.
An electron beam ion source serves as a charge breeder for the Californium Rare Isotope Breeder Upgrade (CARIBU) at the Argonne Tandem Linac Accelerator System (ATLAS). The source accepts radioactive beams of 1+ or 2+ ions and raises their charge state for post-acceleration by ATLAS. The efficiency of this process impacts the length of each experiment and, hence, the type and number of experiments that can be run in each program cycle. Recent efforts to improve the charge breeding efficiency for the 80 < A < 160 species typical of CARIBU have focused on utilizing the closed shell breeding technique. Here, with this technique, the electron beam energy is manipulated to take advantage of the large gap in ionization energies at shell closures and selectively populate a single charge state. Charge breeding studies with stable cesium ions have demonstrated an absolute efficiency of 72% for Cs 27+ and a total efficiency of 93%. The Cs 27+ efficiency result represents a factor of 3 improvement over the previous best charge breeding result of 23% for Cs 27+ .
Polarized ion beams at the Electron Ion Collider (EIC) are essential to address some of the most important open questions at the twenty-first century frontiers of understanding of the fundamental structure of matter. Here, in this work, we summarize the science case and identify polarized 2 H, 3 He, 6 Li, and 7 Li ion beams as critical technology that will enable experiments which address the most important science. Furthermore, we discuss the required ion polarimetry and spin manipulation at the EIC. The current EIC accelerator design is presented. We identify a significant research and development effort across national and international laboratories and universities that is required over about a decade to realize the polarized ion beams and estimate (based on previous experience) that it will require about 20 full-time equivalent (FTE) over 10 years (or a total of about 200 FTE-years) of personnel, including graduate students, postdoctoral researchers, technicians, and engineers. Attracting, educating, and training a new generation of physicists in experimental spin techniques will be essential for the successful realization. Artificial intelligence and machine learning are seen as having significant potential for both acceleration of research and development and amplification of discovery in the optimal realization of this unique quantum technology on a cutting-edge collider. The research and development effort is synergistic with research in atomic physics and fusion energy science.
Focused ion beam (FIB) milling is a commonly used tool for nanoscale material processing, such as for transmission electron microscopy (TEM) sample preparation, or the creation of fiducial markers prior to other processes and measurements. During milling, a high energy ion beam is used to remove material via sputtering. The expelled target material may return to the sample surface however, affecting subsequent measurements. Beam spreading or irradiation due to neutral gallium may also irradiate a larger area than intended. Extensive research has explored the effects of FIB milling on the prepared TEM sample, but few have looked at the effects of milling on the properties of the sample surrounding the milled region. We use multiple pump-probe laser-based techniques (time domain thermoreflectance and steady-state thermoreflectance) to measure the spatial extent of FIB-induced surface/subsurface changes on a series of silicon wafers milled at multiple currents and doses. We supplement these measurements with high-resolution scanning transmission electron microscopy, energy dispersive X-ray spectroscopy, stylus profilometry, and time-of-flight secondary ion mass spectroscopy. We find a sample surface affected by the FIB up to 1 mm from where milling occurred, with a notable dependence on the ion beam current. We also note remarkably high sensitivity to surface defects using the thermoreflectance metrologies, including detection where other measurements failed.
Ion beam sputter processing rates as well as pertinent characteristics of etched targets and films are described. An argon ion beam source was used to sputter etch and deposit the fluoropolymers PTFE, FEP, and CTFE. Ion beam energy, current density, and target temperature were varied to examine effects on etch and deposition rates. The ion etched fluoropolymers yield cone or spire-like surface structures which vary depending upon the type of polymer, ion beam power density, etch time, and target temperature. Sputter target and film characteristics documented by spectral transmittance measurements, X-ray diffraction, ESCA, and SEM photomicrographs are included.
The reported measurements were conducted with the primary beam of an ion beam probe in a plasma discharge in which the space potential represents a large fraction of the primary beam energy. A Lewis ion beam probe similar to the device employed by Jobes et al. (1969) was used in the investigation. The apparatus used in the experiments is discussed along with the experimental procedure. The approximate radial potential profile was obtained by observing the effect of the plasma on the trajectory of the primary beam.
Measurements of the ion beam plume and efflux constituents of an 8-cm mercury ion thruster have been carried out in the TRW 5 x 10 foot testing chamber. Charged components (ion beam plume) were measured with an array of movable position Faraday cups and retarding potential analyzers yielding both current density and particle energy determinations. Neutral components (ion beam efflux) were determined with a movable position ionization gauge. Measurements of the ion beam plume were performed for a thruster both with and without a sputter shield. Analysis of data in terms of normalized effluxes has been carried out and has been applied to an example calculation of efflux compatibility with a communications spacecraft.
Here, the Extended Electron Beam Ion Source (EEBIS) has been installed and commissioned at Brookhaven National Laboratory (BNL) hadron accelerator complex in the spring of 2023. EEBIS has replaced its predecessor, RhicEBIS, which provided ions for BNL hadron facilities for over a decade since 2009. The motivations for the source upgrade are to provide higher intensities of the Au 32+ ion beam for the Relativistic Heavy Ion Collider (RHIC) and to provide of an intense source of polarized 3 He 2+ ions for the future Electron Ion Collider (EIC) at BNL. EEBIS is and will continue to be the primary source for a variety of different ion species for the NASA Space Radiation Laboratory (NSRL) at BNL. EEBIS utilizes two identical, two-meter-long unshielded 5T warm bore superconducting solenoids, and it is operated with electron beam current up to 10 A, providing a high-capacity ion traps to fulfill the requirement for high intensity ion beams. The upstream solenoid contains a “short ion trap” with a length of 95 cm, while the “long ion trap” with a length of 178 cm is located inside the downstream solenoid bore. The main features of EEBIS are: * A Gas injection and ionization cell equipped with a Lorenz pulse valve * High-capacity ZAO non-evaporable getter (NEG) custom linear pumping units * In situ apparatus for pumping speed measurements to monitor NEG activation and saturation * “External drift tube” construction with differential pumping stages to provide space for Lorentz pulse valve and 3 He high-field polarization cell * A Ba oxide electron gun cathode. The design of EEBIS as well as the results of its commissioning and first-year operation are presented and discussed.
Radiation transport of heavy ions in matter is of interest to radiological protection in space and high-altitude aircraft. In addition, heavy ion beams are expected to be of advantage in radiotherapy since their characteristic Bragg curve allows a relative reduction of the dose in reaching a tumor site and the near elimination of exposure beyond the tumor region as the beam exits the body. Furthermore, the radioresistance of tumorous cells due to their hypoxic state may be reduced or eliminated by the high specific ionization of heavy ion beams. The depth-dose distribution of heavy ion beams consists of energy deposited by the attenuated primary beam with its characteristic Bragg curve and a relatively unstructured background due to secondary radiations produced in nuclear reactions. As the ion mass increases, the secondary contribution becomes more structured and may add significantly to the Bragg peak of the primary ions. The result for heavy ions (z greater than 20) is a greatly broadened Bragg peak region, especially in comparison to straggling effects, which may prove to be of importance in radiotherapy and biomedical research.
Electron bombardment ion thrusters used as ion sources have demonstrated a unique capability to vary the surface morphology of surgical implant materials. The microscopically rough surface texture produced by ion beam sputtering of these materials may result in improvements in the biological response and/or performance of implanted devices. Control of surface roughness may result in improved attachment of the implant to soft tissue, hard tissue, bone cement, or components deposited from blood. Potential biomedical applications of ion beam texturing discussed include: vascular prostheses, artificial heart pump diaphragms, pacemaker fixation, percutaneous connectors, orthopedic pros-thesis fixtion, and dental implants.
Electron bombardment ion thrusters used as ion sources have demonstrated a unique capability to vary the surface morphology of surgical implant materials. The microscopically rough surface texture produced by ion beam sputtering of these materials may result in improvements in the biological response and/or performance of implanted devices. Control of surface roughness may result in improved attachment of the implant to soft tissue, hard tissue, bone cement, or components deposited from blood. Potential biomedical applications of ion beam texturing discussed include: vascular prostheses, artificial heart pump diaphragms, pacemaker fixation, percutaneous connectors, orthopedic prosthesis fixation, and dental implants.
Ion propulsion research and development yields a mature technology that is transferable to a wide range of nonpropulsive applications, including terrestrial and space manufacturing. A xenon ion source was used for an investigation into potential ion-beam applications. The results of cathode tests and discharge-chamber experiments are presented. A series of experiments encompassing a wide range of potential applications is discussed. Two types of processes, sputter deposition, and erosion were studied. Some of the potential applications are thin-film Teflon capacitor fabrication, lubrication applications, ion-beam cleaning and polishing, and surface texturing.
The Electron-Ion Collider (EIC), to be constructed at Brookhaven National Laboratory, will collide polarized, high-energy electron beams with hadron beams, achieving peak luminosities of up to 1.0 x 10 34 cm -2 s -1 . To reach such high luminosity, the EIC will employ flat-beam collisions at the interaction point. The design transverse emittance ratio will be about 10:1 in the Hadron Storage Ring (HSR). Thanks to stochastic cooling and precise decoupling, we successfully generated and accelerated gold ion beams with a large emittance ratio of 11:1 in the Relativistic Heavy Ion Collider (RHIC). In this article, we present results of intrabeam scattering (IBS) measurements and modeling for large-emittance gold ion beams, both without and with controlled betatron coupling. To model the IBS growth, we use the formulas developed by Lebedev and Nagaitsev.
Specific perceptions and possible ion beam technology applications were obtained as a result of a literature search and contact interviews with various institutions and individuals which took place over a 5-month period. The use of broad beam electron bombardment ion sources is assessed for materials deposition, removal, and alteration. Special techniques examined include: (1) cleaning, cutting, and texturing for surface treatment; (2) crosslinking of polymers, stress relief in deposited layers, and the creation of defect states in crystalline material by ion impact; and (3) ion implantation during epitaxial growth and the deposition of neutral materials sputtered by the ion beam. The aspects, advantages, and disadvantages of ion beam technology and the competitive role of alternative technologies are discussed.