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Oxide-Free Three-Dimensional Germanium/Silicon Core–Shell Metalattice Made by High-Pressure Confined Chemical Vapor Deposition

Metalattices are crystalline arrays of uniform particles in which the period of the crystal is close to some characteristic physical length scale of the material. In this work, we explore the synthesis and properties of a germanium metalattice in which the similar to 70 nm periodicity of a silica colloidal crystal template is close to the similar to 24 nm Bohr exciton radius of the nanocrystalline Ge replica. The problem of Ge surface oxidation can be significant when exploring quantum confinement effects or designing electronically coupled nanostructures because of the high surface area to volume ratio at the nanoscale. To eliminate surface oxidation, we developed a coreshell synthesis in which the Ge metalattice is protected by an oxide-free Si interfacial layer, and we explore its properties by transmission electron microscopy (TEM), Raman spectroscopy, and electron energy loss spectroscopy (EELS). The interstices of a colloidal crystal film grown from 69 nm diameter spherical silica particles were filled with polycrystalline Ge by high-pressure confined chemical vapor deposition (HPcCVD) from GeH4. After the SiO2 template was etched away with aqueous HF, the Ge replica was uniformly coated with an amorphous Si shell by HPcCVD as confirmed by TEM-EDS (energy-dispersive X-ray spectroscopy) and Raman spectroscopy. Formation of the shell prevents oxidation of the Ge core within the detection limit of XPS. The electronic properties of the core-shell structure were studied by accessing the Ge 3d edge onset using STEM-EELS. A blue shift in the edge onset with decreasing size of Ge sites in the metalattices suggests quantum confinement of the Ge core. The degree of quantum confinement of the Ge core depends on the void sizes in the template, which is tunable by using silica particles of varying size. The edge onset also shows a shift to higher energy near the shell in comparison with the Ge core. This shift along with the observation of Ge-Si vibrational modes in the Raman spectrum indicate interdiffusion of Ge and Si. Both the size of the voids in the template and core-shell interdiffusion of Si and Ge can in principle be tuned to modify the electronic properties of the Ge metalattice.

37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CH↗

Materials Data on Si3Ge by Materials Project

GeSi3 is alpha bismuth trifluoride structured and crystallizes in the cubic Fm-3m space group. The structure is three-dimensional. Ge4+ is bonded in a body-centered cubic geometry to eight equivalent Si+1.33- atoms. All Ge–Si bond lengths are 2.74 Å. There are two inequivalent Si+1.33- sites. In the first Si+1.33- site, Si+1.33- is bonded in a body-centered cubic geometry to four equivalent Ge4+ and four equivalent Si+1.33- atoms. All Si–Si bond lengths are 2.74 Å. In the second Si+1.33- site, Si+1.33- is bonded in a body-centered cubic geometry to eight equivalent Si+1.33- atoms.

36 MATERIALS SCIENCE↗

Materials Data on SiGe3 by Materials Project

Ge3Si crystallizes in the tetragonal I4/mmm space group. The structure is three-dimensional. there are two inequivalent Ge sites. In the first Ge site, Ge is bonded to eight Ge and four equivalent Si atoms to form a mixture of distorted corner, edge, and face-sharing GeSi4Ge8 cuboctahedra. There are four shorter (2.81 Å) and four longer (3.08 Å) Ge–Ge bond lengths. All Ge–Si bond lengths are 3.08 Å. In the second Ge site, Ge is bonded in a square co-planar geometry to eight equivalent Ge and four equivalent Si atoms. All Ge–Si bond lengths are 2.81 Å. Si is bonded in a square co-planar geometry to twelve Ge atoms.

36 MATERIALS SCIENCE↗

Materials Data on Si7Ge by Materials Project

GeSi7 is Moissanite 9R-like structured and crystallizes in the cubic P-43m space group. The structure is three-dimensional. Ge4+ is bonded to four equivalent Si+0.57- atoms to form GeSi4 tetrahedra that share corners with twelve equivalent SiSi4 tetrahedra. All Ge–Si bond lengths are 2.41 Å. There are two inequivalent Si+0.57- sites. In the first Si+0.57- site, Si+0.57- is bonded to one Ge4+ and three equivalent Si+0.57- atoms to form corner-sharing SiSi3Ge tetrahedra. All Si–Si bond lengths are 2.37 Å. In the second Si+0.57- site, Si+0.57- is bonded to four equivalent Si+0.57- atoms to form SiSi4 tetrahedra that share corners with four equivalent GeSi4 tetrahedra and corners with eight equivalent SiSi4 tetrahedra.

36 MATERIALS SCIENCE↗

Materials Data on SiGe by Materials Project

SiGe is Zincblende, Sphalerite structured and crystallizes in the cubic F-43m space group. The structure is three-dimensional. Ge4+ is bonded to four equivalent Si4- atoms to form corner-sharing GeSi4 tetrahedra. All Ge–Si bond lengths are 2.42 Å. Si4- is bonded to four equivalent Ge4+ atoms to form corner-sharing SiGe4 tetrahedra.

36 MATERIALS SCIENCE↗