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All sourcesNASA NTRSDOE OSTI
NASA NTRS2003

Discharge Characterization of 40 cm-Microwave ECR Ion Source and Neutralizer

Discharge characteristics of a 40 cm, 2.45 GHz Electron Cyclotron Resonance (ECR) ion thruster discharge chamber and neutralizer were acquired. Thruster bulk discharge plasma characteristics were assessed using a single Langmuir probe. Total extractable ion current was measured as a function of input microwave power and flow rate. Additionally, radial ion current density profiles at the thruster.s exit plane were characterized using five equally spaced Faraday probes. Distinct low and high density operating modes were observed as discharge input power was varied from 0 to 200 W. In the high mode, extractable ion currents as high as 0.82 A were measured. Neutralizer emission current was characterized as a function of flow rate and microwave power. Neutralizer extraction currents as high as 0.6 A were measured.

Foster, John E.↗
NASA NTRS2009

Very Large Area/Volume Microwave ECR Plasma and Ion Source

The present invention is an apparatus and method for producing very large area and large volume plasmas. The invention utilizes electron cyclotron resonances in conjunction with permanent magnets to produce dense, uniform plasmas for long life ion thruster applications or for plasma processing applications such as etching, deposition, ion milling and ion implantation. The large area source is at least five times larger than the 12-inch wafers being processed to date. Its rectangular shape makes it easier to accommodate to materials processing than sources that are circular in shape. The source itself represents the largest ECR ion source built to date. It is electrodeless and does not utilize electromagnets to generate the ECR magnetic circuit, nor does it make use of windows.

Foster, John E.↗
NASA NTRS2003

Laboratory Studies in UV and EUV Solar Physics

The Ion Beam Experiment at the Center for Astrophysics is dedicated to the study of ion-electron collision processes of importance in solar physics. A paper describing our most recent measurement 'Absolute cross section for Si(2+)(3s3p(sup 3)Rho (sup 0) yields 3s3p(sup 1)Rho(sup 0)) electron-impact excitation' was published during the past year. Dr. Paul Janzen received his PhD. from the Harvard Physics Department on the basis of this and other work, such as the new electron cyclotron resonance (ECR) ion source. The ion source is producing stable beams with large currents for our present work on C(2+), and it also produces stable beams with large currents of more highly charged systems, for future work on systems such as O(4+). The past year has been focussed on our current program to measure absolute cross sections for Electron Impact Excitation (EIE) in C(2+), one of the primary ions used for probing the solar transition region. C(2+) beams produced by the ion source have been transported to the interaction region of the experiment, where the collisions are studied, and Visiting Scientist Dr. Adrian Daw is currently collecting data to measure the C(2+)(2s2p(sup 3)Rho(sup 0) yields 2p(sup 2)(sup 3)Rho) EIE cross section as a function of collision energy, under the guidance of Drs. John Kohl, Larry Gardner and Bill Parkinson. Also this year, modifications were made to the ECR ion source in order to produce greater currents of highly charged ions. Testing of the ion source was completed. Modifications were designed to extend the photon detection capabilities of the apparatus to shorter UV wavelengths, or EUV. Following the work on C(2+)(2s2p(sup 3)Pho(sup 0) yields 2p(sup 2)(sup 3)Rho), the extended UV detection capabilities will be used to measure the C(2+)(2s(sup 2)(sup 1)S yields 2s2p(sup 1)Rho(sup 0)) EIE cross section. The EUV modifications complement those of the new ion source, by enabling detection of EUV light generated by high charge state ions and putting us in a position to measure the excitation cross sections for more highly charged ions as well.

Parkinson, William↗
NASA NTRS2005

Laboratory Studies in UV and EUV Solar Physics

A new 5 GHZ Electron Cyclotron Resonance (ECR) ion source for SAO's Ion Beam Experiment was designed, built and tested. Absolute cross sections were measured for electron impact excitation (EIE) in C(2+) (2s2p (3)P(sup o) - 2p(sup 2) (3)P), and empirical EIE rate coefficients were derived. The absolute cross section for EIE in Si(2+) (3s3p (3)P(sup o) - 3s3p (1)P(sup o)) was measured, and our experimental values for absolute cross sections for EIE in C(3+) (2s (2)S - 2p (2)P(sup o)) were reanalyzed and compared to values obtained by other experimental methods and by theory. In addition, a paper was published. The development and testing of the new ion source, the Si(2+) EIE measurements, and the reevaluation of the cross sections for C(3+) resulted from the Ph.D. research of Paul H. Janzen who completed the degree requirements for the Harvard University Department of Physics in 2002. John Kohl served as the Ph.D.Thesis Advisor. Because of delays in bringing the new ion source on line, the measurements of EIE in C(2+) (2s2p (3)P(sup o) - (2)p(sup 2) (3)P) were not completed until 2004. Preparations for measurements of EIE in C(2+) (1s(sup 2) (1)S - 2s2p (1)P(sup o)) are currently underway.

Wagner, William J.↗
NASA NTRS1994

Optical Scattering and Microstructure of Ion Beam Deposited Metal Coatings

Thin films of gold and platinum have been deposited onto super-polished fused silica substrates using thermal evaporation, ion assisted deposition (IAD), sputtering and ion assisted sputtering. The influence of ion beam flux, coating material and deposition rate on the films microroughness have been investigated. Coatings of gold and platinum have been bombarded with low energy (10-20 eV) Ar ions from an electron cyclotron resonance (ECR) ion source during deposition. Short range surface microroughness of coated surfaces has been examined using scanning tunneling microscopy (STM) and atomic force microscopy (AFM), while long range surface microroughness has been characterized using an angle resolved optical scatterometer. Results indicate that bombardment with low energy ions causes significant reduction in microroughness of metal coatings.

metal↗
NASA NTRS1996

Status of the Multiply-Charged Ion Research Facility at JPL

In order to provide a better understanding of the energy balance and ion composition in solar, stellar, and planetary atmospheres, and in the interstellar medium, a new research facility for the study of interactions of multiply-charged ions has been developed at the Jet Propulsion Laboratory (JPL).

charged↗
NASA NTRS2006

High Power ECR Ion Thruster Discharge Characterization

Electron cyclotron resonance (ECR) based ion thrusters with carbon based ion optics can potentially satisfy lifetime requirements for long duration missions (approximately 10 years) because grid erosion and cathode insert depletion issues are virtually eliminated. Though the ECR plasma discharge has been found to typically operate at slightly higher discharge losses than conventional DC ion thrusters (for high total thruster power applications), the discharge power fraction is small (less than 1 percent at 25 kW). In this regard, the benefits of increased life, low discharge plasma potentials, and reduced complexity are welcome tradeoffs for the associated discharge efficiency decrease. Presented here are results from discharge characterization of a large area ECR plasma source for gridded ion thruster applications. These measurements included load matching efficacy, bulk plasma properties via Langmuir probe, and plasma uniformity as measured using current probes distributed at the exit plane. A high degree of plasma uniformity was observed (flatness greater than 0.9). Additionally, charge state composition was qualitatively evaluated using emission spectroscopy. Plasma induced emission was dominated by xenon ion lines. No doubly charged xenon ions were detected.

Foster, John E.↗
NASA NTRS1989

Use of a krypton isotope for rapid ion changeover at the Lawrence Berkeley Laboratory 88-inch cyclotron

An isotope of krypton, Kr86, has been combined with a mix of Ar, Ne, and N ions at the electron cyclotron resonance (ECR) source, at the Lawrence Berkeley Laboratory cyclotron, to provide rapid ion changeover in Single Event Phenomena (SEP) testing. The new technique has been proved out successfully by a recent Jet Propulsion Laboratory (JPL) test in which it was found that there was no measurable contamination from other isotopes.

Soli, George A.↗
NASA NTRS2007

Large-Area Permanent-Magnet ECR Plasma Source

A 40-cm-diameter plasma device has been developed as a source of ions for material-processing and ion-thruster applications. Like the device described in the immediately preceding article, this device utilizes electron cyclotron resonance (ECR) excited by microwave power in a magnetic field to generate a plasma in an electrodeless (noncontact) manner and without need for an electrically insulating, microwave-transmissive window at the source. Hence, this device offers the same advantages of electrodeless, windowless design - low contamination and long operational life. The device generates a uniform, high-density plasma capable of sustaining uniform ion-current densities at its exit plane while operating at low pressure [<10(exp -4) torr (less than about 1.3 10(exp -2) Pa)] and input power <200 W at a frequency of 2.45 GHz. Though the prototype model operates at 2.45 GHz, operation at higher frequencies can be achieved by straightforward modification to the input microwave waveguide. Higher frequency operation may be desirable in those applications that require even higher background plasma densities. In the design of this ECR plasma source, there are no cumbersome, power-hungry electromagnets. The magnetic field in this device is generated by a permanent-magnet circuit that is optimized to generate resonance surfaces. The microwave power is injected on the centerline of the device. The resulting discharge plasma jumps into a "high mode" when the input power rises above 150 W. This mode is associated with elevated plasma density and high uniformity. The large area and uniformity of the plasma and the low operating pressure are well suited for such material-processing applications as etching and deposition on large silicon wafers. The high exit-plane ion-current density makes it possible to attain a high rate of etching or deposition. The plasma potential is <3 V low enough that there is little likelihood of sputtering, which, in plasma processing, is undesired because it is associated with erosion and contamination. The electron temperature is low and does not vary appreciably with power.

Foster, John E.↗
NASA NTRS2002

Measurement of Metastable Lifetimes of Highly-Charged Ions

The present work is part of a series of measurements of metastable lifetimes of highly-charged ions (HCIs) which contribute to optical absorption, emission and energy balance in the Interstellar Medium (ISM), stellar atmospheres, etc. Measurements were carried out using the 14-GHz electron cyclotron resonance ion source (ECRIS) at the JPL HCI facility. The ECR provides useful currents of charge states such as C(sup(1-6)+), Mg(sup(1-6)+) and Fe(sup(1-17)+). In this work the HCI beam is focused into a Kingdon electrostatic ion trap for measuring lifetimes via optical decays.

Smith, Steven J.↗
NASA NTRS2007

Slot-Antenna/Permanent-Magnet Device for Generating Plasma

A device that includes a rectangular-waveguide/slot-antenna structure and permanent magnets has been devised as a means of generating a substantially uniform plasma over a relatively large area, using relatively low input power and a low gas flow rate. The device utilizes electron cyclotron resonance (ECR) excited by microwave power to efficiently generate plasma in a manner that is completely electrodeless in the sense that, in principle, there is no electrical contact between the plasma and the antenna. Plasmas generated by devices like this one are suitable for use as sources of ions and/or electrons for diverse material-processing applications (e.g., etching or deposition) and for ion thrusters. The absence of plasma/electrode contact essentially prevents plasma-induced erosion of the antenna, thereby also helping to minimize contamination of the plasma and of objects exposed to the plasma. Consequently, the operational lifetime of the rectangular-waveguide/ slot-antenna structure is long and the lifetime of the plasma source is limited by the lifetime of the associated charged-particle-extraction grid (if used) or the lifetime of the microwave power source. The device includes a series of matched radiating slot pairs that are distributed along the length of a plasma-source discharge chamber (see figure). This arrangement enables the production of plasma in a distributed fashion, thereby giving rise to a uniform plasma profile. A uniform plasma profile is necessary for uniformity in any electron- or ion-extraction electrostatic optics. The slotted configuration of the waveguide/ antenna structure makes the device scalable to larger areas and higher powers. All that is needed for scaling up is the attachment of additional matched radiating slots along the length of the discharge chamber. If it is desired to make the power per slot remain constant in scaling up, then the input microwave power must be increased accordingly. Unlike in prior ECR microwave plasma-generating devices, there is no need for an insulating window on the antenna. Such windows are sources of contamination and gradually become ineffective as they become coated with erosion products over time. These characteristics relegate prior ECR microwave plasma-generating devices to non-ion beam, non-deposition plasma applications. In contrast, the lack of need for an insulating window in the present device makes it possible to use the device in both ion-beam (including deposition) and electron-beam applications. The device is designed so that ECR takes place above each slot and the gradient of the magnetic field at each slot is enough to prevent backflow of plasma.

Foster, John E.↗
NASA NTRS2007

Slotted antenna waveguide plasma source

A high density plasma generated by microwave injection using a windowless electrodeless rectangular slotted antenna waveguide plasma source has been demonstrated. Plasma probe measurements indicate that the source could be applicable for low power ion thruster applications, ion implantation, and related applications. This slotted antenna plasma source invention operates on the principle of electron cyclotron resonance (ECR). It employs no window and it is completely electrodeless and therefore its operation lifetime is long, being limited only by either the microwave generator itself or charged particle extraction grids if used. The high density plasma source can also be used to extract an electron beam that can be used as a plasma cathode neutralizer for ion source beam neutralization applications.

Foster, John↗
NASA NTRS1997

Characteristics of an Electron Cyclotron Resonance Plasma Source for the Production of Active Nitrogen Species in III-V Nitride Epitaxy

A simple analysis is provided to determine the characteristics of an electron cyclotron resonance (ECR) plasma source for the generation of active nitrogen species in the molecular beam epitaxy of III-V nitrides. The effects of reactor geometry, pressure, power, and flow rate on the dissociation efficiency and ion flux are presented. Pulsing the input power is proposed to reduce the ion flux.

Meyyappan, Meyya↗
NASA NTRS1993

Low Earth orbital atomic oxygen environmental simulation facility for space materials evaluation

Simulation of low Earth orbit atomic oxygen for accelerated exposure in ground-based facilities is necessary for the durability evaluation of space power system component materials for Space Station Freedom (SSF) and future missions. A facility developed at the National Aeronautics and Space Administrations's (NASA) Lewis Research Center provides accelerated rates of exposure to a directed or scattered oxygen beam, vacuum ultraviolet (VUV) radiation, and offers in-situ optical characterization. The facility utilizes an electron-cyclotron resonance (ECR) plasma source to generate a low energy oxygen beam. Total hemispherical spectral reflectance of samples can be measured in situ over the wavelength range of 250 to 2500 nm. Deuterium lamps provide VUV radiation intensity levels in the 115 to 200 nm range of three to five equivalent suns. Retarding potential analyses show distributed ion energies below 30 electron volts (eV) for the operating conditions most suited for high flux, low energy testing. Peak ion energies are below the sputter threshold energy (approximately 30 eV) of the protective coatings on polymers that are evaluated in the facility, thus allowing long duration exposure without sputter erosion. Neutral species are expected to be at thermal energies of approximately .04 eV to .1 eV. The maximum effective flux level based on polyimide Kapton mass loss is 4.4 x 10 exp 6 atoms/((sq. cm)*s), thus providing a highly accelerated testing capability.

Stidham, Curtis R.↗