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Environmental and Polarization Characterizations of E-Beam Plasma-Based AlF 3 -Passivated Aluminum Mirrors for Astronomical Telescopes

Astronomical space telescopes to study astrophysical phenomena from the far ultraviolet (FUV) to the near infrared (NIR) will require mirror coatings with high reflectance over this entire spectral region. While coatings for the optical and NIR part of the spectrum are fairly well developed with proven performance, the FUV range has presented significant challenges, particularly below 120nm. Recent developments in electron-beam (e-Beam) generated plasma treatment in a SF 6 environments has enabled the effective passivation of aluminum (Al) coatings for applications in the FUV, by native oxide removal and the formation of a AlF 3 passivation layer which could be tuned to any desired AlF 3 thickness. These results have been produced through a collaboration between the Goddard Space Flight Center (GSFC) and the Naval Research Laboratory (NRL). The passivation experiments have been carried out using the Large Area Plasma Processing System (LAPPS) at NRL using bare aluminum samples and provided by the coating group at GSFC. This novel procedure has demonstrated improved Al mirrors with state-of-the-art FUV reflectivity (e.g. R=91% at 121.6nm). In this paper, we will be reporting on environmental testing, micro-roughness, as well as polarization studies of these E-beam treated samples. These characterizations are being done in order to advance the Technology Readiness Level (TRL) for these Al+AlF 3 mirror coatings produced at LAPPS. The ultimate goal is to demonstrate the promise of using this coating technology to deliver reflectance performance plus stability and uniformity over a large area for a future IR/O/UV space telescope observatory.

FUV reflectance↗

E-Beam Generated Plasma Etching for Developing High-Reflectance Mirrors for Far-Ultraviolet Astronomical Instrument Applications

Astronomical space telescopes to study astrophysical phenomena from the far-ultraviolet (FUV) to the near infrared (NIR) will require mirror coatings with high reflectance over this entire spectral region. While coatings for the optical and NIR part of the spectrum are fairly well developed with proven performance, the FUV presents significant challenges. The U.S. Naval Research Laboratory (NRL) has developed a processing system based on an electron beam-generated plasma that provides for controlled fluorination and/or etching of surfaces with near monolayer precision and minimal changes to surface morphology. In this paper, we report recent results of samples treated in the NRL Large Area Plasma Processing System (LAPPS) where restoration of the high intrinsic reflectance in the FUV spectral range have been observed of aluminum (Al) mirrors protected with a magnesium di-fluoride (MgF2) overcoat. This paper will also extend these studies to other Al mirrors protected with aluminum tri-fluoride (AlF3) in order to realize the high intrinsic reflectance Al down to FUV wavelengths (100−200 nm), while still maintaining the high reflectance in the optical and NIR spectral regions. Laboratory test data and optical diagnostic techniques used to verify surface scattering and durability of selected coatings will be presented. Finally, we will discuss the scalability of the LAPPS etching process in order to realize these high-reflectivity coatings on mirror segments as large as those proposed for the Large Ultraviolet, Optical, and Infrared (LUVOIR) astronomical telescope system (1+meter class).

LUVOIR↗

Dissociation phenomena in electron-beam sustained carbon dioxide lasers

A number of applications are emerging requiring efficient, long pulse, long-life sealed CO2 lasers. Examples include the proposed NASA and ESA wind lidars. Electron-beam sustained discharge devices are strong contenders. Unlike self-sustained discharges, e-beam sustenance readily provides efficient performance from large volume discharges and offers pulse lengths well in excess of the microsecond or so generally associated with self-sustained devices. In the case of the e-beam sustained laser, since the plasma is externally maintained and operated at electric field strengths less than that associated with the glow to arc transition, the discharges can be run even in the presence of strongly attacking species such as O2. Build up of large levels of attacking contaminants is nevertheless undesirable as their presence reduces the current drawn by the plasma and thus the pumping rate to the upper laser level. The impedance rise leads to a mismatch of the pulse forming network with a consequent loss of control over energy deposition, operating E/N, and gain. Clearly CO2 dissociation rates, the influence of dissociation products on the discharge and gain, and tolerance of the discharge to these products need to be determined. This information can then be used to assess co-oxidation catalyst requirements for sealed operation.

Harris, Michael R.↗

Fabrication of Single, Vertically Aligned Carbon Nanotubes in 3D Nanoscale Architectures

Plasma-enhanced chemical vapor deposition (PECVD) and high-throughput manufacturing techniques for integrating single, aligned carbon nanotubes (CNTs) into novel 3D nanoscale architectures have been developed. First, the PECVD growth technique ensures excellent alignment of the tubes, since the tubes align in the direction of the electric field in the plasma as they are growing. Second, the tubes generated with this technique are all metallic, so their chirality is predetermined, which is important for electronic applications. Third, a wafer-scale manufacturing process was developed that is high-throughput and low-cost, and yet enables the integration of just single, aligned tubes with nanoscale 3D architectures with unprecedented placement accuracy and does not rely on e-beam lithography. Such techniques should lend themselves to the integration of PECVD grown tubes for applications ranging from interconnects, nanoelectromechanical systems (NEMS), sensors, bioprobes, or other 3D electronic devices. Chemically amplified polyhydroxystyrene-resin-based deep UV resists were used in conjunction with excimer laser-based (lambda = 248 nm) step-and-repeat lithography to form Ni catalyst dots = 300 nm in diameter that nucleated single, vertically aligned tubes with high yield using dc PECVD growth. This is the first time such chemically amplified resists have been used, resulting in the nucleation of single, vertically aligned tubes. In addition, novel 3D nanoscale architectures have been created using topdown techniques that integrate single, vertically aligned tubes. These were enabled by implementing techniques that use deep-UV chemically amplified resists for small-feature-size resolution; optical lithography units that allow unprecedented control over layer-to-layer registration; and ICP (inductively coupled plasma) etching techniques that result in near-vertical, high-aspect-ratio, 3D nanoscale architectures, in conjunction with the use of materials that are structurally and chemically compatible with the high-temperature synthesis of the PECVD-grown tubes. The techniques offer a wafer-scale process solution for integrating single PECVD-grown nanotubes into novel architectures that should accelerate their integration in 3D electronics in general. NASA can directly benefit from this technology for its extreme-environment planetary missions. Current Si transistors are inherently more susceptible to high radiation, and do not tolerate extremes in temperature. These novel 3D nanoscale architectures can form the basis for NEMS switches that are inherently less susceptible to radiation or to thermal extremes.

Kaul, Anupama B.↗

Microcrystalline silicon growth for heterojunction solar cells

A total of sixteen runs of e-beam vacuum deposition of p type microcrystalline Si (m-Si) films were attempted on n type or p-n junction single crystalline Si (C-Si) substrates. The m-Si film thickness varied from .15 to .7 um and metal contacts were deposited after plasma hydrogenation. The p-m-Si on n-c-Si structure had a Voc of up to 490 m V while no Voc improvements were observed in the p-m-Si on p-n C-Si structure against p-n controls. Both CFF and Jsc were lower than control. Possible problem areas were interfaced between m-Si and C-si and the back contacts due to lack of sintering for fear of dehydrogenation.

Iles, P. A.↗

On the Alignment and Focusing of the Marshall Grazing Incidence X-ray Spectrometer (MaGIXS)

The Marshall Grazing Incidence X-ray Spectrometer (MaGIXS) is a NASA sounding rocket instrument that is designed to observe soft X-ray emissions from 24 - 6.0 A (0.5 - 2.0 keV energies) in the solar atmosphere. For the rst time, high-temperature, low-emission plasma will be observed directly with 5 arcsecond spatial resolution and 22 mA spectral resolution. The unique optical design consists of a Wolter - I telescope and a 3-optic grazing- incidence spectrometer. The spectrometer utilizes a nite conjugate mirror pair and a blazed planar, varied line spaced grating, which is directly printed on a silicon substrate using e-beam lithography. The grating design is being nalized and the grating will be fabricated by the Massachusetts Institute of Technology (MIT) and Izentis LLC. Marshall Space Flight Center (MSFC) is producing the nickel replicated telescope and spectrometer mirrors using the same facilities and techniques as those developed for the ART-XC and FOXSI mirrors. The Smithsonian Astrophysical Observatory (SAO) will mount and align the optical sub-assemblies based on previous experience with similar instruments, such as the Hinode X-Ray Telescope (XRT). The telescope and spectrometer assembly will be aligned in visible light through the implementation of a theodolite and reference mirrors, in addition to the centroid detector assembly (CDA) { a device designed to align the AXAF-I nested mirrors. Focusing of the telescope and spectrometer will be achieved using the X-ray source in the Stray Light Facility (SLF) at MSFC. We present results from an alignment sensitivity analysis performed on the on the system and we also discuss the method for aligning and focusing MaGIXS.

solar↗

Magnetogasdynamic Power Extraction and Flow Conditioning for a Gas Turbine

An extension of the Russian AJAX concept to a turbojet is being explored. This magnetohydrodynamic (MHD) energy bypass engine cycle incorporating conventional gas turbine technology has MHD flow conditioning at the inlet to electromagnetically extract part of the inlet air kinetic energy. The electrical power generated can be used for various on-board vehicle requirements including plasma flow control around the vehicle or it may be used for augmenting the expanding flow in the high speed nozzle by MHD forces to generate more thrust. In order to achieve this interaction, the air needs to be ionized by an external means even up to fairly high flight speeds, and the leading candidates may be classified as electrical discharge devices. The present kinetic modeling calculations suggest that the use of electron beams with characteristics close to the commercially available e-beam systems (electron energy approx. 60 keV, beam current approx. 0.2 mA/sq cm) to sustain ionization in intermediate pressure, low-temperature (P = 0.1 atm, T = 300 K) supersonic air flows allows considerable reduction of the flow kinetic energy (up to 10 to 20 percent in M = 3 flows). The calculations also suggest that this can be achieved at a reasonable electron beam efficiency (eta approx. 5), even if the e-beam window losses are taken into account. At these conditions, the exit NO and O atom concentrations due to e-beam initiated chemical reactions do not exceed 30 ppm. Increasing the beam current up to approx. 2 mA/sq cm, which corresponds to a maximum electrical conductivity of sigma(sub max) approx. 0.8 mho/m at the loading parameter of K = 0.5, would result in a much greater reduction of the flow kinetic energy (up to 30 to 40 percent). The MHD channel efficiency at these conditions would be greatly reduced (to eta approx. 1) due to increased electron recombination losses in the channel. At these conditions, partial energy conversion from kinetic energy to heat would result in a significant total pressure loss (P(sub 0)/P(sub 0i) approx. 0.3). The total pressure loss can be reduced operating at the loading parameter closer to unity, at the expense of the reduced electrical power output. Raising the beam current would also result in the increase of the exit O atom concentrations (up to 600 ppm) and NO (up to 150 ppm).

Adamovich, Igor V.↗