Polarity compensation in ultra-thin films of complex oxides: The case of a perovskite nickelate
We address the fundamental issue of growth of perovskite ultra-thin films under the condition of a strong polar mismatch at the heterointerface exemplified by the growth of a correlated metal LaNiO 3 on the band insulator SrTiO 3 along the pseudo cubic [111] direction. While in general the metallic LaNiO 3 film can effectively screen this polarity mismatch, we establish that in the ultra-thin limit, films are insulating in nature and require additional chemical and structural reconstruction to compensate for such mismatch. A combination of in-situ reflection high-energy electron diffraction recorded during the growth, X-ray diffraction, and synchrotron based resonant X-ray spectroscopy reveal the formation of a chemical phase La 2 Ni 2 O 5 (Ni 2+ ) for a few unit-cell thick films. First-principles layer-resolved calculations of the potential energy across the nominal LaNiO 3 /SrTiO 3 interface confirm that the oxygen vacancies can efficiently reduce the electric field at the interface.