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At least 163 records · Page 9

A Study of the Ultraviolet Radiation of Hybrid X-Pinches

The results of an experimental study of hybrid X-pinches (HXPs) as sources of vacuum ultraviolet (VUV) radiation within the wavelength range of λ < 2000 Å are presented here. A KING compact low-voltage generator (45 kV, 200 kA, 190 ns) was used to feed the X-pinches. The dynamics of forming the radiating plasma of HXPs of different materials were studied using pinhole cameras with radiation receivers based on microchannel plates with a time resolution of 5 ns and a spatial resolution of 150 µm. The time structure and energy characteristics of the radiation were studied using diamond photoconducting detectors (PCDs). The spectral composition of UV radiation was investigated using a spectrograph based on the transmission grating. It has been shown that the efficiency of conversion of the capacitor-stored energy to the VUV radiation may reach 5%, whereas the fraction of soft X-rays (SXR) with quanta energies above 800 eV is no more than 3%. In this case, the source brightness reaches 2 × 10 9 W/(sr cm 2 ).

plasma UV-spectroscopy↗

Non-Wilsonian ultraviolet completion via transseries

We study some of the implications for the perturbative renormalization program when augmented with the Borel–Ecalle resummation. We show the emergence of a new kind of nonperturbative fixed point for the scalar [Formula: see text] model, representing an ultraviolet self-completion by transseries. We argue that this completion is purely non-Wilsonian and it depends on one arbitrary constant stemming from the transseries solution of the renormalization group equation. On the other hand, if no fixed points are demanded through the adjustment of this arbitrary constant, we end up with an effective theory in which the scalar mass is quadratically-sensitive to the cutoff, even working in dimensional regularization. Complete decoupling of the scalar mass to this energy scale can be used to determine a physical prescription for the Borel–Laplace resummation of the renormalons in nonasymptotically free models. We also comment on possible orthogonal scenarios available in the literature that might play a role when no fixed points exist.

Physics↗

Encoding the complete electric field of an ultraviolet ultrashort laser pulse in a near-infrared nonlinear-optical signal

We introduce a variation on the cross-correlation frequency-resolved optical gating (XFROG) technique that uses a near-infrared (NIR) nonlinear-optical signal to characterize pulses in the ultraviolet (UV). Using a transient-grating XFROG beam geometry, we create a grating using two copies of the unknown UV pulse and diffract a NIR reference pulse from it. We show that, by varying the delay between the UV pulses creating the grating, the UV pulse intensity-and-phase information can be encoded into a NIR signal. We also implemented a modified generalized-projections phase-retrieval algorithm for retrieving the UV pulses from these spectrograms. We performed proof-of-principle measurements of chirped pulses and double pulses, all at 400 nm. This approach should be extendable deeper into the UV and potentially even into the extreme UV or x-ray range.

47 OTHER INSTRUMENTATION↗

Measuring an ultrashort, ultraviolet pulse in a slowly responding, absorbing medium

Frequency-resolved optical gating (FROG) is a common technique for measuring ultrashort laser pulses using an instantaneous, nonlinear-optical interaction as a fast time-gate to measure the pulse intensity and phase. But at high frequencies, materials are often absorbing and it is not always possible to find a medium with a fast nonlinear-optical response. Here we show that an ultrashort, ultraviolet (UV) pulse can be measured in a strongly absorbing medium, using the absorption as the nonlinear-optical time-gate. To do this, we build on our recent implementation of FROG, known as induced-grating cross-correlation FROG (IG XFROG), where an unknown, higher-frequency pulse creates a transient grating that is probed with a lower-frequency, more easily detectable reference pulse. We demonstrate this with an 800 nm reference pulse to characterize 400 nm or 267 nm pulses using ZnS as the nonlinear-optical medium, which is absorptive at and below 400 nm. By scanning the delay between the two UV pulses which create the transient grating, we show that the phase-sensitive instantaneous four-wave-mixing contribution to the nonlinear signal field can be detected and separated from the slower, incoherent part of the response. Measuring a spectrally-resolved cross-correlation in this way and then applying a simple model for the response of the medium, we show that a modified generalized projections (GP) phase-retrieval algorithm can be used to extract the pulse amplitude and phase. We test this approach by measuring chirped UV pulses centered at 400 nm and 267 nm. Since interband absorption (or even photoionization) is not strongly wavelength-dependent, we expect IG XFROG to be applicable deeper into the UV.

77 NANOSCIENCE AND NANOTECHNOLOGY↗

Generation of structured coherent extreme ultraviolet beams from an MgO crystal

Short wavelength high-harmonic sources are undergoing intense development for applications in spectroscopy and microscopy. Despite recent progress in peak and average power, spatial control over coherent extreme ultraviolet (XUV) beams remains a formidable challenge due to the lack of suitable optical elements for beam shaping and control. In this work, we demonstrate a robust and precise approach that structures XUV high-order harmonics in space as they are emitted from a nanostructured MgO crystal. Our demonstration paves the way for bridging the numerous applications of shaped light beams from the visible to the short wavelengths, with potential uses for applications in microscopy and nanoscale machining.

36 MATERIALS SCIENCE↗

Spectral and temporal shaping of spectrally incoherent pulses in the infrared and ultraviolet

Laser–plasma instabilities (LPIs) hinder the interaction of high-energy laser pulses with targets. Simulations show that broadband spectrally incoherent pulses can mitigate these instabilities. Optimizing laser operation and target interaction requires controlling the properties of these optical pulses. We demonstrate closed-loop control of the spectral density and pulse shape of nanosecond spectrally incoherent pulses after optical parametric amplification in the infrared (∼1053 nm) and sum–frequency generation to the ultraviolet (∼351 nm) using spectral and temporal modulation in the fiber front end. The high versatility of the demonstrated approaches can support the generation of high-energy, spectrally incoherent pulses by future laser facilities for improved LPI mitigation.

47 OTHER INSTRUMENTATION↗

New method for the determination of photoabsorption from transmittance measurements in the extreme ultraviolet

We have developed a new method for the determination of photoabsorption at extreme ultraviolet wavelengths longer than 20 nm, where reliable refractive index values are sparse or non-existent. Our method overcomes the obstacle of multiple reflections that occur inside thin films in this spectral range, which up until now has prevented the accurate determination of photoabsorption from transmittance measurements. We have derived a mathematical expression that is independent of internal reflection amplitudes, while taking advantage of the transmittance oscillations stemming from such reflections. The method is validated on measurements of aluminum thin films. This advance will enable accurate refractive index values for many important materials for optical instrumentation, thus facilitating high-priority research on topics including coherent light sources, planetary and solar physics, and semiconductor manufacturing.

74 ATOMIC AND MOLECULAR PHYSICS↗

Ultraviolet digital holographic microscopy (DHM) of micron-scale particles from shocked Sn ejecta

A cloud of very fast, O (km/s), and very fine, O (µm), particles may be ejected when a strong shock impacts and possibly melts the free surface of a solid metal. To quantify these dynamics, this work develops an ultraviolet, long-working distance, two-pulse Digital Holographic Microscopy (DHM) configuration and is the first to replace film recording with digital sensors for this challenging application. A proposed multi-iteration DHM processing algorithm is demonstrated for automated measures of the sizes, velocities, and three-dimensional positions of non-spherical particles. Ejecta as small as 2 µm diameter are successfully tracked, while uncertainty simulations indicate that particle size distributions are accurately quantified for diameters ≥4 µm. These techniques are demonstrated on three explosively driven experiments. Measured ejecta size and velocity statistics are shown to be consistent with prior film-based recording, while also revealing spatial variations in velocities and 3D positions that have yet to be widely investigated. Having eliminated time-consuming analog film processing, the methodologies proposed here are expected to significantly accelerate future experimental investigation of ejecta physics.

47 OTHER INSTRUMENTATION↗

Scalable waveplate for ultraviolet applications using laser-imprinted birefringence in silica

A method for fabrication of large-aperture waveplate suitable for operation in the near-ultraviolet spectral region is demonstrated. The waveplate was fabricated using femtosecond direct laser writing of bulk fused silica. This method enables the precise control of the induced birefringence, which is introduced via the generation of nanopores with geometrical features that are controlled by the laser processing parameters. The resulting structures also introduce a small loss of transmission that is on the order of 4% at 351 nm. The laser-induced–damage threshold in the nanosecond regime was found to approach that of the native fused-silica substrate, which makes it a suitable candidate for polarization control in laser fusion research applications.

Shevtsov, S. I. [Univ. of Southampton (United King↗

Open-source simulation program for extreme ultraviolet and soft x-ray sources based on high-harmonic generation

Light sources based on high-harmonic generation (HHG) underpin ultrafast spectroscopy experiments across a large range of photon energies, spanning from the extreme ultraviolet to the soft x-ray. To this day, their design, implementation, and improvement presens unique challenges, but can be aided by numerical tools. Here we present a new simulation program designed for this purpose, which takes both macroscopic and microscopic aspects of high-harmonic generation into account and is therefore applicable across the broad range of parameters which HHG based light sources are today utilized. The program is validated by comparison with published experimental results and by calculating harmonic emission in four common experimental configurations.

Femtosecond lasers↗

Tunable and efficient ultraviolet generation with periodically poled lithium niobate

On-chip ultraviolet (UV) sources are of great interest for building compact and scalable atomic clocks, quantum computers, and spectrometers. However, few material platforms are suitable for integrated UV light generation and manipulation. Of these materials, thin-film lithium niobate offers unique advantages such as sub-micron modal confinement, strong nonlinearity, and quasi-phase matching. Despite these characteristics, its utilization in the UV has remained elusive because of the substantial sensitivity of standard quasi-phase matching to fabrication imperfections, the photorefractive effect, and relatively large losses in this range. Here, we present efficient (197 ± 5%/W/cm 2 ) second harmonic generation of UV-A light in a periodically poled lithium niobate nanophotonic waveguide. We achieve on-chip UV powers of ~30 µW and linear wavelength tunability using temperature. These results are enabled with large cross section waveguides, which leads to first-order UV quasi-phase-matching with relatively long poling periods (>1.5 µm). By varying the poling period, we have achieved the shortest reported wavelength (355 nm) generated through frequency doubling in thin-film lithium niobate. Furthermore, our results open up new avenues for UV on-chip sources and chip-scale photonics through compact frequency-doubling of common near-IR laser diodes.

42 ENGINEERING↗

Efficient (~10%) generation of vacuum ultraviolet femtosecond pulses via four-wave mixing in hollow-core fibers

Here we report the generation of the fifth harmonic of Ti:sapphire, at 160 nm, with more than 4 µJ of pulse energy and a pulse length of 37 fs with a 1 kHz repetition rate. The vacuum ultraviolet pulses are produced using four-wave difference frequency mixing in a He-filled stretched hollow-core fiber, driven by a pump at 267 nm and seeded at 800 nm. Guided by simulations using Luna.jl, we are able to optimize the process carefully. The result is a conversion efficiency of ~10% from the 267 nm pump beam.

47 OTHER INSTRUMENTATION↗

Spectral broadening and pulse shaping in the deep ultraviolet

Here, we report the generation and shaping of ∼20 femtosecond pulses in the deep ultraviolet (DUV). Our approach combines spectral broadening in a stretched hollow-core fiber with compression and shaping via an acousto-optic modulator-based pulse shaper. The pulse shaper allows for automatic compression, useful for in-air delivery of pulses to two-dimensional (2D) spectroscopy and other time-resolved experiments. Unlike previous DUV pulse generation schemes that lack phase stability, our method enables programmable generation of phase-locked pulse-pairs with attosecond-level stability. We demonstrate pulse characterization via self-diffraction frequency-resolved optical gating and dispersion scan methods in the DUV and validate performance through a pump-probe experiment resolving electronic dynamics on attosecond timescales.

Codere, Julia [Stony Brook Univ., NY (United State↗

Origin and effect of film sub-stoichiometry on ultraviolet, ns-laser damage resistance of hafnia single layers

Understanding the origin of laser damage-prone precursors in high index materials such as hafnia holds the key to the development of laser damage-resistant multilayer dielectric coated optics for high power and energy laser systems. In this study, we investigate the source of sub-stoichiometry, a potent laser damage precursor, in hafnia films produced by an ion beam sputtering (IBS) deposition method and the effect of such defects on the film performance upon ns ultraviolet (UV) laser (8 ns, 355 nm) exposure. Chemical analysis of data obtained via Rutherford backscattering spectroscopy (RBS) suggests that hafnia films deposited at two different planetary locations from the same deposition run exhibit anisotropic and location-dependent stoichiometries. While the oxygen-to-hafnium ratio is at the stoichiometric value of 2 for the hafnia film at the edge location, the ratio is significantly deviated and is 1.7 for that deposited at the planetary center. The sub-stoichiometric hafnia films display a much lower 1-on-1 damage onset at 1.6 ± 0.2 J/cm 2 compared to 2.3 ± 0.2 J/cm 2 in a stoichiometric film. The low damage performance films also have an over three times higher damage density at fluences above initiation. Coupled with Monte Carlo simulations, we reveal that sub-stoichiometry is primarily attributed to preferential removal of oxygen during film deposition by the bombardment of energetic reflected argon neutrals. The resulting oxygen deficiencies create the sub-bandgap states which facilitate the strong laser energy coupling and reduce the resistance to laser-induced damage in the hafnia single layer films.

36 MATERIALS SCIENCE↗

Room temperature plasma-etching and surface passivation of far-ultraviolet Al mirrors using electron beam generated plasmas

The development of optical systems operating in the far ultraviolet range (FUV, λ=100-200 nm) is limited by the efficiency of passivated aluminum (Al) mirrors. Although it is presently possible to obtain high-reflectivity FUV mirrors through physical vapor deposition, the process involves deposition with substrates at high temperatures, which is technically challenging for large optical elements. A novel passivation procedure for bare Al mirrors is reported. The treatment consisted of using a low-temperature electron-beam generated plasma produced in a gas mixture of Ar and SF6 to etch away the native oxide layer from the Al film, while simultaneously promoting the generation of a thin aluminum tri-fluoride (AlF3) layer on the Al surface. In the first section we analyze the effect of varying both ion energy and SF6 concentration on the FUV reflectance, thickness, composition, and surface morphology of the resulting AlF3 protective layers. In the second section, the reflectivity of samples is optimized at selected important FUV wavelengths for astronomical observations. Notably, samples attained state-of-the-art reflectances of 75% at 108.5 nm (He Lyman γ), 91% at 121.6 nm (H Lyman α), 90% at 130.4 nm (OI), and of 95% at 155.0 nm (C IV). The stability over time of these passivated mirrors is also investigated.

70 PLASMA PHYSICS AND FUSION TECHNOLOGY↗

Noncollinear, inelastic four-wave mixing in the extreme ultraviolet

Driving four-wave mixing (FWM) processes with extreme ultraviolet (EUV) pulses could enable experimental approaches that have the potential to provide unique information on dynamics and correlations. In this work, we demonstrate inelastic FWM obtained by noncollinear mixing of two EUV pulses with different photon energies and an optical pulse in a diamond sample. This three-pulse interaction leads to the emission of an optical signal, propagating in the phase-matching direction and blue shifted by the photon energy difference of the two EUV pulses. The presented results demonstrate the feasibility of experiments such as the soft X-ray analogue of coherent anti-Stokes Raman scattering, so far only theoretically conceived [ Phys. Rev. Lett. 89 , 043001 ( 2002 ) PRLTAO 0031-9007 10.1103/PhysRevLett.89.043001 ], which can be further extended for studying vibrational and electronics dephasing in solid, liquid, or gaseous samples.

Mincigrucci, R. (ORCID:0000000163436256)↗

Dual-comb spectroscopy in the deep ultraviolet

This Letter reports dual-frequency-comb spectroscopy in the deep ultraviolet used to characterize transient laser-produced plasmas. Dual-comb spectroscopy at these wavelengths enables access to a large number of strong electronic transitions in neutral and ionized atoms and molecules. This broadband dual-frequency-comb system at 265 nm measures multiple transitions in neutral and singly ionized iron atoms in a laser-produced plasma. Analysis of absorption spectra yields time-resolved ion and neutral column densities, excitation temperatures, and electron densities, which are measured down to 10 14 cm —3 levels. The results provide insights into low-temperature plasma properties.

47 OTHER INSTRUMENTATION↗

Directed self-assembly of block copolymers for high-precision patterning in the era of extreme ultraviolet lithography

Extreme ultraviolet (EUV) lithography enables unprecedented resolution in semiconductor patterning but faces critical challenges in developing resist materials that achieve high-precision at economically viable throughput. Directed self-assembly (DSA) of block copolymers (BCPs) offers a promising solution for pattern rectification by leveraging thermodynamically determined domain structures to decouple BCP pattern quality from the imperfect original lithographic pattern. This prospective presents an overview of recent progress on the EUV + DSA strategy, covering advances in BCP material design, processing, metrology, and pattern transfer. We highlight recent advances in high-χ BCPs with perpendicular orientation and domain spacings compatible with EUV dimensions, leveraging A-b-(B-r-C) architectures. We also discuss progress in chemical pre-pattern fabrication using both positive- and negative tone resists, along with processing strategies to minimize defects and roughness based on BCP thermodynamics and assembly kinetics. We further examine metrology platforms for characterizing the thermodynamics of BCP materials and quantifying the size and shape of BCP domains. Lastly, we review pattern transfer strategies for generating functional inorganic masks suitable for semiconductor manufacturing. Together, these advances highlight the potential of DSA to complement EUV lithography, offering a pathway to address critical challenges in achieving high-precision patterning for the semiconductor industry.

Lee, Kyunghyeon [Univ. of Chicago, IL (United Stat↗