Energy band line-up of atomic layer deposited Al{sub 2}O{sub 3} on β-Ga{sub 2}O{sub 3}
Electrical properties of atomic layer deposited Al{sub 2}O{sub 3}/β-Ga{sub 2}O{sub 3} interface were investigated. We determined the conduction band offset and interface charge density of Al{sub 2}O{sub 3}/β-Ga{sub 2}O{sub 3} interface by analyzing the capacitance-voltage characteristics. The conduction band offset at the Al{sub 2}O{sub 3}/β-Ga{sub 2}O{sub 3} interface was found to be 1.7 eV. A large positive sheet charge density of 3.6 × 10{sup 12} cm{sup −2} is induced at the Al{sub 2}O{sub 3}/β-Ga{sub 2}O{sub 3} interface, which caused a non-zero field of 0.7 MV/cm in the Al{sub 2}O{sub 3} under flat-band conditions in the β-Ga{sub 2}O{sub 3}. The forward current-voltage characteristics were found to be related to trap-assisted tunneling.