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Hydrothermal Corrosion of First-Generation Dual-Purpose Coatings on Silicon Carbide for Accident-Tolerant Fuel Cladding
In this study, four different commercial coatings, TiN, Cr, CrN, and Cr/CrN (multilayer) were deposited by physical vapor deposition (PVD) on high resistivity chemical vapor deposited (CVD) SiC for the dual purpose of corrosion mitigation and fission gas hermeticity. The coatings were exposed for up to 2600 hours in flowing high temperature (288-350°C), high purity, liquid water with dissolved hydrogen (0.15-3ppm) or dissolved oxygen (1-2ppm). The Cr/CrN coatings did not adhere well and spalled quickly during exposure. In oxygenated conditions, none of the coatings were protective . CrN coatings spalled preferentially at defect sites, but reacted slowly enough in the absence of defects to potentially be chemically protective. TiN coatings fully oxidized within a few hundred hours and spalled. In hydrogen, all the coatings were chemically stable. Coating failures were identified and attributed to localized spallation, potentially related to coating defects. Coating improvements are recommended to reduce spallation and improve coating protection for future generations of dual-purpose coatings.
Irradiation creep measurement and microstructural analysis of chromium nitride–coated zirconium alloy using pressurized tubes
Environmental barrier coatings for Zr-based materials are currently under development to reduce oxidation and embrittlement in light-water reactors. Chromium nitride is one such candidate for this application, particularly as accident-tolerant fuel cladding. However, quantifying the impact of coatings on the irradiation-induced creep of zircaloy (Zry) is critical as this mechanism often exceeds thermal creep rates under light-water reactor operating conditions and can be a limiting design characteristic. Additionally, examining irradiation effects in the microstructure at the coating interface is key to understanding the compatibility of the material system. Here, to accelerate the experimental measurement of irradiation creep and microstructure evolution in CrN-Zry, compact, pressurized creep tubes were fabricated and irradiated in the High Flux Isotope Reactor (HFIR) at Oak Ridge National Laboratory. Miniature, thin-walled rodlets fabricated from annealed Zr-Sn barstock were coated with CrN using physical vapor deposition (PVD) to nominal thicknesses of 4 and 8 μm. Coated and uncoated rodlet specimens were internally pressurized and welded, generating nominal circumferential hoop stresses of 0, 90, or 180 MPa under 300°C irradiation conditions. Twelve specimens were measured diametrically prior to irradiation using a low-cost, automated, contactless laser profilometer developed for this work. Specimens were irradiated in sealed capsules for one 25-day HFIR cycle, accumulating approximately 1.8 $\times$ 10 21 n/cm 2 fast fluence (E n > 10 MeV). The irradiated samples were retrieved and remeasured using the same profilometry system in a shielded hot cell facility. Irradiation creep between specimens was compared using standard statistical tests and showed that both thicknesses of CrN coating had a negligible effect on the irradiation creep strain of the Zry material. Microstructure characterization of pre- and post-irradiated CrN-Zry specimens showed minimal changes due to irradiation but did show a substantial O-rich region at the Zry-CrN interface.
Wettability, structural and optical properties investigation of TiO{sub 2} nanotubular arrays
Graphical abstract: FESEM images of the TiO 2 nanotube layers formed at 0.5 wt% NH4F/ glycerol. - Highlights: • Structural property investigation of TiO{sub 2} nanotube. • Evaluation of wettability of TiO{sub 2} nanotube. • Study on optical properties of TiO{sub 2} nanotube. • The effect of anatase phase on optical and wettability properties of TiO{sub 2.} - Abstract: In this study, the effect of microstructural evolution of TiO{sub 2} nanotubular arrays on wettability and optical properties was investigated. Pure titanium was deposited on silica glass by PVD magnetron sputtering technique. The Ti coated substrates were anodized in an electrolyte containing NH{sub 4}F/glycerol. The structures of the ordered anodic TiO{sub 2} nanotubes (ATNs) as long as 175 nm were studied using field emission scanning electron microscopy (FESEM) and X-ray diffraction (XRD). The result shows a sharp peak in the optical absorbance spectra around the band gap energy, 3.49–3.42 eV for annealed and non-annealed respectively. The thermal process induced growth of the grain size, which influence on the density of particles and the index of refraction. Furthermore, the wettability tests' result displays that the contact angle of intact substrate (θ = 74.7°) was decreased to 31.4° and 17.4° after anodization for amorphous and heat treated (450 °C) ANTs coated substrate, respectively.
Critical length scales for chemical heterogeneity at Cu/Nb 3D interfaces by atom probe tomography
Cu/Nb nanocomposites containing sharp, two-dimensional (2D) interfaces have outstanding strength but limited deformability. In contrast, Cu/Nb with three dimensional (3D) biphase interfaces exhibiting crystallographic, topological, and chemical variations in all spatial dimensions overcomes this limitation by simultaneously enhancing material strength and deformability. Here, while structural characterization of 3D interfaces has been performed to understand their mechanical behavior, three dimensional chemical characterization of such interfaces is lacking. In this work we quantify the local chemistry of 3D interfaces in Cu/Nb nanocomposites using atom probe tomography (APT). Our analysis demonstrates chemical heterogeneities along all spatial dimensions in 3D interfaces, establishes the length scale of such features, and quantifies the morphology of 3D interfaces. 3D interface heterogeneities form by surface diffusion during physical vapor deposition (PVD), suggesting that deposition parameters can be used to control interface structure and provide unique ways to explore processing-structure-property relationships in interface-dominated nanocomposites.
A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)
In this study, high power impulse magnetron sputtering (HiPIMS) has been in the center of attention over the last years as it is an emerging physical vapor deposition (PVD) technology that combines advantages of magnetron sputtering with various forms of energetic deposition of films such as ion plating and cathodic arc plasma deposition. It should not come at a surprise that many extension and variations of HiPIMS make use, intentionally or unintentionally, of previously discovered approaches to film processing such as substrate surface preparation by metal ion sputtering and phased biasing for film texture and stress control. Therefore, in this review, an overview is given on some historical developments and features of cathodic arc and HiPIMS plasmas, showing commonalities and differences. To limit the scope, emphasis is put on plasma properties, as opposed to surveying the vast literature on specific film materials and their properties.
A theory of growing crystalline nanorods – Mode Ⅰ
Nanorods grow in two possible modes during physical vapor deposition (PVD). In mode I, monolayer surface steps dictate the diameter of nanorods. In mode II, multiple-layer surface steps dictate the diameter, which is the smallest possible under physical vapor deposition [5,10]. Here this paper reports closed-form theories of terrace lengths and nanorod diameter during the growth in mode I, as a function of deposition conditions. The accompanying lattice kinetic Monte Carlo simulations verify these theories. This study reveals that (1) quasi-steady growth exists for each set of nanorod growth conditions, and (2) the characteristic length scales, including terrace lengths and nanorod diameter at the quasi-steady state, depend on the deposition conditions – deposition rate F, substrate temperature T, and incidence angle θ – only as a function of l 2D /tan θ, with l2D = 2($\frac{v_{2D}}{F cos θ}$)$^\frac{1}{3}$ as a diffusion-limited length scale and v 2D as the atomic diffusion jump rate over monolayer surface steps.
Hillock formation in co-deposited thin films of immiscible metal alloy systems
Hillocks are protruding sections of a surface that can influence the electronic and mechanical properties of a thin film. In monolithic films, these hillocks are formed due to thermally induced stress gradients during deposition. In this study, the surface morphology of co-sputtered immiscible Cu-X (X is a body centered cubic (BCC) group V or VI metal) thin films is characterized to elucidate the conditions that lead to hillock formation. Cu-Ta and Cu-Mo-Ag films were co-deposited with physical vapor deposition (PVD) magnetron sputtering at 25, 400, 600, and 800°C. A significant number of homogeneously distributed surface hillocks were observed only in the 600 and 800°C films. High-angle annular dark field (HAADF) cross-sectional imaging revealed significant Cu agglomerations underneath the protruding features. For the Cu-Ta films, the Cu was enveloped in a Cu-Ta nanocrystalline matrix. For Cu-Mo-Ag, the Cu was surrounded by Mo-Ag concentration modulations. While thermal stress gradients arise during deposition of immiscible metal films, biaxial stress calculations and literature cases reveal that they are not solely responsible for hillock formation. The observed morphologies align with a surface diffusion kinetic model that evaluates diffusion length of adatoms during deposition as a function of deposition temperature. Finally, this indicates a phase separation driving force paired with the constituent elements’ dissimilar mobilities at elevated deposition temperatures contribute to the presence of hillocks.
Thermal Barrier Coatings Overview: Design, Manufacturing, and Applications in High-Temperature Industries
Today’s competitive world economy is creating an indispensable demand for increased efficiency of engineering components that operate in harsh environments (i.e., very high-temperature, corrosive, or neutron irradiation environments), for applications in the energy, automotive, aerospace, electronics, and power industries. Increased research is being done on thermal barrier coatings (TBCs) for protecting such components, since the versatility of manufacturing techniques and the scale of deployment result in increased life, economics, performance, and durability. This review focuses on the advances that led to using TBCs for component life extension and, more recently, as an integral part of advanced component design for high-temperature and other types of harsh environments, such as those found in nuclear-related applications. Furthermore, factors that led to state-of-the-art advanced coating-fabrication techniques [e.g., electron-beam physical vapor deposition (EB-PVD), plasma spray deposition, and electrophoretically deposited TBCs, as well as functionally graded material (FGM) manufacturing] have also been emphasized in current coating R&D. This review explores the current state of TBCs, i.e., the latest advances regarding their fabrication and performance, associated challenges, and recommendations for their future use in aerospace, nuclear, high-temperature, or otherwise harsh environments.
Molecular Orientation for Vapor-Deposited Organic Glasses Follows Rate-Temperature Superposition: The Case of Posaconazole
The anisotropic properties of organic glasses produced by physical vapor deposition (PVD) depend upon substrate temperature and deposition rate. In recent work, it was shown for a liquid crystalline system that the anisotropic structure of the glass was controlled by a single combined variable as indicated by the observation of deposition rate-substrate temperature superposition (RTS). Here we test the utility of RTS for posaconazole, a molecule that does not form liquid crystals. We prepare glasses of posaconazole utilizing a range of deposition rates covering 2 orders of magnitude and an 18 K range in substrate temperature. We characterize the glasses using ellipsometry and X-ray scattering. Consistent with RTS, we find that decreasing the deposition rate has the same effect upon molecular orientation as increasing the substrate temperature during deposition. Thus, RTS can be used to predict and control the structure of glasses prepared at a wide range of deposition conditions. We use RTS to infer a characteristic time for molecular reorientation at the surface of posaconazole.
Electrodeposited Mo x S y O z /Ni Tribological Coatings
Deposition of molybdenum disulfide (MoS 2 ) coatings using physical vapor deposition (PVD) and mechanical burnishing has been widely assessed for solid lubricants in space applications but still suffers from line-of-sight constraints on complex geometries. Here, we highlight one of the first demonstrations of electrodeposited Mo x S y O z and Mo x S y O z /Ni thin-film coatings from aqueous solutions of ammonium tetrathiomolybdate for solid lubricant applications and their remarkable ability to provide low coefficients of friction and high wear resistance. Characterization of the coating morphology shows amorphous microstructures with a high oxygen content and cracking upon drying. Even so, electrodeposited Mo x S y O z can achieve low steady-state coefficients of friction (μ ∼ 0.05–0.06) and wear rates (2.6 × 10 –7 mm 3 /(N m)) approaching those of physical vapor deposited coatings (2.3 × 10 –7 mm 3 /(N m)). Additionally, we show that adding dopants such as nickel increased the wear rate (7.5 × 10 –7 mm 3 /(N m)) and initial coefficient of friction (μ i = 0.23) due to compositional modifications such as dramatic sub-stoichiometry (S/Mo ∼ 1) and expression of a NiO x surface layer, although doping did reduce the degree of cracking upon drying.
Ternary and Quaternary Nickel-Iron-Oxide-Based Thin Films as Oxygen Evolution Reaction Catalysts in Alkaline Media
Alkaline water electrolyzers are a promising technology for energy storage and conversion through the electrochemical production of hydrogen, however the slow kinetics of the oxygen evolution reaction (OER) pose a major challenge. The alkaline environment enables the use of non-Pt-group metals as OER catalysts, in particular NiFe-based materials. In this study, Mn and/or Cr were elementally mixed with NiFe to further improve the OER catalyst properties through a controlled, systematic synthesis process involving thin films prepared by electron beam-induced physical vapor deposition (PVD). By exploring both simultaneous co-deposition and serial deposition of the different metals, the OER performance was investigated as a function of both the location of Mn or Cr in the multi-metal NiFe-based catalysts and the difference between surface versus bulk mixing. The distinct differences in the redox dynamics, surface oxidation, and stability of the seven studied catalysts reveal metal Cr- and/or Mn-overlayers as a promising synthesis approach for fine-tuning of catalyst properties and improving the OER performance.
Combinatorial Nitrogen Gradients in Sputtered Thin Films
High-throughput synthesis and characterization methods can significantly accelerate the rate of experimental research. For physical vapor deposition (PVD), these methods include combinatorial sputtering with intentional gradients of metal/metalloid composition, temperature, and thickness across the substrate. However, many other synthesis parameters still remain out of reach for combinatorial methods. Here, we extend combinatorial sputtering parameters to include gradients of gaseous elements in thin films. Specifically, a nitrogen gradient was generated in a thin film sample library by placing two MnTe sputtering sources with different gas flows (Ar and Ar/N 2 ) opposite of one another during the synthesis. The nitrogen content gradient was measured along the sample surface, correlating with the distance from the nitrogen source. The phase, composition, and optoelectronic properties of the resulting thin films change as a function of the nitrogen content. Furthermore, this work shows that gradients of gaseous elements can be generated in thin films synthesized by sputtering, expanding the boundaries of combinatorial science.
High-performance ionomerless cathode anion-exchange membrane fuel cells with ultra-low-loading Ag–Pd alloy electrocatalysts
Rapid translation of catalysts from fundamental studies to high-performance devices could facilitate the process of developing and commercializing anion-exchange membrane fuel cells (AEMFCs). Traditionally, translation from material screening in three-electrode rotating disk electrode (RDE) cells to AEMFCs is complicated by differences in microenvironments, e.g. solid ionomer/membrane vs liquid electrolyte. Herein, we introduce a platform for translation to devices that utilizes ionomerless ultra-low-loading Ag-Pd alloy electrocatalyst cathodes synthesized by co-physical vapor deposition (PVD). Our ionomerless cathodes allow for systematic H 2 -O 2 AEMFC experiments while demonstrating comparable activity trends to those in three-electrode cells. Furthermore, here we show that our Ag 10 Pd 90 -based AEMFC reaches a peak power density of ~1 W cm$_{geo}^{-2}$ and ~10 W mg$_{PGM Cathode}^{-1}$ satisfying the U.S. Department of Energy’s platinum-group-metal (PGM) loading and cost targets. Our approach shows promise in facilitating the rapid translation between three-electrode studies and AEMFCs, offering a simple and effective design for decreasing PGM loadings.
Dielectric and specific heat relaxations in vapor deposited glycerol
Recently [S. Capponi, S. Napolitano, and M. Wübbenhorst, Nat. Commun. 3, 1233 (2012)], vapor deposited glasses of glycerol have been found to recover their super-cooled liquid state via a metastable, ordered liquid (MROL) state characterized by a tremendously enhanced dielectric strength along with a slow-down of the relaxation rate of the structural relaxation. To study the calorimetric signature of this phenomenon, we have implemented a chip-based, differential AC calorimeter in an organic molecular beam deposition setup, which allows the simultaneous measurement of dielectric relaxations via interdigitated comb electrodes and specific heat relaxation spectra during deposition and as function of the temperature. Heating of the as-deposited glass just above the bulk T{sub g} and subsequent cooling/reheating revealed a step-wise increase in c{sub p} by in total 9%, indicating unambiguously that glycerol, through slow vapour deposition, forms a thermodynamically stable glass, which has a specific heat as low as that of crystalline glycerol. Moreover, these glasses were found to show excellent kinetic stability as well as evidenced by both a high onset-temperature and quasi-isothermal recovery measurements at −75 °C. The second goal of the study was to elucidate the impact of the MROL state on the specific heat and its relaxation to the super-cooled state. Conversion of “MROL glycerol” to its “normal” (ordinary liquid, OL) state revealed a second, small (∼2%) increase of the glassy c{sub p}, a little gain (<10%) in the relaxed specific heat, and no signs of deviations of τ{sub cal} from that of normal “bulk” glycerol. These findings altogether suggest that the MROL state in glycerol comprises largely bulk-type glycerol that coexist with a minor volume fraction (<10%) of PVD-induced structural anomalies with a crystal-like calorimetric signature. Based on the new calorimetric findings, we have proposed a new physical picture that assumes the existence of rigid polar clusters (RPCs) and conclusively explains the extraordinary high kinetic stability of the MROL state, its specific calorimetric signature, the enhanced strength, and apparent slow-down of the dielectric α-relaxation. In this new picture, the incredibly slow and strengthened dielectric response is ascribed to driven rotational diffusion of whole RPCs, a mechanism that perfectly couples to the relaxation time of the “normal” glycerol fraction. First considerations based on the strength and the retardation of the dielectric RPCs’ response yield independently a size estimate for the RPCs in the order of 4-5 nm. Finally, we have discussed possible crystallisation and reorganisation effects, which give rise to pronounced out-of phase components of the specific heat at higher temperatures.
Isotopic targets with graphene backing
Many of the isotopes cannot be made as free-standing targets and require thin film backing. Low-Z backing materials, such as amorphous carbon and thin polymer films are materials of choice for some experiments. However, the limitations of these backing materials are poor thermal and mechanical stability. All-carbon graphene films would be an excellent choice as a backing material due to their high thermal conductivity, high temperature tolerance (3550ºC melting point), low outgassing, mechanical integrity, and ease of handling. We fabricated a variety of targets using graphene material as a backing or a host matrix. Using PVD sputtering deposition of boron-11 carbide, we fabricated 11 B target with a 0.5 mg/cm 2 on graphene film. The 11 B isotope is of interest due to aneutronic proton–boron fusion reaction 1 p + 11 B → 3 4 He + 8.7 MeV suitable for clean energy production1. We also prepared a neutron rich natCr target on graphene backing by electroplating Cr in an aqueous chromium (III) oxide bath. The chromium target can be used for production of positron emitting Mn radioisotope2 in the reaction 52 Cr (p,n) 52 Mn. One of the unique advantages of the graphene film fabrication process is the capability to embed target materials, including refractory metals, in the nanoparticle form into a host graphene matrix during target preparation. Finally, we fabricated nat Ir, nat Re, nat WO3, and nat HfO 2 nanoparticle-loaded graphene targets that can be used in nuclear physics research.
Ultrathin epitaxial NbN superconducting films with high upper critical field grown at low temperature
Ultrathin (5–50 nm) epitaxial superconducting niobium nitride (NbN) films were grown on AlN-buffered c-plane Al 2 O 3 by an industrial scale physical vapor deposition technique at 400°C. Both X-ray diffraction and scanning electron microscopy analysis show high crystallinity of the (111)-oriented NbN films, with a narrow full-width-at-half-maximum of the rocking curve down to 0.030°. The lattice constant decreases with decreasing NbN layer thickness, suggesting lattice strain for films with thicknesses below 20 nm. The superconducting transition temperature, the transition width, the upper critical field, the irreversibility line, and the coherence length are closely correlated to the film thickness. This work realized high quality ultrathin epitaxial NbN films by an industry-scale PVD technology at low substrate temperature, which opens up new opportunities for quantum devices.
Industrial deposition of wavelength-shifting films for liquid argon photon detection systems
The Deep Underground Neutrino Experiment (DUNE) Phase-II Far Detector is considering an approximately 2000 m 2 photon detection system to achieve a target mean light yield of 180 PE/MeV. Meeting this requirement demands scalable, cost-effective, and high-quality wavelength-shifter (WLS) coatings capable of converting 127 nm liquid-argon scintillation light into visible photons with controlled and reproducible optical performance. We report on the successful realization of an industrial physical vapor deposition (PVD) process forp-terphenyl (pTP) coatings, adapted from vacuum deposition techniques developed for OLED display manufacturing, to produce uniform WLS layers on large-area inorganic substrates, a task traditionally challenged by adhesion and uniformity issues at organic-inorganic interfaces. Surface characterization by profilometry and spectroscopic measurements demonstrates edge-region thickness variation below 10% and emission spectra consistent with high-quality pTP reference samples. The industrial process demonstrates reproducibility, scalability, and significantly reduced production time compared to laboratory-based methods, while maintaining optical characteristics consistent with established pTP reference samples. These results establish a viable pathway for mass production of high-performance pTP coatings for DUNE FD3 and future neutrino experiments, from a coating manufacturing and process standpoint. Detector-level performance validation, including quantitative VUV conversion efficiency measurements at 127 nm, is identified as future work.